摘要:
Disclosed is a positioning stage for precisely positioning an object within a limited range of travel (e.g. 100 &mgr;m). By way of example, the stage can be used to position an electron source such as a field emitter in an electron beam microcolumn. The stage includes a block which defines a channel to allow flexure along a first axis. The block also defines another channel to allow flexure along a second axis perpendicular to the first axis. Using actuators in the channels to flex a portion of the block, the object supported by the block can be precisely positioned to a desired location in a horizontal plane defined by the first and second axes.
摘要:
A vacuum compatible linear motion device having a fluid bearing is contained within a vacuum chamber having a working pressure of significantly less than one atmosphere. The fluid bearing is contained within a vacuum enclosure within the vacuum chamber and is maintained at a pressure higher than that of the vacuum chamber but less than one atmosphere, thus essentially isolating the fluid bearing. A moveable payload is coupled to the linear motion device such that linear motion in the direction of the long axis of the device is provided to the moveable payload.
摘要:
A handpiece for use in delivering the output beam of a laser to the surface of a patient's skin for performing a dermatological procedure. In a first and second embodiment of the present invention, the handpiece provides a highly collimated beam of a fixed, non-variable spot size which is largely insensitive to movement of the handpiece over a range of working positions. In a third embodiment the handpiece provides a highly collimated and well defined focused laser spot of variable size where for a selected spot size, the size is largely insensitive to movement of the handpiece over a range of working positions. In all of the embodiments, the highly collimated laser beam permits the surgeon performing the procedure to move the handpiece over a range of positions without significantly defocusing or altering the spot size of the beam.
摘要:
Typically, a laser emits significant energy after a control signal is generated to disable the power supply. The inherent delay between generation of a control signal for shutting off a laser power supply and actual termination of an output beam pulse in response to the control signal, is compensated in the context that the control signal is generated automatically upon coincidence of measured output beam power with a preset threshold value. Power supplied to a laser is modulated to cause generation of a pulsed laser output beam. The cumulative energy of each output beam pulse is monitored and a feedback signal indicative of measured output beam pulse energy is supplied to the power supply. The feedback signal is compared with a user-selected threshold value, and a control signal is generated for terminating the output beam pulse (by terminating input power to the laser) when the measured output pulse energy reaches the threshold value. By generating the threshold signal to have a value representing a threshold output beam pulse energy that is lower than a desired output beam pulse energy, the threshold signal is generated in a manner which compensates for the inherent delay between generation of the control signal and the actual termination of the output beam pulse in response to the control signal. This prevents delivery of significant output beam energy in excess of a user-selected amount.
摘要:
A pulsed solid state laser system is disclosed which utilizes a plurality of individual laser rods which are sequentially pumped and whose beans are combined into a single interleaved output bean. The individual laser rods are pumped at an average power level which is below that for maximum output power from each rod, thereby obviating the need for refrigeration cooling. A compact optical system is disclosed which permits a constant beam size even at different pump levels and other advantages. A compact cooling system is also disclosed.
摘要:
An electron beam pattern generating system for exposing a pattern on a substrate using a raster scan method. The system stores a rasterized representation of the pattern as a plurality of regular pixel dose exposure levels. These pixel dose exposure levels are evaluated by the system for one or more proximity effects and corrections to the dose exposure level and/or pixel location are calculated. The system includes apparatus for both calculation and storage of intermediate and final results as required. As they are calculated, the corrections are provided to an exposure dose modulator wherein they are applied to forming the pattern. Thus corrections for both long range and short range proximity effects due to both electron scattering and heating as well as for proximity effects due to global thermal expansion can be calculated and provided during run-time and a corrected pattern exposed.
摘要:
This invention is directed to electromagnetic alignment apparatus, which is particularly adapted, among other possible uses, for use in aligning the wafers in a microlithography system, said apparatus comprising in combination a first magnetic circuit having a plurality of elements including a first magnet; a second magnetic circuit having a plurality of elements including a second magnet; the second magnetic circuit being disposed in spaced relationship with respect to the first magnetic circuit; a movable structural component adapted for mounting an object thereon; one element of each magnetic circuit being fixedly attached to the movable structural component; first and second current carrying coil assemblies mounted in the first magnetic circuit; the second coil assembly being disposed at an angle with respect to the first coil assembly; third and fourth current carrying coil assemblies mounted in the second magnetic circuit; the fourth coil assembly being disposed at an angle with respect to the third coil assembly; and control apparatus for controlling the flow and direction of the current through the coil assemblies, respectively.
摘要:
An apparatus automatically for correcting tilt and focus errors of a wafer in a mask projection system for a plurality of subfields on the wafer which vary in position according to a known scheme. The tilt and focus of each subfield on the wafer is individually corrected by three axial actuators operating on the variable X and Y coordinates of the center of each subfield and its tilt and focus errors.
摘要:
A pulse format for a laser system is disclosed for maximizing the energy delivered to a target immersed in an absorbing liquid. A first pulse is generated having an energy sufficient to initiate the formation of a vapor bubble in the liquid medium adjacent the end of the delivery device. A second, high energy pulse is generated after the vapor bubble initiated by the first pulse has expanded an amount sufficient to displace the liquid between the delivery device and the target. In this manner, the second pulse is delivered directly to the target and little energy is lost to the liquid medium.
摘要:
A beam delivery apparatus, including a set of focusing mirrors (or transmissive lenses) mounted along an endoscope channel. A laser beam can be focused into an input end of the channel with a smaller F number (wider cone angle) than is possible in a conventional endoscope. As the beam propagates down the channel, it is reflected (or transmitted) a finite number of times by the focusing elements. The focusing elements act as a periscope to focus and refocus the beam as it propagates along the channel, with little loss of beam power. The invention enables delivery of the beam to the channel's distal end with a smaller F number than can be achieved using a conventional endoscope. In a preferred embodiment, a pair of reflecting strips are mounted the channel, the surface of each strip defines six focusing mirrors, and the beam undergoes a total of twelve reflections from the mirrors as it propagates down the channel. Preferably, the surface of each mirror has a curvature selected to prevent the introduction of astigmatic distortion during each beam reflection.