Abstract:
Methods of forming molded panel coreless package structures are described. Those methods and structures may include fabrication of embedded die packages using large panel format and use of molding to improve rigidity of the panel, as well as to embed the die in a non-sacrificial mold material. The methods and structures described include methods for manufacturing thin, coreless substrate architectures which possess low warpage.
Abstract:
Methods of forming a microelectronic packaging structure and associated structures formed thereby are described. Those methods may include attaching a die to a carrier material, wherein the carrier material comprises a top layer and a bottom layer separated by an etch stop layer; forming a dielectric material adjacent the die, forming a coreless substrate by building up layers on the dielectric material, and then removing the top layer carrier material and etch stop layer from the bottom layer carrier material.
Abstract:
A microelectronic package includes a first substrate (120) having a first surface area (125) and a second substrate (130) having a second surface area (135). The first substrate includes a first set of interconnects (126) having a first pitch (127) at a first surface (121) and a second set of interconnects (128) having a second pitch (129) at a second surface (222). The second substrate is coupled to the first substrate using the second set of interconnects and includes a third set of interconnects (236) having a third pitch (237) and internal electrically conductive layers (233, 234) connected to each other with a microvia (240). The first pitch is smaller than the second pitch, the second pitch is smaller than the third pitch, and the first surface area is smaller than the second surface area.
Abstract:
A microelectronic package includes a first substrate (120) having a first surface area (125) and a second substrate (130) having a second surface area (135). The first substrate includes a first set of interconnects (126) having a first pitch (127) at a first surface (121) and a second set of interconnects (128) having a second pitch (129) at a second surface (222). The second substrate is coupled to the first substrate using the second set of interconnects and includes a third set of interconnects (236) having a third pitch (237) and internal electrically conductive layers (233, 234) connected to each other with a microvia (240). The first pitch is smaller than the second pitch, the second pitch is smaller than the third pitch, and the first surface area is smaller than the second surface area.
Abstract:
A microelectronic package includes a first substrate (120) having a first surface area (125) and a second substrate (130) having a second surface area (135). The first substrate includes a first set of interconnects (126) having a first pitch (127) at a first surface (121) and a second set of interconnects (128) having a second pitch (129) at a second surface (222). The second substrate is coupled to the first substrate using the second set of interconnects and includes a third set of interconnects (236) having a third pitch (237) and internal electrically conductive layers (233, 234) connected to each other with a microvia (240). The first pitch is smaller than the second pitch, the second pitch is smaller than the third pitch, and the first surface area is smaller than the second surface area.
Abstract:
A system may include a plurality of pliant conductive elements, a first end of one of the plurality of pliant conductive elements to be electrically coupled to a first electrical contact of an integrated circuit substrate and a second end of the one of the plurality of pliant conductive elements to be electrically coupled to a second electrical contact of an integrated circuit die.
Abstract:
Methods of forming a microelectronic packaging structure and associated structures formed thereby are described. Those methods may include attaching a die to a carrier material, wherein the carrier material comprises a top layer and a bottom layer separated by an etch stop layer; forming a dielectric material adjacent the die, forming a coreless substrate by building up layers on the dielectric material, and then removing the top layer carrier material and etch stop layer from the bottom layer carrier material.