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    Optical apparatus comprising an optical component and an adjustment device and method for influencing a polarization state of the optical component
    1.
    发明授权
    Optical apparatus comprising an optical component and an adjustment device and method for influencing a polarization state of the optical component 有权
    光学装置包括光学部件和用于影响光学部件的偏振状态的调节装置和方法

    公开(公告)号：US07580207B2

    公开(公告)日：2009-08-25

    申请号：US11383012

    申请日：2006-05-12

    申请人： Frank Melzer

    发明人： Frank Melzer

    IPC分类号： G02B7/02 ,  G02B3/00

    CPC分类号： G02B7/023 ,  G03F7/70825 ,  G03F7/70966

    摘要： An optical apparatus comprises an optical component having at least one optical surface and a first optical axis, a socket in which said optical component is mounted, first manipulators arranged to exert forces approximately parallel to the optical axis of the optical component for varying stresses in the optical component, the forces having a strength such that stress birefringence is induced in the component.

    摘要翻译： 光学装置包括具有至少一个光学表面和第一光轴的光学部件，安装有所述光学部件的插座，布置成施加近似平行于光学部件的光轴的力的第一操纵器，用于改变 光学部件，具有在部件中引起应力双折射的强度的力。

    Focusing-device for the radiation from a light source
    2.
    发明申请
    Focusing-device for the radiation from a light source 有权
    用于来自光源的辐射的聚焦装置

    公开(公告)号：US20080297755A1

    公开(公告)日：2008-12-04

    申请号：US12218400

    申请日：2008-07-15

    申请人： Martin Antoni ,  Frank Melzer ,  Andreas Seifert ,  Wolfgang Singer

    发明人： Martin Antoni ,  Frank Melzer ,  Andreas Seifert ,  Wolfgang Singer

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70058 ,  G02B5/10 ,  G02B17/02 ,  G02B27/0025 ,  G02B27/30

    摘要： A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1′) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus (200). The collector mirror (1, 1′) is displaceably connected to the mount (24) via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.

    摘要翻译： 用于来自光源（2）的辐射的聚焦装置设置有集中器反射镜（1,1'），其被布置在安装件（24）中，并以虚拟或实际的方式从光源收集光 （2）在第二焦点（200）。 收集镜（1,1'）经由轴承可移动地连接到支座（24），使得即使在温度变化的情况下，它的光学特性保持至少近似相同。

    Focusing-device for the radiation from a light source
    7.
    发明授权
    Focusing-device for the radiation from a light source 有权
    用于来自光源的辐射的聚焦装置

    公开(公告)号：US06655808B2

    公开(公告)日：2003-12-02

    申请号：US09950186

    申请日：2001-09-10

    申请人： Martin Antoni ,  Frank Melzer ,  Andreas Seifert ,  Wolfgang Singer

    发明人： Martin Antoni ,  Frank Melzer ,  Andreas Seifert ,  Wolfgang Singer

    IPC分类号： G02B508

    CPC分类号： G03F7/70058 ,  G02B5/10 ,  G02B17/02 ,  G02B27/0025 ,  G02B27/30

    摘要： A focusing-device for the radiation from a light source, in particular a laser plasma source, has a collector mirror which collects the light from the light source at a second focus in virtual or real terms, in particular for micro-lithography using EUV radiation, and a routing unit and downstream beam formation in an illuminating system. The collector mirror can be displaced in the z-direction (optical axis) and is designed and/or mounted in such a way that the position of the second focus remains unchanged in the event of temperature changes.

    摘要翻译： 用于来自光源，特别是激光等离子体源的辐射的聚焦装置具有收集器反射镜，其以虚拟或实际方式在第二焦点处收集来自光源的光，特别是对于使用EUV辐射的微光刻 ，以及照明系统中的路由单元和下游波束形成。 集光镜可以在z方向（光轴）上移位，并且被设计和/或安装成使得在温度变化的情况下第二焦点的位置保持不变。

    Lighting system, particularly for use in extreme ultraviolet (EUV) lithography
    8.
    发明授权
    Lighting system, particularly for use in extreme ultraviolet (EUV) lithography 失效
    照明系统，特别适用于极紫外（EUV）光刻

    公开(公告)号：US07196841B2

    公开(公告)日：2007-03-27

    申请号：US10512100

    申请日：2003-04-08

    申请人： Frank Melzer ,  Wolfgang Singer

    发明人： Frank Melzer ,  Wolfgang Singer

    IPC分类号： G02B5/08 ,  G02B26/00 ,  G02B26/08 ,  G03B27/54 ,  A61N5/00 ,  G21K5/00

    CPC分类号： G03F7/70075 ,  G02B26/0816 ,  G03F7/70141 ,  G03F7/702

    摘要： A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths ≦193 nm is provided with a light source, an object plane, an exit pupil, a first optical element having first screen elements for producing light channels, and with a second optical element having second screen elements. A screen element of the second optical element is assigned to each light channel that is formed by one of the first screen elements of the first optical element. The screen elements of the first optical element and of the second optical element can be configured or arranged so that they produce, for each light channel, a continuous beam course from the light source up to the object plane. The angles of the first screen elements of the first optical element can be adjusted in order to modify a tilt. The location and/or angles of the second screen elements of the second optical element can be adjusted individually and independently of one another in order to realize another assignment of the first screen elements of the first optical element to the second screen elements of the second optical element by displacing and/or tilting the first and second screen elements.

    摘要翻译： 特别是用于极紫外（EUV）光刻的照明系统，包括用于制造波长<= 193nm的半导体元件的投影透镜，其具有光源，物平面，出射光瞳，具有第一光学元件的第一光学元件 用于产生光通道的屏幕元件，以及具有第二屏元件的第二光学元件。 第二光学元件的屏幕元件被分配给由第一光学元件的第一屏幕元件之一形成的每个光通道。 第一光学元件和第二光学元件的屏幕元件可以被配置或布置成使得它们为每个光通道产生从光源到物平面的连续光束路线。 可以调节第一光学元件的第一屏元件的角度以便改变倾斜。 第二光学元件的第二屏幕元件的位置和/或角度可以彼此独立地且独立地进行调整，以便实现第一光学元件的第一屏幕元件与第二光学元件的第二屏幕元件的另一分配 元件通过移位和/或倾斜第一和第二屏元件。