公开(公告)号：US20240345487A1

公开(公告)日：2024-10-17

申请号：US18681613

申请日：2022-08-02

申请人： ASML NETHERLANDS B.V.

发明人： Rencheng SUN ,  Feng YANG ,  Meng LIU ,  Fei YAN

IPC分类号： G03F7/00

CPC分类号： G03F7/705 ,  G03F7/70441

摘要： Systems and methods for evaluating selected set of patterns of a design layout. A method herein includes obtaining (i) a first pattern set resulting from a pattern selection process, (ii) first pattern data associated with the first pattern set, (iii) characteristic data associated with the first pattern data, and (iv) second pattern data associated with a second pattern set. A machine learning model is trained based on the characteristic data, where the machine learning model being configured to predict pattern data for an input pattern. The second pattern set is input to the trained machine learning model to predict second pattern data of the second pattern set. The first pattern set is evaluated by comparing the second pattern data and the predicted second pattern data. If the evaluation indicates insufficient pattern coverage, additional patterns can be included to improve the pattern coverage.