摘要:
An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.
摘要:
The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要:
A textile part is configured for producing a composite-material element (11) or a composite-material body (12). The textile part (10) has a reinforcing system (15) including reinforcing warp threads (16) and reinforcing weft threads (17), and a binding system (25) with binding warp threads (27) and binding weft threads (26). The reinforcing system (15) has at least one first portion (20), into which the reinforcing threads (16, 17) are interwoven with one another directly for binding to facilitate withstanding high mechanical. The reinforcing system (15) also has at least one second portion (21), in which the reinforcing threads (16, 17) form binding-free crossover locations (22) preferably laid on one another in a drawn-out state to constitute a laid structure surrounded by the binding threads (26, 27). The laid structure of the reinforcing system (15), ensures particularly good draping and deformation capability at this location of the composite material.
摘要:
The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要:
An optical imaging device, in particular a lens system, has a system diaphragm (1). An aperture of the system diaphragm (1) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm (1) with respect to the optical axis (4) of the system diaphragm (1) is fixed in dependence on the opening diameter (D) of the system diaphragm (1).
摘要:
A fabric (10) for use in composite materials having a reinforcing system (11) made of reinforcing warp threads (13) and reinforcing weft threads (14), which are placed on top of one other in two different reinforcing layers (16), (17). A binding system (12) of binding warp threads (20) and binding weft threads (21) is formed from a binding yarn (30) with a lower yarn count than the reinforcing yarn (15). The reinforcing system (11) is enclosed between the binding warp threads (20) on the one side and the binding weft threads (21) on the other side, and thus, held in place at binding points (22). At each binding point (22), a binding warp thread (20) is guided and held between a stationary warp thread (25) and a regular warp thread (24) of a warp thread pair (23) of binding warp threads (20). Between two adjacent binding points of a warp thread pair (23), the stationary warp thread (25) and the regular warp thread (24) have intersecting points (26).
摘要:
A fabric (10) for use in composite materials having a reinforcing system (11) made of reinforcing warp threads (13) and reinforcing weft threads (14), which are placed on top of one other in two different reinforcing layers (16), (17). A binding system (12) of binding warp threads (20) and binding weft threads (21) is formed from a binding yarn (30) with a lower yarn count than the reinforcing yarn (15). The reinforcing system (11) is enclosed between the binding warp threads (20) on the one side and the binding weft threads (21) on the other side, and thus, held in place at binding points (22). At each binding point (22), a binding warp thread (20) is guided and held between a stationary warp thread (25) and a regular warp thread (24) of a warp thread pair (23) of binding warp threads (20). Between two adjacent binding points of a warp thread pair (23), the stationary warp thread (25) and the regular warp thread (24) have intersecting points (26).
摘要:
An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.
摘要:
The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要:
An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical element has a first coefficient of thermal expansion. The optical element holder holds the optical element via the first contact element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being different from the first coefficient of thermal expansion. At least one of the module components is adapted to provide at least a reduction of forces introduced into the optical element upon a thermally induced position change in the relative position between the optical element and the optical element holder, the position change resulting from a temperature situation variation in a temperature situation of the plurality of module components.