公开(公告)号：US20210313908A1

公开(公告)日：2021-10-07

申请号：US17351181

申请日：2021-06-17

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis VAN DER TOORN ,  Jeroen Gertruda Antonius HUINCK ,  Han Willem Hendrik SEVERT ,  Allard Eelco KOOIKER ,  Michaël Johannes Christiaan RONDE ,  Arno Maria WELLINK ,  Shibing LIU ,  Ying LUO ,  Yixiang WANG ,  Chia-Yao CHEN ,  Bohang ZHU ,  Jurgen VAN SOEST

IPC: H02N13/00 ,  G03F7/20

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US20200335298A1

公开(公告)日：2020-10-22

申请号：US16852325

申请日：2020-04-17

Applicant: ASML Netherlands B.V.

Inventor： Yixiang WANG ,  Yanqiu WANG ,  Xiaodong HE ,  Guofan YE

IPC: H01J37/24 ,  H01J37/141

Abstract: Disclosed among other aspects is a power supply such as may be used in a charged particle inspection system. The power supply includes a direct current source such as a programmable linear current source connected to a controlled voltage source where the control signal for the controlled voltage source is derived from a measured voltage drop across the direct current source.

公开(公告)号：US20240396476A1

公开(公告)日：2024-11-28

申请号：US18670550

申请日：2024-05-21

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis VAN DER TOORN ,  Jeroen Gertruda Antonius HUINCK ,  Han Willem Hendrik SEVERT ,  Allard Eelco KOOIKER ,  Michael Johannes Christiaan RONDE ,  Arno Maria WELLINK ,  Shibing LIU ,  Ying LUO ,  Yixiang WANG ,  Chia-Yao CHEN ,  Bohang ZHU ,  Jurgen VAN SOEST

IPC: H02N13/00 ,  G03F7/00

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US20240379325A1

公开(公告)日：2024-11-14

申请号：US18431759

申请日：2024-02-02

Applicant: ASML Netherlands B.V.

Inventor： Frank Nan ZHANG ,  Zhongwei CHEN ,  Yixiang WANG ,  Ying Crystal SHEN

IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

公开(公告)号：US20200294762A1

公开(公告)日：2020-09-17

申请号：US16650815

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/22 ,  H01J37/244

Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.

公开(公告)号：US20200234915A1

公开(公告)日：2020-07-23

申请号：US16651337

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Yixiang WANG ,  Frank Nan ZHANG

IPC: H01J37/28 ,  H01J37/26 ,  G01N23/2251 ,  G01N23/203

Abstract: Disclosed herein is a method comprising: depositing a first amount of electric charges into a region of a sample, during a first time period; depositing a second amount of electric charges into the region, during a second time period; while scanning a probe spot generated on the sample by a beam of charged particles, recording from the probe spot signals representing interactions of the beam of charged particles and the sample; wherein an average rate of deposition during the first time period and an average rate of deposition during the second time period are different.

公开(公告)号：US20240044820A1

公开(公告)日：2024-02-08

申请号：US18484161

申请日：2023-10-10

Applicant: ASML Netherlands B.V.

Inventor： Kuo-Feng TSENG ,  Zhonghua DONG ,  Yixiang WANG ,  Zhong-wei CHEN

IPC: G01N23/2206 ,  G01N23/2251 ,  G01N23/203

CPC classification number: G01N23/2206 ,  G01N23/2251 ,  G01N23/203 ,  G01N2223/6116 ,  G01N2223/3307

Abstract: Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.

公开(公告)号：US20230395352A1

公开(公告)日：2023-12-07

申请号：US18362757

申请日：2023-07-31

Applicant: ASML Netherlands B.V.

Inventor： Ning YE ,  Jun JIANG ,  Jian ZHANG ,  Yixiang WANG

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/0047 ,  H01J2237/2817

Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

公开(公告)号：US20220328283A1

公开(公告)日：2022-10-13

申请号：US17638777

申请日：2020-08-20

Applicant: ASML Netherlands B.V.

Inventor： Jinmei YANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/28 ,  G01N23/2251 ,  H01J37/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.

公开(公告)号：US20220189733A1

公开(公告)日：2022-06-16

申请号：US17553357

申请日：2021-12-16

Applicant: ASML Netherlands B.V.

Inventor： Ning YE ,  Jun JIANG ,  Jian ZHANG ,  Yixiang WANG

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.