3D INTER-STRATUM CONNECTIVITY ROBUSTNESS
    2.
    发明申请
    3D INTER-STRATUM CONNECTIVITY ROBUSTNESS 有权
    3D内部连接性稳定性

    公开(公告)号:US20130055183A1

    公开(公告)日:2013-02-28

    申请号:US13217381

    申请日:2011-08-25

    IPC分类号: G06F17/50

    摘要: There is provided a method for verifying inter-stratum connectivity for two or more strata to be combined into a 3D chip stack. Each of the two or more strata has 3D elements including active 3D elements, mechanical 3D elements, and dummy 3D elements. The method includes performing a respective 2D layout versus schematic verification on each of the two or more strata with respect to at least the 3D elements to pre-ensure an absence of shorts between the 3D elements when the two or more strata are subsequently stacked into the 3D chip stack. The method further includes checking inter-stratum interconnectivity between each adjacent pair of strata in the 3D chip stack.

    摘要翻译: 提供了一种用于验证要组合成3D芯片堆栈的两个或更多个层的层间连通性的方法。 两个或更多个层中的每一个具有包括主动3D元素,机械3D元素和虚拟3D元素的3D元素。 该方法包括相对于至少3D元件在两个或更多个层中的每一个上执行相应的2D布局,以相对于示意图验证,以便当两个或更多个层随后被堆叠到3D元素中时预先确保在3D元件之间不存在短路 3D芯片堆栈。 该方法还包括检查3D芯片堆叠中每个相邻层之间的层间互连性。

    HERMETIC SEAL AND RELIABLE BONDING STRUCTURES FOR 3D APPLICATIONS
    5.
    发明申请
    HERMETIC SEAL AND RELIABLE BONDING STRUCTURES FOR 3D APPLICATIONS 审中-公开
    用于3D应用的HERMETIC SEAL和可靠的结合结构

    公开(公告)号:US20080268574A1

    公开(公告)日:2008-10-30

    申请号:US12035053

    申请日:2008-02-21

    IPC分类号: H01L21/58

    摘要: A sealed microelectronic structure which provides mechanical stress endurance and includes at least two chips being electrically connected to a semiconductor structure at a plurality of locations. Each chip includes a continuous bonding material along it's perimeter and at least one support column connected to each of the chips positioned within the perimeter of each chip. Each support column extends outwardly such that when the at least two chips are positioned over one another the support columns are in mating relation to each other. A seal between the at least two chips results from the overlapping relation of the chip to one another such that the bonding material and support columns are in mating relation to each other. Thus, the seal is formed when the at least two chips are mated together, and results in a bonded chip structure.

    摘要翻译: 一种密封的微电子结构,其提供机械应力耐久性并且包括在多个位置处电连接到半导体结构的至少两个芯片。 每个芯片沿着其周边包括连续的接合材料,以及连接到位于每个芯片的周边内的每个芯片的至少一个支撑柱。 每个支撑柱向外延伸,使得当至少两个芯片彼此定位时,支撑柱彼此配合。 至少两个芯片之间的密封由芯片彼此的重叠关系产生,使得接合材料和支撑柱彼此配合。 因此,当至少两个芯片配合在一起时形成密封,并且导致粘合芯片结构。

    Super low-power generator system for embedded applications
    7.
    发明授权
    Super low-power generator system for embedded applications 有权
    用于嵌入式应用的超低功耗发电机系统

    公开(公告)号:US06343044B1

    公开(公告)日:2002-01-29

    申请号:US09679124

    申请日:2000-10-04

    IPC分类号: G11C700

    摘要: A system and method for considerable reduction of power consumption in memory circuits implementing Vbb (array body bias) and Vwl (negative word line) voltage generators. The system comprises switching off the negative WL generator during sleep or standby mode, so that no power is consumed. A relaxed refresh operation is carried out and the negative WL is powered by the Vbb generator. The noise coupled to the negative WL supply from BL swing is reduced due to the joint Vbb-Vwl decoupling scheme. In the active mode, the Vbb and Vneg are separated to avoid any cross-over noise and to maintain design flexibility. During power-on period, the ramp-up rate of Vbb level is improved by the Vwl generator. The advantages may be summarized as: (1) simpler Vbb generator design, (2) much smaller Vbb generator size, (3) reduced Vbb power, (4) no stand-by current from Vwl generator, (5) low decoupling noise for Vwl level during stand-by or sleep mode, (6) enhanced ramp-up rate for Vbb during power-on, (7) no cross-over noise between Vbb and Vwl during active mode, and (8) design flexibility of Vbb and Vwl in the active mode. The principles and advantages of the invention may be applied to any two or more DC generator systems, negative or positive.

    摘要翻译: 用于实现Vbb(阵列体偏置)和Vwl(负字线)电压发生器的存储电路中的功耗的显着降低的系统和方法。 该系统包括在睡眠或待机模式期间关闭负WL发生器,使得不消耗电力。 执行松弛的刷新操作,负的WL由Vbb发生器供电。 由于联合Vbb-Vwl去耦方案,耦合到BL摆幅的负WL电源的噪声减小。 在活动模式下,Vbb和Vneg被分离,以避免任何交叉噪声并保持设计灵活性。 在上电期间,Vwl发生器提高了Vbb电平的上升速率。 其优点可概括为:(1)Vbb发电机设计更简单,(2)Vbb发电机尺寸小得多,(3)Vbb功率降低,(4)Vwl发电机无待机电流,(5)低去耦噪声 待机或休眠模式下的Vwl电平,(6)上电期间Vbb的提升速率,(7)在活动模式期间Vbb和Vwl之间没有交叉噪声,(8)Vbb和Vbb的设计灵活性 Vwl处于活动模式。 本发明的原理和优点可以应用于任何两个或多个DC发电机系统,负极或正极。

    Method of forming a non-volatile DRAM cell
    8.
    发明授权
    Method of forming a non-volatile DRAM cell 失效
    形成非易失性DRAM单元的方法

    公开(公告)号:US5389567A

    公开(公告)日:1995-02-14

    申请号:US241136

    申请日:1994-05-10

    CPC分类号: B82Y10/00 G11C14/00

    摘要: The present invention is directed to a one-transistor non-volatile DRAM cell having a two layer floating gate to allow the contents of a storage capacitor to be transferred to the floating gate during power interruptions. The first layer of the floating gate is separated from a storage node of the storage capacitor by a tunnel oxide to allow electron tunnelling between the floating gate and the storage capacitor. In another embodiment of the present invention, a dual electron injector structure is disposed between a one layer floating and the storage node to allow electrons to be injected between the floating gate and the storage node. In another embodiment of the present invention, an erase gate is implemented to remove the charge on the floating gate. The erase gate can be separated from the floating gate by a tunnel oxide or a single electron injector structure to allow electrons to travel from the floating gate to the erase gate.

    摘要翻译: 本发明涉及一种具有双层浮置栅极的单晶体管非易失性DRAM单元,以在电源中断期间允许存储电容器的内容被传送到浮动栅极。 浮动栅极的第一层通过隧道氧化物与存储电容器的存储节点分离,以允许浮置栅极和存储电容器之间的电子隧穿。 在本发明的另一个实施例中,双电子注入器结构设置在单层浮动和存储节点之间,以允许电子注入浮动栅极和存储节点之间。 在本发明的另一个实施例中,实现擦除栅极以去除浮动栅极上的电荷。 擦除栅极可以通过隧道氧化物或单个电子注入器结构与浮动栅极分离,以允许电子从浮动栅极行进到擦除栅极。