公开(公告)号：US6135995A

公开(公告)日：2000-10-24

申请号：US710577

申请日：1996-09-19

申请人： Michael Arnett ,  Robert J. Rorden ,  Gregory Dumond ,  Jerzy Orkiszewski ,  David Dewey ,  David Trost

发明人： Michael Arnett ,  Robert J. Rorden ,  Gregory Dumond ,  Jerzy Orkiszewski ,  David Dewey ,  David Trost

IPC分类号： A61B18/20 ,  B23K26/00 ,  B23K26/42 ,  A61N5/06

CPC分类号： A61B18/20 ,  B23K26/0096 ,  A61B2018/00636

摘要： Typically, a laser emits significant energy after a control signal is generated to disable the power supply. The inherent delay between generation of a control signal for shutting off a laser power supply and actual termination of an output beam pulse in response to the control signal, is compensated in the context that the control signal is generated automatically upon coincidence of measured output beam power with a preset threshold value. Power supplied to a laser is modulated to cause generation of a pulsed laser output beam. The cumulative energy of each output beam pulse is monitored and a feedback signal indicative of measured output beam pulse energy is supplied to the power supply. The feedback signal is compared with a user-selected threshold value, and a control signal is generated for terminating the output beam pulse (by terminating input power to the laser) when the measured output pulse energy reaches the threshold value. By generating the threshold signal to have a value representing a threshold output beam pulse energy that is lower than a desired output beam pulse energy, the threshold signal is generated in a manner which compensates for the inherent delay between generation of the control signal and the actual termination of the output beam pulse in response to the control signal. This prevents delivery of significant output beam energy in excess of a user-selected amount.

摘要翻译： 通常，在产生控制信号以禁用电源之后，激光器发射显着的能量。 在响应于控制信号的用于关闭激光电源的控制信号的产生和输出光束脉冲的实际终止之间的固有延迟在上下文中得到补偿，所述上下文中控制信号在测量的输出光束功率一致时自动产生 具有预设的阈值。 对激光器供电的功率被调制以产生脉冲激光输出光束。 监视每个输出光束脉冲的累积能量，并将指示测量的输出光束脉冲能量的反馈信号提供给电源。 将反馈信号与用户选择的阈值进行比较，并且当测量的输出脉冲能量达到阈值时，生成用于终止输出光束脉冲（通过终止对激光器的输入功率）的控制信号。 通过产生阈值信号以具有表示低于期望的输出光束脉冲能量的阈值输出光束脉冲能量的值，该阈值信号以补偿控制信号的产生与实际的信号之间的固有延迟的方式产生 响应于控制信号终止输出光束脉冲。 这防止输出超过用户选择量的显着输出光束能量。

公开(公告)号：US5999555A

公开(公告)日：1999-12-07

申请号：US105874

申请日：1998-06-26

申请人： Kevin P. Connors ,  James L. Hobart ,  Edward D. Reed ,  David Trost

发明人： Kevin P. Connors ,  James L. Hobart ,  Edward D. Reed ,  David Trost

IPC分类号： G02B6/42 ,  H01S3/04 ,  H01S3/042 ,  H01S3/0915 ,  H01S3/092 ,  H01S3/23 ,  H01S3/08

CPC分类号： G02B6/4296 ,  H01S3/042 ,  H01S3/092 ,  H01S3/2383 ,  H01S3/005 ,  H01S3/025 ,  H01S3/0407 ,  H01S3/0931 ,  H01S3/10046 ,  H01S3/10053 ,  H01S3/1022 ,  Y10S165/303 ,  Y10S165/314

摘要： A pulsed solid state laser system is disclosed which utilizes a plurality of individual laser rods which are sequentially pumped and whose beans are combined into a single interleaved output bean. The individual laser rods are pumped at an average power level which is below that for maximum output power from each rod, thereby obviating the need for refrigeration cooling. A compact optical system is disclosed which permits a constant beam size even at different pump levels and other advantages. A compact cooling system is also disclosed.

摘要翻译： 公开了一种脉冲固态激光系统，其利用了顺序泵浦的多个单独的激光棒，并将其组合成单个交错输出豆。 单个激光棒的平均功率水平被泵浦，该功率水平低于来自每个杆的最大输出功率的激光棒，从而避免了对制冷冷却的需要。 公开了一种紧凑的光学系统，即使在不同的泵水平和其他优点下也允许恒定的光束尺寸。 还公开了紧凑的冷却系统。

公开(公告)号：US5847959A

公开(公告)日：1998-12-08

申请号：US789246

申请日：1997-01-28

申请人： Lee H. Veneklasen ,  Robert Innes ,  Sergey Babin ,  David Trost ,  Jeffrey Varner

发明人： Lee H. Veneklasen ,  Robert Innes ,  Sergey Babin ,  David Trost ,  Jeffrey Varner

IPC分类号： H01J37/305 ,  H01J37/302 ,  H01J37/317 ,  H01L21/027 ,  G06F11/00 ,  G03C5/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31769 ,  Y10S430/143

摘要： An electron beam pattern generating system for exposing a pattern on a substrate using a raster scan method. The system stores a rasterized representation of the pattern as a plurality of regular pixel dose exposure levels. These pixel dose exposure levels are evaluated by the system for one or more proximity effects and corrections to the dose exposure level and/or pixel location are calculated. The system includes apparatus for both calculation and storage of intermediate and final results as required. As they are calculated, the corrections are provided to an exposure dose modulator wherein they are applied to forming the pattern. Thus corrections for both long range and short range proximity effects due to both electron scattering and heating as well as for proximity effects due to global thermal expansion can be calculated and provided during run-time and a corrected pattern exposed.

摘要翻译： 一种电子束图案生成系统，用于使用光栅扫描方法在衬底上曝光图案。 系统将图案的光栅化表示存储为多个规则像素剂量曝光水平。 这些像素剂量暴露水平由系统评估一个或多个邻近效应，并且计算对剂量暴露水平和/或像素位置的校正。 该系统包括用于根据需要计算和存储中间和最终结果的装置。 当它们被计算时，校正被提供给曝光剂量调制器，其中它们被应用于形成图案。 因此，由于电子散射和加热以及由于全局热膨胀引起的邻近效应，对长距离和短距离邻近效应的校正可以在运行时间和校正图案暴露期间被计算和提供。

公开(公告)号：US4507597A

公开(公告)日：1985-03-26

申请号：US502995

申请日：1983-06-10

申请人： David Trost

发明人： David Trost

IPC分类号： H01L21/30 ,  G03F7/20 ,  G03F9/00 ,  G05D3/00 ,  H01L21/027 ,  H01L21/68 ,  H02K41/02 ,  G05B1/06

CPC分类号： G03F7/70716 ,  H02K41/031 ,  H02K2201/18

摘要： This invention is directed to electromagnetic alignment apparatus, which is particularly adapted, among other possible uses, for use in aligning the wafers in a microlithography system, said apparatus comprising in combination a first magnetic circuit having a plurality of elements including a first magnet; a second magnetic circuit having a plurality of elements including a second magnet; the second magnetic circuit being disposed in spaced relationship with respect to the first magnetic circuit; a movable structural component adapted for mounting an object thereon; one element of each magnetic circuit being fixedly attached to the movable structural component; first and second current carrying coil assemblies mounted in the first magnetic circuit; the second coil assembly being disposed at an angle with respect to the first coil assembly; third and fourth current carrying coil assemblies mounted in the second magnetic circuit; the fourth coil assembly being disposed at an angle with respect to the third coil assembly; and control apparatus for controlling the flow and direction of the current through the coil assemblies, respectively.

摘要翻译： 本发明涉及电磁对准装置，其特别适用于微光刻系统中对准晶片的其它可能用途，所述装置组合包括具有包括第一磁体的多个元件的第一磁路; 具有包括第二磁体的多个元件的第二磁路; 所述第二磁路相对于所述第一磁路以间隔的关系设置; 适于在其上安装物体的可移动结构部件; 每个磁路的一个元件固定地附接到可移动结构部件; 安装在第一磁路中的第一和第二载流线圈组件; 所述第二线圈组件相对于所述第一线圈组件以一定角度设置; 安装在第二磁路中的第三和第四载流线圈组件; 所述第四线圈组件相对于所述第三线圈组件以一定角度设置; 以及用于分别控制通过线圈组件的电流的流动和方向的控制装置。

公开(公告)号：US4504144A

公开(公告)日：1985-03-12

申请号：US395414

申请日：1982-07-06

申请人： David Trost

发明人： David Trost

IPC分类号： G03F9/00 ,  G03B27/42

CPC分类号： G03F9/70

摘要： An apparatus automatically for correcting tilt and focus errors of a wafer in a mask projection system for a plurality of subfields on the wafer which vary in position according to a known scheme. The tilt and focus of each subfield on the wafer is individually corrected by three axial actuators operating on the variable X and Y coordinates of the center of each subfield and its tilt and focus errors.

摘要翻译： 一种自动修正用于根据已知方案在位置上变化的晶片上的多个子场的掩模投影系统中的晶片的倾斜和聚焦误差的装置。 通过在每个子场的中心的可变X和Y坐标上进行的三个轴向致动器及其倾斜和聚焦误差来单独校正晶片上每个子场的倾斜和聚焦。

公开(公告)号：US06878950B2

公开(公告)日：2005-04-12

申请号：US10844223

申请日：2004-05-12

申请人： Bassam Shamoun ,  David Trost

发明人： Bassam Shamoun ,  David Trost

IPC分类号： G03F1/00 ,  G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  G01B11/26 ,  H01J37/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/00 ,  H01J37/3174 ,  H01J2237/31794

摘要： The present invention relates generally to methods, apparatus and materials to reduce or minimize the heating of a substrate (and associated distortions of the photomask) caused by electron-beam energy deposited in the substrate during patterning. Heating of the substrate is exacerbated by radiative transfer of infrared energy from the substrate to other nearby components of the e-beam apparatus followed by reflection or re-radiation of a portion of the energy back to the substrate. The present invention provides useful materials and methods for reducing such reflection or re-radiation effects, leading to temperature stability of the substrate, reduced thermal distortion and the possibility of increased patterning accuracy. The infrared absorbing materials of the present invention also possess sufficient electrical conductivity to dissipate scattered electrons residing on the material, and sufficient thermal conductivity to dissipate heat rapidly and not result in local heating or significant temperature rise of the absorber. The semiconducting material silicon carbide (SiC) is satisfactory for the practice of the present invention. Doped SiC having altered electrical conductivity may also be used. It is shown that emission and re-absorption from the uncoated face of the substrate dominates the substrate's temperature rise.

摘要翻译： 本发明一般涉及减少或最小化在图案化期间由衬底中沉积的电子束能量引起的衬底加热（和光掩模的相关变形）的方法，设备和材料。 衬底的加热通过将红外能量从电子束设备的基底辐射转移到其它附近的部件，随后将能量的一部分反射或重新辐射回到衬底来加剧。 本发明提供用于减少这种反射或再辐射效应的有用的材料和方法，导致衬底的温度稳定性，降低的热变形和增加图案精度的可能性。 本发明的红外线吸收材料还具有足够的电导率以消散驻留在材料上的散射电子，并且具有足够的导热性以快速散发热量，并且不会导致吸收体的局部加热或显着的温度升高。 半导体材料碳化硅（SiC）对于本发明的实践是令人满意的。 也可以使用具有改变的导电性的掺杂的SiC。 显示从衬底的未涂覆面的发射和再吸收主导衬底的温度升高。

公开(公告)号：US06521901B1

公开(公告)日：2003-02-18

申请号：US09451683

申请日：1999-11-30

申请人： Bassam Shamoun ,  David Trost

发明人： Bassam Shamoun ,  David Trost

IPC分类号： G01B1126

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/00 ,  H01J37/3174 ,  H01J2237/31794

摘要： The present invention relates generally to methods, apparatuses and materials to reduce or minimize the heating of a substrate (and associated distortions of the photomask) caused by electron-beam energy deposited in the substrate during patterning. The present invention provides useful materials and methods for reducing such reflection or re-radiation effects, leading to temperature stability of the substrate, reduced thermal distortion and the possibility of increased patterning accuracy. The infrared absorbing materials of the present invention also possess sufficient electrical conductivity to dissipate scattered electrons residing on the material, and sufficient thermal conductivity to dissipate heat rapidly and not result in local heating or significant temperature rise of the absorber.

摘要翻译： 本发明一般涉及减少或最小化在图案化期间由衬底中沉积的电子束能量引起的衬底加热（和光掩模的相关变形）的方法，装置和材料。 本发明提供用于减少这种反射或再辐射效应的有用的材料和方法，导致衬底的温度稳定性，降低的热变形和增加图案精度的可能性。 本发明的红外线吸收材料还具有足够的电导率以消散驻留在材料上的散射电子，并且具有足够的导热性以快速散发热量，并且不会导致吸收体的局部加热或显着的温度升高。

公开(公告)号：US06424879B1

公开(公告)日：2002-07-23

申请号：US09291167

申请日：1999-04-13

申请人： Francis C. Chilese ,  Bassam Shamoun ,  David Trost

发明人： Francis C. Chilese ,  Bassam Shamoun ,  David Trost

IPC分类号： G06F1900

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/30455 ,  H01J2237/30461

摘要： An electron beam writing system includes an electron beam patterning machine operable to emit an electron beam to form a pattern on a substrate. A computer control system, coupled to the electron beam patterning machine, has a plurality of pre-computed distortion maps. Each distortion map describes expected distortions of the substrate caused by bulk heating resulting from exposure to the electron beam. The computer control system controls the electron beam patterning machine using the distortion maps in order to adjust for the expected distortions.

摘要翻译： 电子束写入系统包括可操作以发射电子束以在衬底上形成图案的电子束图案形成机。 耦合到电子束图案机的计算机控制系统具有多个预先计算的失真图。 每个失真图描述了由于暴露于电子束而产生的体积加热引起的基板的预期失真。 计算机控制系统使用失真图来控制电子束图形机，以便对预期的失真进行调整。

公开(公告)号：US06328733B1

公开(公告)日：2001-12-11

申请号：US09354927

申请日：1999-07-15

申请人： David Trost

发明人： David Trost

IPC分类号： A61B1818

CPC分类号： A61B18/203 ,  A61B18/201 ,  A61B2017/00747 ,  A61B2017/00973 ,  A61B2018/00452 ,  A61B2018/20359 ,  A61B2218/008 ,  A61F2/10

摘要： A surgical laser scanner having optics that scans a pulsed laser beam onto a target tissue is disclosed. The laser scanner has a lens and a scanning mirror or mirrors located upstream of the lens at a distance substantially equal to the focal length of the lens. The laser beam hits the scanning mirror and is reflected onto the lens in a pattern defined by sequential positions of the scanning mirror. The laser beam is projected onto the target tissue by the lens in a direction parallel to the optical axis of the lens. The projected pattern has a constant size regardless of the distance between the laser scanner and the target tissue.

摘要翻译： 公开了具有将脉冲激光束扫描到目标组织上的光学器件的外科激光扫描仪。 激光扫描仪具有位于透镜上游的透镜和扫描镜或反射镜，其距离基本上等于透镜的焦距。 激光束照射扫描镜并以由扫描镜的顺序位置限定的图案反射到透镜上。 激光束通过透镜在平行于透镜的光轴的方向上投影到目标组织上。 无论激光扫描仪和目标组织之间的距离如何，投影图案都具有恒定的尺寸。

公开(公告)号：US5957915A

公开(公告)日：1999-09-28

申请号：US898719

申请日：1997-07-22

申请人： David Trost

发明人： David Trost

IPC分类号： A61B17/00 ,  A61B18/00 ,  A61B18/20 ,  A61F2/10 ,  A61B17/36

CPC分类号： A61B18/203 ,  A61B18/201 ,  A61B2017/00747 ,  A61B2017/00973 ,  A61B2018/00452 ,  A61B2018/2095 ,  A61B2218/008 ,  A61F2/10

摘要： A surgical laser scanner having optics that scans a pulsed laser beam onto a target tissue is disclosed. The laser scanner has a lens and a scanning mirror or mirrors located upstream of the lens at a distance substantially equal to the focal length of the lens. The laser beam hits the scanning mirror and is reflected onto the lens in a pattern defined by sequential positions of the scanning mirror. The laser beam is projected onto the target tissue by the lens in a direction parallel to the optical axis of the lens. The projected pattern has a constant size regardless of the distance between the laser scanner and the target tissue.

摘要翻译： 公开了具有将脉冲激光束扫描到目标组织上的光学器件的外科激光扫描仪。 激光扫描仪具有位于透镜上游的透镜和扫描镜或反射镜，其距离基本上等于透镜的焦距。 激光束照射扫描镜并以由扫描镜的顺序位置限定的图案反射到透镜上。 激光束通过透镜在平行于透镜的光轴的方向上投影到目标组织上。 无论激光扫描仪和目标组织之间的距离如何，投影图案都具有恒定的尺寸。