Abstract:
A carrier substrate includes an insulation layer, conductive towers and a circuit structure layer. A diameter of each of the conductive towers is increased gradually from a top surface to a bottom surface, and the conductive towers include first conductive towers and second conductive towers surrounding the first conductive towers. The circuit structure layer is disposed on the insulation layer and includes at least one dielectric layer, at least two circuit layers and first conductive vias. Each of the second conductive towers correspondingly connects to at least two of the first conductive vias, and each of the first conductive towers correspondingly connects to one of the first conductive vias. An interface exists between the first conductive vias and the first and the second conductive towers.
Abstract:
An electronic device manufacturing system is disclosed. The system includes a processing tool having one or more processing chambers each adapted to perform an electronic device manufacturing process on one or more substrates; a substrate carrier adapted to couple to the system and carry one or more substrates; and a component adapted to create a sealed environment relative to at least a portion of the substrate carrier and to substantially equalize the sealed environment with an environment within the substrate carrier. Methods of the invention are described as are numerous other aspects.
Abstract:
A fabrication method of a semiconductor package includes the steps of: providing a carrier having a concave portion and a releasing layer formed on a surface thereof; disposing a chip on the releasing layer in the concave portion; forming an encapsulant on the chip and the releasing layer; removing the releasing layer and the carrier; and forming a circuit structure on the encapsulant and the chip. The design of the concave portion facilitates alignment of the chip to prevent it from displacement, thereby improving the product reliability. A semiconductor package fabricated by the fabrication method is also provided.
Abstract:
A hoist apparatus including a traveling unit that travels from one place to another, an elevating unit installed in the traveling unit to be lifted up and lowered down from the traveling unit, a grip device which is installed in the elevating unit and selectively grips a stumbling projection formed at one side of an accommodating container accommodating an object, and a separation preventing apparatus which is connected to the elevating unit and selectively closes an open inlet of the accommodating container so that the object accommodated in the accommodating container is not separated from the accommodating container.
Abstract:
A front opening semiconductor wafer container for large diameter wafers includes a container portion and a door. The container portion includes a left closed side, a right closed side, a closed back, an open front, and an open interior including a plurality of slots for receiving and containing the wafers. The door is attachable to the container portion to close the open front and selectively latchable to the container portion. The container portion includes a means for accommodating large diameter wafers, particularly 450 mm wafers. Optimized sag control is provided as well as enhanced structural rigidity, and wafer seating features.
Abstract:
A conveyor and conveyor system is defined for moving a container used to hold semiconductor wafers. The conveyor includes a first belt having a first support surface for movably supporting the container and a second belt having a second support surface for movably supporting the container. The first belt and the second belt each have a raised guide. The conveyor further includes a drive assembly for moving at least the first belt and causing the container to move over the first and second belts when placed on the first and second support surfaces. Methods for making the conveyor and operating the conveyor are also defined herein.
Abstract:
An exposure apparatus for performing exposure of a substrate to light via a reticle. The apparatus includes a first stage configured to hold a chuck. The chuck has a support base with an electrode, and forms a container, for one of the substrate and the reticle, together with a cover. The container electrostatically chucks the one on the support base by the electrode. A transporter transports the container in which the one is contained, and loads the chuck, which chucks the one, on the first stage without the cover. A second stage holds the other of the substrate and the reticle. The apparatus obtains a first positional shift amount between the chuck and the one chucked on the chuck before the transportation by the transporter, to measure a second positional shift amount between a reference mark on the chuck held by the first stage and a reference mark on the second stage, and corrects positions of the first and second stages based on the first and second positional shift amounts, to perform the exposure.
Abstract:
Provided is an apparatus for clamping a stack of trays that allows automation and prevents distribution of particles or foreign materials during a semiconductor fabrication process. In one embodiment, the apparatus includes a frame body surrounding the stack of trays, a plurality of belt drums, and a hook. Each belt drum is attached to one side of the frame body has a belt and spiral spring. The belt is structured to securely surround the stack of trays using the elastic tension of the spiral spring member mounted in the belt drum. The hook is structured to be rotatably connected to the frame body and slid under a bottom surface of the stack of trays to secure the stack of trays.
Abstract:
A substrate such as a mask or wafer is transported while it is protected from a particle. Use of the substrate after transportation is facilitated. A container (300) includes a chuck (310) which chucks and holds a substrate (71) such as a mask or wafer, and a cover (320) which forms a storage space (108) together with the chuck (310). The substrate (71) is transported as it is held in the storage space (108) with the cover (320) being mounted on the chuck (310).
Abstract:
For the purpose of preventing a pressure difference from occurring between an interior of an FOUP and an exterior at the time of purging the interior of the FOUP, a communication path that communicates with the exterior of the FOUP and the interior of an outlet path is provided with respect to the outlet path that extends from a table side outlet port which is disposed on a table on which the FOUP is placed, and an external atmosphere is introduced to the outlet path through the communication path when a pressure difference starts occurring between the interior and the exterior of the FOUP.