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公开(公告)号：US20240377343A1
公开(公告)日：2024-11-14
申请号：US18684558
申请日：2022-08-22
Applicant: ASML NETHERLANDS B.V.
IPC: G01N23/2251 , G06N3/045 , G06N3/0475 , G06N3/094
Abstract: Described herein is a metrology system and a method for converting metrology data via a trained machine learning (ML) model. The method includes accessing a first (MD1) SEM data set (e.g., images, contours, etc.) acquired by a first scanning electron metrology (SEM) system (TS1) and a second (MD2) SEM data set acquired by a second SEM system (TS2), where the first SEM data set and the second SEM data set being associated with a patterned substrate. Using the first SEM data set and the second SEM data set as training data, a machine learning (ML) model is trained (P303) such that the trained ML model is configured to convert (P307) a metrology data set (310) acquired (P305) by the second SEM system to a converted data set (311) having characteristics comparable to metrology data being acquired by the first SEM system. Furthermore, measurements may be determined based on the converted SEM data.
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公开(公告)号：US12142451B2
公开(公告)日：2024-11-12
申请号：US17778579
申请日：2020-10-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Tianming Chen , Chiyan Kuan , Yixiang Wang , Zhi Po Wang
Abstract: A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.
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公开(公告)号：US20240370621A1
公开(公告)日：2024-11-07
申请号：US18686994
申请日：2022-08-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Meng LIU , Been-Der CHEN , Debao SHAO , Jen-Yi WUU , Hao CHEN , Ayman HAMOUDA , Jianhua CHENG
IPC: G06F30/392 , G06F111/20
Abstract: Selecting an optimized, geometrically diverse subset of clips for a design layout for a semiconductor wafer is described. A complete representation of the design layout is received. A set of representative clips of the design layout is determined such that individual representative clips comprise different combinations of one or more unique patterns of the design layout. A subset of the representative clips is selected based on the one or more unique patterns. The subset of the representative clips is configured to include: (1) each geometrically unique pattern in a minimum number of representative clips; or (2) as many geometrically unique patterns of the design layout as possible in a maximum number of representative clips. The subset of representative clips is provided as training data for training an optical proximity correction or source mask optimization semiconductor process machine learning model, for example.
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公开(公告)号：US20240369356A1
公开(公告)日：2024-11-07
申请号：US18776207
申请日：2024-07-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yan WANG , Jian ZHANG , Zhiwen KANG , Yixiang WANG
Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.
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公开(公告)号：US20240361702A1
公开(公告)日：2024-10-31
申请号：US18621218
申请日：2024-03-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Anagnostis TSIATMAS , Paul Christiaan Hinnen , Elliott Gerard MC NAMARA , Thomas Theeuwes , Maria Isabel DE LA FUENTE VALENTIN , Mir Homayoun SHAHRJERDY , Arie Jeffrey DEN BOEF , Shu-jin WANG
CPC classification number: G03F7/70633 , G03F7/70625 , G03F7/70683 , G06T7/0006 , G03F7/20 , G06T2207/30148
Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.
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Patent Agency Ranking
公开(公告)号：US12130246B2
公开(公告)日：2024-10-29
申请号：US17419653
申请日：2019-12-19
Applicant: ASML Netherlands B.V.
CPC classification number: G01N23/20 , G03F7/70633 , G06T5/10 , G06T2207/30148
Abstract: A method includes receiving an image formed in a metrology apparatus wherein the image comprises at least the resulting effect of at least two diffraction orders, and processing the image wherein the processing comprises at least a filtering step, for example a Fourier filter. The process of applying a filter may be obtained also by placing an aperture in the detection branch of the metrology apparatus.
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公开(公告)号：US20240355578A1
公开(公告)日：2024-10-24
申请号：US18761319
申请日：2024-07-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Te-Sheng WANG , Szu-Po WANG , Kai-Yuan CHI
CPC classification number: H01J37/222 , H01J37/28
Abstract: Disclosed are non-transitory computer-readable media, systems, and computer-implemented methods that describe obtaining hot spot (HS) location information with respect to a printed pattern; obtaining LFP search criteria for searching the printed pattern to determine a local focus point (LFP) for an imaging device; selecting a HS area in the printed pattern that contains a HS; and determining the LFP proximate to the HS area based on the LFP search criteria, the LFP not containing the HS.
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公开(公告)号：US12124177B2
公开(公告)日：2024-10-22
申请号：US17782622
申请日：2020-11-18
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Mohamed Swillam , Simon Reinald Huisman , Justin Lloyd Kreuzer
CPC classification number: G03F7/706851 , G03F7/70633 , G03F7/7085 , G03F9/7046 , G03F9/7088
Abstract: A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.
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公开(公告)号：US20240345487A1
公开(公告)日：2024-10-17
申请号：US18681613
申请日：2022-08-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Rencheng SUN , Feng YANG , Meng LIU , Fei YAN
IPC: G03F7/00
CPC classification number: G03F7/705 , G03F7/70441
Abstract: Systems and methods for evaluating selected set of patterns of a design layout. A method herein includes obtaining (i) a first pattern set resulting from a pattern selection process, (ii) first pattern data associated with the first pattern set, (iii) characteristic data associated with the first pattern data, and (iv) second pattern data associated with a second pattern set. A machine learning model is trained based on the characteristic data, where the machine learning model being configured to predict pattern data for an input pattern. The second pattern set is input to the trained machine learning model to predict second pattern data of the second pattern set. The first pattern set is evaluated by comparing the second pattern data and the predicted second pattern data. If the evaluation indicates insufficient pattern coverage, additional patterns can be included to improve the pattern coverage.
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公开(公告)号：US12117739B2
公开(公告)日：2024-10-15
申请号：US17629202
申请日：2020-06-30
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70783 , G03F7/70266 , G03F7/70716 , G03F7/70891 , H02N2/009 , H02N2/028 , H02N2/062
Abstract: Disclosed is a thermo-mechanical actuator (100) comprising a piezo¬electric module (110), the piezo-electric module comprising at least one piezo-electric element (120), wherein the thermo-mechanical actuator is configured to: •o receive a thermal actuation signal (132) for controlling a thermal behaviour of the piezo-electric module, or •o provide a thermal sensing signal (132) representative of a thermal state of the piezo-electric module, and, wherein the thermo-mechanical actuator is configured to: •o receive a mechanical actuation (134) signal for controlling a mechanical behaviour of the piezo-electric module, or •o provide a mechanical sensing signal (134) representative of a mechanical state of the piezo-electric module.
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