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    Electron microscope
    72.
    发明授权
    Electron microscope 失效
    电子显微镜

    公开(公告)号：US4520264A

    公开(公告)日：1985-05-28

    申请号：US482880

    申请日：1983-04-07

    Applicant: Katsushige Tsuno ,  Toshikazu Honda

    Inventor： Katsushige Tsuno ,  Toshikazu Honda

    IPC: H01J37/04 ,  H01J37/26 ,  H01J37/141

    CPC classification number: H01J37/26 ,  H01J37/04

    Abstract: In an electron microscope, having intermediate lenses between the object and the projection lenses, the first and second intermediate lenses are used for rotating the final electron microscope image without changes in magnification. The desired angle signal indicating to azimuth angle .theta. is designated by an operator. The absolute magnetomotive force .vertline.J1.vertline. and .vertline.J2.vertline. of the first and second intermediate lenses are controlled by a lens control means in the relation that (.vertline.J1.vertline.-.vertline.J2.vertline.) is proportional to the azimuth angle .theta. and (.vertline.J1.vertline.+.vertline.J2.vertline.) is nearly proportional to the square of the azimuth angle .theta..

    Abstract translation: 在电子显微镜中，在物体和投影透镜之间具有中间透镜，第一和第二中间透镜用于旋转最终的电子显微镜图像而不改变放大率。 指示方位角θ的期望角度信号由操作者指定。 关于第一和第二中间透镜的绝对磁动势| J1 |和| J2 |由透镜控制装置控制，其中（| J 1 | | | 2 |）与方位角θ成比例，并且（| + | J2|）几乎与方位角θ的平方成比例。

    Electron beam system
    73.
    发明授权
    Electron beam system 失效
    电子束系统

    公开(公告)号：US4321510A

    公开(公告)日：1982-03-23

    申请号：US180439

    申请日：1980-08-22

    Applicant: Tadahiro Takigawa

    Inventor： Tadahiro Takigawa

    IPC: H01J37/04 ,  H01J37/30 ,  H01J37/302 ,  H01J37/305 ,  H01L21/027 ,  H01J29/58

    CPC classification number: H01J37/04 ,  H01J37/3007 ,  H01J37/302

    Abstract: An electron source section including a first detecting sub-section and a first control sub-section and an image formation section including a second detecting sub-section and a second control sub-section are arranged in series. The first detecting sub-section detects at least one of the shape, diameter, brightness and spatial position of a crossover image formed by the electron source section to become an electron source of the image formation section and the direction of emission of the electron beam emitted from such crossover image, thereby to control the first control sub-section. The second detecting sub-section detects at least one of the shape and size of an electron beam image formed on a subject to be irradiated by the beam, and the current of the electron beam forming the electron beam image, thereby to control the second control sub-section.

    Abstract translation: 包括第一检测子部分和第一控制子部分的电子源部分和包括第二检测子部分和第二控制子部分的图像形成部分被串联布置。 第一检测子部分检测由电子源部分形成的成为图像形成部分的电子源的交叉图像的形状，直径，亮度和空间位置中的至少一个以及发射的电子束的发射方向 从这样的交叉图像，从而控制第一控制子部分。 第二检测子部分检测形成在被光束照射的被摄体上的电子束图像的形状和大小中的至少一个以及形成电子束图像的电子束的电流，从而控制第二控制 小节。

    Electron microscope
    74.
    发明授权
    Electron microscope 失效
    电子显微镜

    公开(公告)号：US4121100A

    公开(公告)日：1978-10-17

    申请号：US788538

    申请日：1977-04-18

    Applicant: Morioki Kubozoe ,  Yoshihisa Minamikawa ,  Shinjiro Katagiri

    Inventor： Morioki Kubozoe ,  Yoshihisa Minamikawa ,  Shinjiro Katagiri

    IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

    CPC classification number: H01J37/04

    Abstract: An electron beam from an electron gun is made to focus on a first position by a focussing lens system. The focussed beam is then magnified and projected on a screen through a magnification lens system having an objective lens, an intermediate lens and a projection lens.The excitation is so variable that the electron beam may be focussed also on a second position behind the projection lens.A specimen is positioned at the first position for normal electron microscope analysis, while, for a scanning electron microscope analysis, another specimen is put at the second position.

    Abstract translation: 通过聚焦透镜系统使来自电子枪的电子束聚焦在第一位置上。 然后通过具有物镜，中间透镜和投影透镜的放大透镜系统将聚焦光束放大并投影在屏幕上。

    Particle-beam device of the raster type
    76.
    发明授权
    Particle-beam device of the raster type 失效
    RASTER类型的颗粒束装置

    公开(公告)号：US3869611A

    公开(公告)日：1975-03-04

    申请号：US6792270

    申请日：1970-08-28

    Applicant: SIEMENS AG

    Inventor： THON FRIEDRICH

    IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

    CPC classification number: H01J37/04 ,  H01J37/28

    Abstract: A raster type particle-beam device has an electro-optical axis and defines a specimen locality on the axis. The device has a beam generator for issuing a particle beam along the axis toward the specimen locality, a condenser lens for focussing the beam onto the specimen locality, the lens being disposed ahead of the specimen locality and coaxial with the axis, a deflection system arranged about the axis intermediate the beam generator and the condenser lens, an imaging surface disposed beyond the specimen locality in coaxial relation to the axis for receiving the rays of the beam passing through the specimen, and a beam modifying structure for modifying the imaging properties of the beam, the beam modifying structure being disposed in the path of the beam intermediate the deflection system and the specimen locality.

    Abstract translation: 光栅型粒子束装置具有电光轴并且在轴上限定了样本位置。 该装置具有一个光束发生器，用于沿着轴线朝向标本位置发射一个粒子束，一个用于将光束聚焦在样本位置上的聚焦透镜，该透镜设置在样本位置之前并与该轴同轴，一个偏转系统被布置 关于光束发生器和聚光透镜之间的轴线，设置在与轴线同轴的位置之外的成像表面，用于接收通过样本的光束的射线;以及光束修改结构，用于修改光束发生器和聚光透镜的成像特性 光束修改结构设置在偏转系统和样本位置之间的光束路径中。

    Electron-beam illuminating system for an electrical apparatus such as an electron microscope or the like
    77.
    发明授权
    Electron-beam illuminating system for an electrical apparatus such as an electron microscope or the like 失效
    用于电子装置的电子束照射系统如电子显微镜或类似物

    公开(公告)号：US3862419A

    公开(公告)日：1975-01-21

    申请号：US37341573

    申请日：1973-06-25

    Applicant: SIEMENS AG

    Inventor： VENEKLASEN LEE

    IPC: H01J37/063 ,  H01J37/04 ,  H01J37/073 ,  H01J37/141 ,  H01J37/21 ,  H01J37/26

    CPC classification number: H01J37/04 ,  H01J37/073

    Abstract: An electron-beam illuminating system for an electrical apparatus such as an electron microscope or the like includes a cathode for supplying the electrons making up the electron-beam. A first anode is disposed beyond the cathode and defines therewith a beam axis extending in beam direction. A positive bias voltage on the first anode determines the emission of the cathode. An acceleration anode is disposed beyond the first anode and defines an acceleration path for the electrons emitted by the cathode. An acceleration voltage is applied across the cathode and the acceleration anode. A further electrode is located between the first anode and the accelerating electrode and defines conjointly with the first anode a space therebetween along the beam axis. A voltage is applied to the further electrode which is linearly proportional to the acceleration voltage. An auxiliary lens generates a first image of the source in this space. An electric circuit supplies a voltage to the further electrode which is linearly proportional to the acceleration voltage.

    Abstract translation: 用于诸如电子显微镜等的电气设备的电子束照明系统包括用于提供构成电子束的电子的阴极。 第一阳极设置在阴极之外，并且由此限定沿射束方向延伸的射束轴线。 第一阳极上的正偏置电压确定阴极的发射。 加速阳极设置在第一阳极之外并且限定由阴极发射的电子的加速路径。 在阴极和加速阳极之间施加加速电压。 另一个电极位于第一阳极和加速电极之间，并且与第一阳极一起沿着光束轴与其间形成一个空间。 电压被施加到与加速电压成线性比例的另一电极。 辅助透镜在该空间中产生源的第一图像。 电路向另外的电极提供与加速电压成线性比例的电压。

    Electron microscopes
    78.
    发明授权
    Electron microscopes 失效
    电子显微镜

    公开(公告)号：US3746855A

    公开(公告)日：1973-07-17

    申请号：US3746855D

    申请日：1971-10-27

    Applicant: ASS ELECT IND

    Inventor： HILDITCH D

    IPC: H01J37/04 ,  H01J37/153 ,  H01J37/26 ,  G01N23/04

    CPC classification number: H01J37/153 ,  H01J37/04

    Abstract: In an electron microscope comprising an electromagnetic objective lens and at least three separate electromagnetic projector lenses, the rotations produced by the lenses are mutually balanced out, so that the final image has a substantially constant orientation with changes in magnification. Preferably, magnification is set by a single control knob. Preferably, the microscope has two modes of operation, for different magnification ranges, the rotations being balanced out in both ranges.

    Abstract translation: 在包括电磁物镜和至少三个单独的电磁投影仪透镜的电子显微镜中，由透镜产生的旋转相互平衡，使得最终图像具有基本上恒定的取向并具有变化。 优选地，放大率由单个控制旋钮设定。 优选地，显微镜具有两种操作模式，对于不同的放大范围，旋转在两个范围内平衡。

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