公开(公告)号：US20230178328A1

公开(公告)日：2023-06-08

申请号：US17913141

申请日：2021-03-18

Applicant: ASML Netherlands B.V.

Inventor： Yongxin WANG ,  Zhonghua DONG ,  Xiaoyu JI ,  Shahedul HOQUE ,  Weiming REN ,  Xuedong LIU ,  Guofan YE ,  Kuo-Chin CHIEN

IPC: H01J37/147

CPC classification number: H01J37/1474 ,  H01J2237/1504

Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.

公开(公告)号：US20200335298A1

公开(公告)日：2020-10-22

申请号：US16852325

申请日：2020-04-17

Applicant: ASML Netherlands B.V.

Inventor： Yixiang WANG ,  Yanqiu WANG ,  Xiaodong HE ,  Guofan YE

IPC: H01J37/24 ,  H01J37/141

Abstract: Disclosed among other aspects is a power supply such as may be used in a charged particle inspection system. The power supply includes a direct current source such as a programmable linear current source connected to a controlled voltage source where the control signal for the controlled voltage source is derived from a measured voltage drop across the direct current source.