公开(公告)号：US07875865B2

公开(公告)日：2011-01-25

申请号：US12098739

申请日：2008-04-07

申请人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

发明人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC分类号： G03B27/42

CPC分类号： G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

摘要翻译： 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

公开(公告)号：US20080258070A1

公开(公告)日：2008-10-23

申请号：US12098739

申请日：2008-04-07

申请人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

发明人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC分类号： G01J1/42

CPC分类号： G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

摘要翻译： 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

公开(公告)号：US08395756B2

公开(公告)日：2013-03-12

申请号：US12190308

申请日：2008-08-12

申请人： Johannes Wangler ,  Heiko Siekmann ,  Kenneth Weible ,  Ralf Scharnweber ,  Manfred Maul ,  Markus Deguenther ,  Michael Layh ,  Axel Scholz ,  Uwe Spengler ,  Reinhard Voelkel

发明人： Johannes Wangler ,  Heiko Siekmann ,  Kenneth Weible ,  Ralf Scharnweber ,  Manfred Maul ,  Markus Deguenther ,  Michael Layh ,  Axel Scholz ,  Uwe Spengler ,  Reinhard Voelkel

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70191 ,  G02B3/0056 ,  G02B27/0911 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70158

摘要： Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

公开(公告)号：US07880969B2

公开(公告)日：2011-02-01

申请号：US12186365

申请日：2008-08-05

申请人： Oliver Wolf ,  Heiko Siekmann ,  Eva Kalchbrenner ,  Siegfried Rennon ,  Johannes Wangler ,  Andre Bresan ,  Michael Gerhard ,  Nils Haverkamp ,  Axel Scholz ,  Ralf Scharnweber ,  Michael Layh ,  Stefan Burkart

发明人： Oliver Wolf ,  Heiko Siekmann ,  Eva Kalchbrenner ,  Siegfried Rennon ,  Johannes Wangler ,  Andre Bresan ,  Michael Gerhard ,  Nils Haverkamp ,  Axel Scholz ,  Ralf Scharnweber ,  Michael Layh ,  Stefan Burkart

IPC分类号： G02B27/10

CPC分类号： G03F7/70958 ,  G03F7/70075 ,  Y10T83/0304 ,  Y10T83/04

摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.

摘要翻译： 本发明涉及一种被配置为在微光刻投影曝光装置的照明系统中产生多个次级光源的光学积分器。 本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。 细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

公开(公告)号：US07847920B2

公开(公告)日：2010-12-07

申请号：US11703259

申请日：2007-04-30

申请人： Damian Fiolka ,  Axel Scholz ,  Manfred Maul

发明人： Damian Fiolka ,  Axel Scholz ,  Manfred Maul

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03F7/70058 ,  G03F7/70566

摘要： An illumination system for illuminating a reticle that moves along a scanning direction in a microlithographic projection exposure apparatus has an optical axis and an optical component producing an illumination angle distribution of the projection light. In accordance with the illumination angle distribution, a plurality of poles is illuminated in a pupil plane of the illumination system. The poles form an arrangement that is only mirror-symmetrical with respect to an axis that is orthogonal to the optical axis of the illumination, but neither parallel nor perpendicular to the scanning direction.

摘要翻译： 用于照射在微光刻投影曝光装置中沿着扫描方向移动的掩模版的照明系统具有产生投影光的照明角度分布的光轴和光学部件。 根据照明角度分布，在照明系统的光瞳平面内照射多个极点。 极构成相对于与照明的光轴垂直但与扫描方向不平行或垂直的轴仅镜像对称的布置。

公开(公告)号：US20100141917A1

公开(公告)日：2010-06-10

申请号：US12706422

申请日：2010-02-16

申请人： Frank Meltzer ,  Axel Scholz

发明人： Frank Meltzer ,  Axel Scholz

IPC分类号： G03B27/70 ,  G01M11/00 ,  G02B7/185

CPC分类号： G01J1/4257 ,  G01J2005/0077 ,  G03F7/70075 ,  G03F7/7085

摘要： The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.

摘要翻译： 本发明涉及一种用于间接确定光学系统中局部辐照度的方法; 其中所述光学系统包括光学元件，在所述光学元件之间形成照明光束路径，并且吸收所述光束路径中的辐射的测量对象至少部分地位于所述光束路径的部分区域中，所述光束路径被选择用于局部分辨的辐射度确定 并且通过温度检测器确定测量对象的至少一部分的温度分布。

公开(公告)号：US20060222044A1

公开(公告)日：2006-10-05

申请号：US11343471

申请日：2006-01-31

申请人： Frank Melzer ,  Axel Scholz

发明人： Frank Melzer ,  Axel Scholz

IPC分类号： G01N25/00

CPC分类号： G01J1/4257 ,  G01J2005/0077 ,  G03F7/70075 ,  G03F7/7085

摘要： The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.

公开(公告)号：US08873023B2

公开(公告)日：2014-10-28

申请号：US13186068

申请日：2011-07-19

申请人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

发明人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

摘要翻译： 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。 在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。 例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III） 这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。 结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

公开(公告)号：US08730455B2

公开(公告)日：2014-05-20

申请号：US13181033

申请日：2011-07-12

申请人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

发明人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03F7/20 ,  G03B27/68 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。

公开(公告)号：US08469436B2

公开(公告)日：2013-06-25

申请号：US12872360

申请日：2010-08-31

申请人： Udo Wensing ,  Hans Boris Hahnen ,  Frank Neumeyer ,  Frank Frentzen ,  Rolf Birkenbach ,  Joachim Rossbach ,  Karl Kemmerling ,  Axel Scholz ,  Tim Lauterbach ,  Rolf Weigelt ,  Ragnvald Andersson

发明人： Udo Wensing ,  Hans Boris Hahnen ,  Frank Neumeyer ,  Frank Frentzen ,  Rolf Birkenbach ,  Joachim Rossbach ,  Karl Kemmerling ,  Axel Scholz ,  Tim Lauterbach ,  Rolf Weigelt ,  Ragnvald Andersson

IPC分类号： B60J7/185

CPC分类号： B60J5/065 ,  B60J7/185 ,  Y10T24/44017

摘要： A clamping device for sliding roofs is provided in the region of the guidance and runner rail. An actuation lever is pivotable between locking and release positions. A clamping element is modifiable in its position by means of the actuation lever, which coacts with a countermember of the end carriage and moves the end carriage to the end of the guidance and runner rail. The clamping element is aligned with the guidance and runner rail, and is shiftable in a longitudinal direction, between a locking position retaining the end carriage, and a release position. The guide comprises in a subregion on the underside an open space such that upon shifting of the actuation lever into the release position, the clamping element is at least partly lowerable sufficiently that the end carriage can be displaced away from the end of the guidance and runner rail.

摘要翻译： 在引导和转轮轨道的区域中设置有用于滑动屋顶的夹紧装置。 致动杆可在锁定位置和释放位置之间枢转。 夹紧元件通过致动杆在其位置可修改，该致动杆与端部托架的对立构件共同作用，并将端部托架移动到引导和流道导轨的端部。 夹紧元件与引导和流道导轨对准，并且可以在纵向方向上，在保持端部托架的锁定位置和释放位置之间移动。 引导件在下侧的分区域中包括开放空间，使得当致动杆移动到释放位置时，夹紧元件至少部分地可以足够低，使得端部托架可以远离引导件和转轮的端部 轨。