Abstract:
An array substrate, a display panel and a display device are disclosed. The array substrate includes: a plurality of gate lines, a plurality of data lines, and a plurality of common electrodes disposed on a base substrate. The plurality of gate lines are extended in a first direction, the plurality of data lines are extended in a second direction. Each of the common electrodes includes an overlap section which overlaps at least one of the data lines in a direction perpendicular to the base substrate. A gap is provided between the overlap sections of two adjacent common electrodes in the second direction, the two adjacent common electrodes overlap the same data lines in the direction perpendicular to the base substrate. An intersection of the data line and the gate line between the two adjacent common electrodes is located within the gap.
Abstract:
A manufacturing method of an array substrate, an array substrate and a display device are provided. The manufacturing method of the array substrate comprises: forming a first conductive thin film (100) on a base substrate (1); and patterning the first conductive thin film (100), to form a pattern of a cathode (11) on a first region (11) of the base substrate (1), and form a pattern of a gate electrode (4) on a second region (12) of the base substrate (1). Complexity and process time of a fabrication process of an array substrate can be reduced, a fabrication process of an organic electroluminescent panel can be simplified, and production cost can be reduced, by forming a cathode layer of a light-emitting diode and a gate electrode layer of a thin film transistor in different regions of the base substrate at the same time by one patterning process.
Abstract:
The present disclosure provides a low temperature polycrystalline silicon field effect TFT array substrate and a method for producing the same and a display apparatus. The method: using a stepped photo resist process to form a polycrystalline silicon active layer and a lower polar plate of a polycrystalline silicon storage capacitor simultaneously on a substrate in one lithographic process; forming a gate insulation layer on the polycrystalline silicon active layer and the lower polar plate of the polycrystalline silicon storage capacitor; forming a metal layer on the gate insulation layer and etching the metal layer to form a gate electrode and gate lines connected with the gate electrode, a source electrode, a drain electrode and data lines connected with the source electrode and the drain electrode; forming a passivation layer, a photo resist layer and a pixel electrode layer in sequence and patterning the passivation layer, the photo resist layer and the pixel electrode layer to form patterns of an interlayer insulation layer via hole and a pixel electrode in one lithographic process; forming a pixel definition layer on the pixel electrode. The present disclosure may reduce times of lithographic processes for the low temperature polycrystalline silicon field effect TFT array substrate, improve the yield and reduce the costs.
Abstract:
Provided are a method and an apparatus for manufacturing a semiconductor device. The method comprises: forming a first wiring layer on a base substrate; forming an interlayer dielectric layer on the first wiring layer, with contact holes being provided in the interlayer dielectric layer; subjecting bottoms of the contact holes to a dry cleaning process; and forming a second wiring layer on the interlayer dielectric layer, wherein the second wiring layer is electrically connected to the first wiring layer via the contact holes.
Abstract:
A thin film transistor and its manufacturing method, an array substrate and its manufacturing method, and a display device are provided. The thin film transistor includes a gate electrode, a source electrode, a drain electrode, an active layer and a gate insulation layer. The gate insulation layer is provided above the active layer, the gate, the source electrode and the drain electrode are provided on a same layer above the gate insulation layer, the active layer and the source electrode are connected through a first connection electrode, and the active layer and the drain electrode are connected through a second connection electrode. The thin film transistor can be formed by three times of patterning processes, by which the process time period is shortened, the process yield is improved, and the process cost is reduced, and so on.
Abstract:
An array substrate, a fabrication method thereof, and an organic light-emitting diode display device are provided; the array substrate (10) comprises a base substrate (100), the base substrate (100) including a display region (102) and a peripheral region (101) surrounding the display region (102), the display region (102) including: a plurality of data lines (12) and a plurality of gate lines (11) intersecting with each other, a plurality of pixel regions (21), formed in a matrix and defined by the plurality of data lines (12) and the plurality of gate lines (11) intersecting with each other formed on the base substrate (100), wherein a thin film transistor (32) is formed in each of the plurality of pixel regions (21); and further, the array substrate (10) also comprises at least one solar cell unit (31), which, together with the thin film transistor (32), is located on a same side of the base substrate (100), and is formed in at least one of the plurality of pixel regions (21) and the peripheral region (101).
Abstract:
A touch structure, a touch display panel and an electronic apparatus are provided. The touch structure includes a first touch electrode extended along a first direction and a second touch electrode extended along a second direction; the first touch electrode includes first electrode main body portions in a first conductive layer and a first connection portion in a second conductive layer; the second touch electrode includes second electrode main body portions and a second connection portion in the first conductive layer; the first connection portion is overlapped with the second connection portion in a direction perpendicular to the first conductive layer; the first conductive layer includes first metal meshes formed by first metal lines. The touch structure also includes a dummy electrode in the second conductive layer. The dummy electrode is coupled with at least one of the first connection portion and the second connection portion.
Abstract:
Provided an electrostatic protection circuit. The electrostatic protection circuit includes: at least one first transistor and at least one second transistor. A gate electrode and a first electrode of the first transistor are connected to a first signal line, and a second electrode of the first transistor is connected to a second signal line. A gate electrode and a first electrode of the second transistor are connected to the second signal line, and a second electrode of the second transistor is connected to the first signal line. Orthographic projection(s) of a channel and/or a first electrode of the first transistor on a main surface of the array substrate is/are within an orthographic projection of the first signal line on the main surface of the array substrate.
Abstract:
An Electro-Static Discharge (ESD) protection circuit including a Thin Film Transistor (TFT) arranged between a to-be-protected signal line and a discharging line is provided, wherein a length direction of a channel of the TFT is parallel to an extension direction of the to-be-protected signal line. A display panel and a display device are also provided.
Abstract:
The present disclosure relates to a driving unit, including a first driving sub-circuit, a second driving sub-circuit, and a driving control circuit. The first driving sub-circuit includes first switching elements, configured to output a first signal to the driving unit in response to a control signal from the driving control circuit. The second driving sub-circuit includes one or more second switching elements, and at least one of the second switching elements is configured to output a second signal to the driving unit in response to the control signal. The driving control circuit is configured to output the control signal at a control signal output terminal. Each of the first switching elements and second switching elements includes a transistor. Control signal input terminals of the first switching elements are coupled to the control signal output terminal through a control signal input line having a ring structure.