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    NARROW BAND EXCIMER LASER APPARATUS
    51.
    发明申请
    NARROW BAND EXCIMER LASER APPARATUS 审中-公开

    公开(公告)号：US20180198253A1

    公开(公告)日：2018-07-12

    申请号：US15912633

    申请日：2018-03-06

    Applicant: Gigaphoton Inc.

    Inventor： Hirotaka MIYAMOTO ,  Osamu WAKABAYASHI

    IPC: H01S3/137 ,  H01S3/225 ,  H01S3/134 ,  H01S3/036

    CPC classification number: H01S3/137 ,  H01S3/02 ,  H01S3/036 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/13 ,  H01S3/134 ,  H01S3/225

    Abstract: A narrow band excimer laser apparatus includes a line narrowing module that narrows the spectral line width of laser light, a nitrogen gas introducing unit, a first valve that restricts the flow of nitrogen gas from the introducing unit into a casing of the module, an exhaust unit that causes gas to flow out from the casing, an exhaust pump for exhausting the gas from the casing, a second valve that restricts the exhausting of gas from the exhaust unit, an atmosphere discharge unit that discharges the gas within the casing into the atmosphere, a third valve that restricts the discharge of gas into the atmosphere, and a control unit that closes the second valve while opening the first and third valves, supplies nitrogen gas into the casing, then closes the third valve while opening the first and second valves, drives the exhaust pump, and causes laser oscillation thereafter.

    LASER SYSTEM
    52.
    发明申请
    LASER SYSTEM 审中-公开

    公开(公告)号：US20180191124A1

    公开(公告)日：2018-07-05

    申请号：US15895634

    申请日：2018-02-13

    Applicant: Gigaphoton Inc.

    Inventor： Hiroshi UMEDA ,  Osamu WAKABAYASHI

    IPC: H01S3/097 ,  H01S3/23 ,  H01S3/104

    CPC classification number: H01S3/09702 ,  H01L21/2026 ,  H01S3/104 ,  H01S3/225 ,  H01S3/2383

    Abstract: The laser system includes a first laser apparatus, a second laser apparatus, a charging voltage measuring unit configured to measure the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, at least one bleeding circuit configured to reduce the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, and a bleeding circuit controller configured to control the at least one bleeding circuit based on the voltage measured by the charging voltage measuring unit.

    LASER SYSTEM
    57.
    发明申请
    LASER SYSTEM 有权
    激光系统

    公开(公告)号：US20170070023A1

    公开(公告)日：2017-03-09

    申请号：US15354670

    申请日：2016-11-17

    Applicant: Gigaphoton Inc.

    Inventor： Hiroshi UMEDA ,  Takeshi ASAYAMA ,  Osamu WAKABAYASHI

    IPC: H01S3/097 ,  H01S3/23

    CPC classification number: H01S3/09702 ,  B23K26/00 ,  B23K26/0608 ,  H01L21/02686 ,  H01L21/67115 ,  H01S3/0057 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/1394 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2383

    Abstract: The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.

    Abstract translation: 激光系统可以包括延迟电路单元，第一和第二触发校正单元以及时钟发生器。 延迟电路单元可以接收触发信号，输出通过将触发信号延迟第一延迟时间而获得的第一延迟信号，并输出通过将触发信号延迟第二延迟时间而获得的第二延迟信号。 第一触发校正单元可以接收第一延迟信号并输出​​通过将第一延迟信号延迟第一校正时间而获得的第一开关信号。 第二触发校正单元可以接收第二延迟信号并输出​​通过将第二延迟信号延迟第二校正时间而获得的第二开关信号。 时钟发生器可以产生延迟电路单元和第一和第二触发校正单元共用的时钟信号。

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    58.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
    极致超紫外光发生系统

    公开(公告)号：US20170027047A1

    公开(公告)日：2017-01-26

    申请号：US15284805

    申请日：2016-10-04

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

    IPC: H05G2/00 ,  H01S3/107 ,  H01S3/23 ,  H01S3/11 ,  H01S3/08 ,  H01S3/223

    CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0602 ,  H01S3/08054 ,  H01S3/107 ,  H01S3/1115 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H01S3/235 ,  H05G2/006

    Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

    Abstract translation: 远端紫外线（EUV）发生系统被配置为通过提高等离子体产生的效率来提高激光系统的能量对EUV能量的转换效率。 EUV生成系统包括被配置为将目标朝向室内的等离子体产生区域输出的目标生成单元。 激光系统被配置为产生第一预脉冲激光束，第二预脉冲激光束和主脉冲激光束，使得靶被第一预脉冲激光束照射，第二预脉冲激光 光束和主脉冲激光束。 此外，EUV生成系统包括：控制器，被配置为控制激光系统，使得第二预脉冲激光束的能量密度等于或高于1J / cm 2，并且等于或低于主脉冲的能量密度 激光束。

    LASERSYSTEM
    59.
    发明申请
    LASERSYSTEM 有权

    公开(公告)号：US20160344158A1

    公开(公告)日：2016-11-24

    申请号：US15227028

    申请日：2016-08-03

    Applicant: GIGAPHOTON INC.

    Inventor： Takashi ONOSE ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

    IPC: H01S3/23 ,  H01S3/225 ,  H05G2/00 ,  H01S3/13 ,  H01S3/00 ,  H01S3/30 ,  H01S3/10

    CPC classification number: H01S3/2391 ,  H01S3/0092 ,  H01S3/10015 ,  H01S3/1301 ,  H01S3/2251 ,  H01S3/30 ,  H01S3/305 ,  H05G2/00

    Abstract: There is provided a laser system that may include a Raman cell, a pumping light generator, and a Raman cell laser unit. The pumping light generator may include one or more optical parametric amplifiers (OPAs), and may be configured to output first Raman-cell pumping light and second Raman-cell pumping light to the Raman cell. The Raman cell laser unit may be configured to output probing light as a target of wavelength conversion to the Raman cell.

    Abstract translation: 提供了可以包括拉曼单元，泵浦光发生器和拉曼单元激光器单元的激光系统。 泵浦光发生器可以包括一个或多个光学参量放大器（OPA），并且可以被配置为将第一拉曼单元泵浦光和第二拉曼单元泵浦光输出到拉曼单元。 拉曼单元激光单元可以被配置为将作为波长转换的目标的探测光输出到拉曼单元。

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