知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

175 条记录 (耗时 0.014 秒)

    Vacuum device where power supply mechanism is mounted and power supply method
    51.
    发明授权
    Vacuum device where power supply mechanism is mounted and power supply method 有权
    安装电源机构的真空装置和电源方式

    公开(公告)号：US07806985B2

    公开(公告)日：2010-10-05

    申请号：US11578056

    申请日：2005-01-24

    申请人： Masayuki Takimoto ,  Hiroyuki Komuro ,  Yutaka Fuse ,  Tatsumi Abe ,  Kazuhito Aonahata

    发明人： Masayuki Takimoto ,  Hiroyuki Komuro ,  Yutaka Fuse ,  Tatsumi Abe ,  Kazuhito Aonahata

    IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

    CPC分类号： C23C14/505 ,  C23C14/32 ,  H01J37/023 ,  H01J37/24 ,  H01J37/3053 ,  H01J2237/024 ,  H01J2237/3137 ,  H01R39/381 ,  H01R39/64

    摘要： An improvement has been made in contact states between a rotating electrode arranged inside a vacuum chamber and a power supply mechanism which touches the rotating electrode to supply electric power thereto. A vacuum device is provided with a vacuum chamber, a rotating electrode arranged inside and electrically insulated from the vacuum chamber, and a power supply mechanism which touches the rotating electrode to supply electric power thereto, wherein the rotating electrode has an annular shape and horizontally rotates with respect to the center axis of the annular shape, and the power supply mechanism is composed of electrode members, and the electrode member and the rotating electrode come into contact with each other at at least one contact surface.

    摘要翻译： 在布置在真空室内的旋转电极与接触旋转电极的电源机构之间的接触状态下进行了改进，以向其提供电力。 真空装置设有真空室，设置在内部并与真空室电绝缘的旋转电极，以及与旋转电极接触以供应电力的电源机构，其中旋转电极具有环形并水平旋转 相对于环状的中心轴线，供电机构由电极构成，电极构件和旋转电极在至少一个接触面相互接触。

    Arc chamber for an ion implantation system
    52.
    发明授权
    Arc chamber for an ion implantation system 有权
    用于离子注入系统的电弧室

    公开(公告)号：US07679070B2

    公开(公告)日：2010-03-16

    申请号：US11772822

    申请日：2007-07-02

    申请人： Jung-Chi Chen

    发明人： Jung-Chi Chen

    IPC分类号： H01J37/317 ,  H01J37/08 ,  H01J27/08

    CPC分类号： H01J37/08 ,  H01J27/14 ,  H01J37/023 ,  H01J2237/032 ,  H01J2237/038

    摘要： An arc chamber for an ion implantation system includes an exit aperture positioned at a wall of the arc chamber, filaments respectively positioned at two opposing sides within the arc chamber, and repeller structures respectively positioned at two opposing walls within the arc chamber between the filaments and the arc chamber. The repeller structure includes a repeller substrate with a screw axis for fitting the repeller structure to the arc chamber, an insulator positioned underneath the repeller substrate providing an electrical isolation between the repeller substrate and the arc chamber, and a conductive spacer covering a portion of the insulator positioned in between the insulator and the arc chamber.

    摘要翻译： 用于离子注入系统的电弧室包括位于电弧室的壁处的出口孔，分别位于电弧室内的两个相对侧的细丝和分别位于电弧室内的两个相对的壁之间的排斥结构， 电弧室。 反射器结构包括具有用于将反射器结构装配到电弧室的螺旋轴线的排斥衬底，位于推斥层衬底下方的绝缘体，其提供了在该斥力衬底和电弧室之间的电隔离，以及覆盖部分 绝缘体位于绝缘体和电弧室之间。

    Kinematic ion implanter electrode mounting
    54.
    发明授权
    Kinematic ion implanter electrode mounting 有权
    运动离子注入机电极安装

    公开(公告)号：US07145157B2

    公开(公告)日：2006-12-05

    申请号：US10688076

    申请日：2003-10-17

    申请人： Jonathon Y. Simmons ,  John R. Shelley ,  Andrew Stephen Devaney

    发明人： Jonathon Y. Simmons ,  John R. Shelley ,  Andrew Stephen Devaney

    IPC分类号： G21K5/10

    CPC分类号： H01J37/08 ,  H01J27/024 ,  H01J37/023 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/061

    摘要： A kinematic electrode mount is provided for an ion implanter in which an electrode insert member having an electrode body portion which defines an aperture, is inserted into an electrode support frame. In one embodiment, a first kinematic alignment pin of the insert member engages a first, groove-shaped kinematic alignment surface of the electrode support frame to align the first alignment pin in two orthogonal directions relative to the electrode support frame. In addition, a second kinematic alignment pin of the insert member engages a second kinematic alignment surface of the electrode support frame to align the insert member in a rotational orientation relative to the electrode support frame. A plurality of flanges of the insert member engage the electrode support frame to retain the insert member in the aligned position and to electrically couple the electrode insert member to the electrode support frame. A spring positioned between the electrode insert member and the electrode support frame biases the electrode insert member in the aligned and retained position relative to the electrode support frame. In another embodiment, the electrode support frame has alignment pins and the insert member has alignment slots.

    摘要翻译： 提供了一种用于离子注入机的运动电极座，其中具有限定孔的电极主体部分的电极插入件被插入到电极支撑框架中。 在一个实施例中，插入构件的第一运动学对准销接合电极支撑框架的第一槽形运动学对准表面，以使第一对准销相对于电极支撑框架在两个正交方向上对齐。 此外，插入构件的第二运动学对准销接合电极支撑框架的第二运动学对准表面，以使插入构件相对于电极支撑框架以旋转取向对准。 插入构件的多个凸缘接合电极支撑框架以将插入构件保持在对准位置并且将电极插入构件电耦合到电极支撑框架。 位于电极插入构件和电极支撑框架之间的弹簧将电极插入构件相对于电极支撑框架偏置在对准和保持位置。 在另一个实施例中，电极支撑框架具有对准销，插入件具有对准槽。

    Method and apparatus for aligning an extraction electrode to an arc chamber
    55.
    发明授权
    Method and apparatus for aligning an extraction electrode to an arc chamber 失效
    将引出电极对准电弧室的方法和装置

    公开(公告)号：US06688017B2

    公开(公告)日：2004-02-10

    申请号：US10152479

    申请日：2002-05-21

    申请人： Tai-Kun Kao ,  Kuo-I Huang

    发明人： Tai-Kun Kao ,  Kuo-I Huang

    IPC分类号： G01D2100

    CPC分类号： H01J37/023 ,  H01J37/3171 ,  H01J2237/08

    摘要： A method for aligning an extraction electrode to an arc chamber of an ion implantation apparatus can be carried out by first providing a calibration tool that is shaped essentially of a flat key that has sections of different widths. The extraction electrode can then be tilted by switching on a tilt motor, while being moved horizontally by switching on an alignment motor until the calibration tool can be smoothly inserted into the slit openings in the arc chamber and in the extraction electrode. The tilt motor and the alignment motor are controlled by a tilt/align controller. When such insertion is not possible, the extraction electrode can be continuously tilted and moved horizontally until such smooth insertion is possible. The present invention further discloses a calibration tool that can be used easily for aligning an extraction electrode to an arc chamber of an ion implantation apparatus.

    摘要翻译： 可以通过首先提供基本上由具有不同宽度的部分的平面键形成的校准工具来执行用于将引出电极对准离子注入装置的电弧室的方法。 然后可以通过接通倾斜电动机同时通过打开对准电动机水平移动直到校准工具能够平滑地插入到电弧室和提取电极中的狭缝开口中来使抽出电极倾斜。 倾斜电机和对位电机由倾斜/对准控制器控制。 当这种插入是不可能的时，提取电极可以被连续地倾斜并水平移动，直到可以这样平滑地插入。 本发明还公开了一种校准工具，其可以容易地用于将引出电极与离子注入装置的电弧室对准。

    APPARATUS FOR TILTING A BEAM SYSTEM
    56.
    发明申请
    APPARATUS FOR TILTING A BEAM SYSTEM 有权
    用于倾斜光束系统的装置

    公开(公告)号：US20030222221A1

    公开(公告)日：2003-12-04

    申请号：US10159790

    申请日：2002-05-31

    发明人： Alexander Groholskiy ,  Riccardo Drainoni ,  Michael Tanguay

    IPC分类号： H01J037/20

    CPC分类号： H01J37/28 ,  H01J37/023 ,  H01J37/16 ,  H01J37/3056 ,  H01J2237/0245

    摘要： The present invention provides a column tilt apparatus and method for providing an off-normal angle of incidence of a beam in a scanned beam system onto a substrate passing through the eucentric point that is electro-mechanically adjustable during operation while maintaining vacuum integrity of the column and work chamber, and without introducing significant vibrations.

    摘要翻译： 本发明提供了一种列倾斜装置和方法，用于将扫描光束系统中的光束的偏离正常入射角提供给通过在操作期间电机械可调节的偏心点的基板，同时保持色谱柱的真空完整性 和工作室，没有引起显着的振动。

    High precision flexure stage
    57.
    发明授权
    High precision flexure stage 失效
    高精度弯曲台

    公开(公告)号：US06555829B1

    公开(公告)日：2003-04-29

    申请号：US09481103

    申请日：2000-01-10

    申请人： James P. Spallas ,  Lawrence P. Muray ,  David Trost ,  Ho-Seob Kim ,  Tai-Hon P. Chang

    发明人： James P. Spallas ,  Lawrence P. Muray ,  David Trost ,  Ho-Seob Kim ,  Tai-Hon P. Chang

    IPC分类号： G01B902

    CPC分类号： B23Q1/34 ,  B23Q1/621 ,  H01J37/023 ,  H01J2237/20264 ,  H01L21/68

    摘要： Disclosed is a positioning stage for precisely positioning an object within a limited range of travel (e.g. 100 &mgr;m). By way of example, the stage can be used to position an electron source such as a field emitter in an electron beam microcolumn. The stage includes a block which defines a channel to allow flexure along a first axis. The block also defines another channel to allow flexure along a second axis perpendicular to the first axis. Using actuators in the channels to flex a portion of the block, the object supported by the block can be precisely positioned to a desired location in a horizontal plane defined by the first and second axes.

    摘要翻译： 公开了一种用于在有限的旅行范围内（例如，100mum）精确地定位物体的定位台。 作为示例，该级可用于将诸如场致发射体的电子源定位在电子束微柱中。 舞台包括限定通道以允许沿着第一轴弯曲的块。 该块还限定另一个通道，以允许沿垂直于第一轴线的第二轴线弯曲。 使用通道中的致动器来弯曲块的一部分，由块支撑的物体可精确地定位在由第一和第二轴限定的水平平面中的期望位置。