SEMICONDUCTOR DEVICE AND POWER CONVERSION DEVICE

    公开(公告)号:US20240290829A1

    公开(公告)日:2024-08-29

    申请号:US18570670

    申请日:2022-04-22

    IPC分类号: H01L29/06 H01L29/10 H01L29/78

    摘要: A semiconductor device includes: a semiconductor substrate having a drift layer of a first conductivity type, a body region of a second conductivity type, and a JFET region of the first conductivity type in contact with the body region on both sides on the drift layer; a plurality of trenches formed in an upper surface of the semiconductor substrate and extending in a first direction; and a gate electrode formed in the trenches and on the upper surface of the semiconductor substrate with an insulating film interposed therebetween. In a unit cell, a first trench group composed of a plurality of trenches lined up in a second direction that is orthogonal to the first direction and a second trench group composed of a plurality of trenches lined up in the second direction are lined up in the first direction, and have a channel region that is shallower than the trenches.

    SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE, AND POWER CONVERSION DEVICE

    公开(公告)号:US20240274708A1

    公开(公告)日:2024-08-15

    申请号:US18566891

    申请日:2022-06-27

    IPC分类号: H01L29/78 H01L23/64 H01L29/66

    摘要: A MOS control diode obtained by adding a MOS control function to a PN diode, comprises: a semiconductor substrate having a PN junction diode that consists of a conductivity-type drift layer and a conductivity-type anode layer; a first conductivity-type well layer on the anode layer; a second conductivity-type low-concentration source layer on the well layer; a second conductivity-type high-concentration source layer only on a portion of the low-concentration source layer; gate electrodes that are located adjacent to, by way of gate oxide films, the anode layer, the well layer, and the low-concentration source layer, and that constitutes a MOSFET; an insulating film that covers the anode layer, the low-concentration and high-concentration source layers, and the gate electrodes; and a contact hole that penetrates the insulating film, the well layer, and the low-concentration and high-concentration source layers.

    UPPER ARM DRIVE CIRCUIT, DRIVE CIRCUIT OF POWER CONVERSION DEVICE, AND POWER CONVERSION DEVICE

    公开(公告)号:US20220302855A1

    公开(公告)日:2022-09-22

    申请号:US17578044

    申请日:2022-01-18

    摘要: The upper arm drive circuit for controlling the drive of an upper arm switching element of the power conversion device includes: an upper arm gate voltage output wiring connected to a gate of the upper arm switching element; a first upper arm drive circuit reference potential wiring; an upper arm gate voltage reference potential wiring connected to an inverter output of the power conversion device; and a control circuit of upper arm drive circuit reference potential wiring potential for controlling the potential of the first upper arm drive circuit reference potential wiring to a potential lower than a reference potential when a potential of the inverter output is equal to a predefined potential that is lower than the reference potential or lower. The first upper arm drive circuit reference potential wiring is connected to the reference potential via the control circuit of upper arm drive circuit reference potential wiring potential.

    SEMICONDUCTOR DEVICE
    5.
    发明申请

    公开(公告)号:US20220199786A1

    公开(公告)日:2022-06-23

    申请号:US17532741

    申请日:2021-11-22

    摘要: Provided is a highly reliable semiconductor device in which an influence on device characteristics can be reduced while improving a high temperature and high humidity bias resistance of a termination structure (termination region) of a chip by a relatively simple method. The semiconductor device includes an active region disposed on a main surface of a semiconductor substrate, and a termination region disposed on the main surface so as to surround the active region. The termination region includes an interlayer insulating film formed on the main surface of the semiconductor substrate, and an organic protective film formed so as to cover the interlayer insulating film. An insulating film having a thickness of 100 nm or less and containing nitrogen is provided between the interlayer insulating film and the organic protective film.

    Semiconductor device and alternator using the same

    公开(公告)号:US11049965B2

    公开(公告)日:2021-06-29

    申请号:US16056332

    申请日:2018-08-06

    摘要: A semiconductor device includes a first external electrode with a first electrode surface portion; a second external electrode with a second electrode surface portion; a MOSFET chip with a built-in Zener diode which includes an active region and a peripheral region; a control IC chip which drives the MOSFET chip based on voltage or current between a drain electrode and a source electrode of the MOSFET chip; and a capacitor which supplies power to the MOSFET chip and the control IC chip. The first electrode surface portion is connected to either the drain electrode or the source, the second electrode surface portion is connected to either the source electrode or the drain electrode, a plurality of unit cells of the MOSFET with the built-in Zener diode are provided in the active region, and the breakdown voltage of the Zener diode is set to be lower than that of the peripheral region.

    SEMICONDUCTOR DEVICE, POWER MODULE, AND POWER CONVERSION DEVICE

    公开(公告)号:US20190288082A1

    公开(公告)日:2019-09-19

    申请号:US16189608

    申请日:2018-11-13

    摘要: A semiconductor device including an n-type semiconductor layer formed on a substrate, having a cell region and a gate pad region, and including silicon carbide, and a unit cell formed in the cell region is configured as follows. A p-type body region formed in the semiconductor layer of the gate pad region, a first insulating film formed on the p-type body region, a conductive film formed on the first insulating film, and a second insulating film formed on the conductive film, and a gate pad formed on the second insulating film. Then, the film thickness of the first insulating film is 0.7 μm or more, and more favorably 1.5 μm or more. In addition, the electric field strength of the first insulating film is 3 MV/cm or less. Then, an opening portion is formed on the first insulating film in the gate pad region, and a resistance portion and a connection portion corresponding to the conductive film are formed in the opening portion.