公开(公告)号：US20150255249A1

公开(公告)日：2015-09-10

申请号：US14638786

申请日：2015-03-04

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/3007 ,  H01J2237/043 ,  H01J2237/0492 ,  H01J2237/12

Abstract: A multi charged particle beam writing apparatus includes an aperture member to form multiple beams, a blanking plate in which there are arranged a plurality of blankers to respectively perform blanking deflection for a corresponding beam in the multiple beams having passed through a plurality of openings of the aperture member, a blanking aperture member to block each beam having been deflected to be in OFF state by at least one of the plurality of blankers, a first grating lens, using the aperture member as gratings, to correct spherical aberration of the charged particle beam, and a correction lens configured to correct high order spherical aberration produced by the first grating lens.

Abstract translation: 多带电粒子束写入装置包括形成多个光束的孔径构件，其中布置有多个遮挡件，以分别对通过多个光束的多个光束的多个光束中的相应光束执行消隐偏转 孔径构件，用于阻挡已经被多个遮挡件中的至少一个偏转到处于关闭状态的每个光束的消隐孔径构件，使用孔径构件作为光栅的第一光栅透镜，以校正带电粒子束的球面像差 以及配置为校正由第一光栅透镜产生的高阶球面像差的校正透镜。

公开(公告)号：US20150248993A1

公开(公告)日：2015-09-03

申请号：US14631690

申请日：2015-02-25

Applicant: IMS Nanofabrication AG

Inventor： Rafael Reiter ,  Elmar Platzgummer ,  Klaus Schiessel

IPC: H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/3026 ,  H01J2237/0435 ,  H01J2237/3175 ,  H01J2237/31798

Abstract: An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a blanking aperture array in a particle-optical lithography apparatus which has a finite number of defects, said desired pattern being composed of a multitude of image elements within an image area on the target: A list of defective blanking apertures is provided, comprising information about the type of defect of the defective blanking apertures; from the desired pattern a nominal exposure pattern is calculated as a raster graphics over the image elements disregarding the defective blanking apertures; the “compromised” image elements (1105) are determined which are exposed by aperture images of defective blanking apertures; for each compromised element (1105), a set of neighboring image elements is selected as “correction elements” (1104); for each compromised element, corrected dose values are calculated for the correction elements, said corrected dose values minimizing an error functional of the deviation of the dose distribution including the defects from the nominal dose distribution, under the constraint that each of the corrected dose values falls within the allowed doses; and a corrected exposure pattern (1103) is generated by substituting the corrected dose values for the nominal dose values at the correction elements.

Abstract translation: 计算曝光图案，其用于通过具有有限数量的缺陷的粒子光学光刻设备中的消隐孔径阵列在目标上曝光期望的图案，所述期望图案由多个图像元素组成， 目标上的图像区域：提供了有缺陷的冲裁孔的列表，其包括关于有缺陷的冲裁孔的缺陷类型的信息; 从期望的图案，将标称曝光图案计算为不考虑有缺陷的消隐孔径的图像元素上的光栅图形; 确定通过有缺陷的冲裁孔的孔径图像曝光的“受损的”图像元件（1105） 对于每个受损元件（1105），一组相邻图像元素被选择为“校正元件”（1104）; 对于每个受损元件，针对校正元件计算校正剂量值，所述校正剂量值在每个校正剂量值下降的约束下使包括来自标称剂量分布的缺陷的剂量分布的偏差的误差功能最小化 在允许的剂量内; 并且通过将校正的剂量值替换为校正元件处的标称剂量值来生成校正的曝光图案（1103）。

公开(公告)号：US20150144801A1

公开(公告)日：2015-05-28

申请号：US14562954

申请日：2014-12-08

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Volker Wieczorek

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/04

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/2487 ,  H01J2237/2602

Abstract: A method of operating a particle beam system includes digitally controlling first and second digitally controlled modules of the particle beam system, and sending digital command data to the first and second digitally controlled modules. The digital command data include at least a first command for the first digitally controlled module and at least a second command for the second digitally controlled module. The digital command data is generated based on information representing: a) a time when the first command is to be executed by the first digitally controlled module; and b) a time when the second command is to be executed by the second digitally controlled module.

Abstract translation: 操作粒子束系统的方法包括数字控制粒子束系统的第一和第二数字控制模块，以及向第一和第二数字控制模块发送数字命令数据。 数字命令数据至少包括第一数字控制模块的第一命令和至少第二数字控制模块的第二命令。 基于表示以下信息生成数字命令数据：a）第一数字控制模块执行第一命令的时间; 以及b）第二命令由第二数字控制模块执行的时间。

公开(公告)号：US20150129773A1

公开(公告)日：2015-05-14

申请号：US14532430

申请日：2014-11-04

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO

IPC: H01J37/04 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/31761

Abstract: A blanking device for multi-charged particle beams includes plural shift registers arranged in two dimensions, and plural data transmitters each configured to be arranged, where each of first shift register groups is aligned in the same row or column, in the plural shift registers arranged in two dimensions, the plural data transmitters each arranged for each of second shift register groups each obtained by grouping shift registers of one of the first shift register groups into one or more groups, wherein each of the second shift register groups is further grouped into third shift register groups each having shift registers serially connected, as plural subgroups, and each of the plural data transmitters is connected to shift registers configuring a part of shift registers serially connected in each of the third shift register groups such that all of the plural subgroups in a corresponding second shift register group are parallelly connected.

Abstract translation: 一种用于多带电粒子束的消隐装置，包括：两个排列的多个移位寄存器，以及多个数据发送器，每个数据发送器被配置为在其中每个第一移位寄存器组在同一行或列中排列， 在二维中，多个数据发送器各自被布置用于每个第二移位寄存器组，每个通过将第一移位寄存器组中的一个的移位寄存器分组成一个或多个组而获得，其中每个第二移位寄存器组进一步分组为第三移位寄存器组 移位寄存器组各自具有串行连接的移位寄存器，作为多个子组，并且多个数据发送器中的每一个连接到移位寄存器，移位寄存器构成串行连接在每个第三移位寄存器组中的移位寄存器的一部分，使得所有多个子组 对应的第二移位寄存器组并联连接。

公开(公告)号：US20150090896A1

公开(公告)日：2015-04-02

申请号：US14488710

申请日：2014-09-17

Applicant: CANON KABUSHIKI KAISHA

Inventor： Go TSUCHIYA ,  Kazuya KIKUCHI

IPC: H01J37/04 ,  H01J37/302 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/30455

Abstract: The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus comprising two blanker arrays each including a plurality of first blankers which blank a plurality of charged particle beams individually and a plurality of second blankers which blank a plurality of charged particle beams in common, wherein the plurality of first blankers and the plurality of second blankers in each of the two blanker arrays are arranged such that one of the plurality of charged particle beams passes through corresponding one of the plurality of first blankers of one of the two blanker arrays and corresponding one of the plurality of second blankers of the other of the two blanker arrays.

Abstract translation: 本发明提供了一种在多个带电粒子束的基板上进行绘图的绘图装置，该装置包括两个消隐器阵列，每个消隐器阵列包括多个单独消除多个带电粒子束的第一消隐器和多个第二消隐器， 空白多个带电粒子束，其中，两个消隐器阵列中的每一个中的多个第一消隐器和多个第二消隐器被布置成使得多个带电粒子束中的一个穿过多个第一 两个消隐器阵列之一的消隐器和两个消隐器阵列中的另一个的多个第二消隐器中的相应一个。

公开(公告)号：US20150001417A1

公开(公告)日：2015-01-01

申请号：US14312953

申请日：2014-06-24

Applicant: CANON KABUSHIKI KAISHA

Inventor： Tomoyuki MORITA ,  Masato MURAKI

IPC: H01J37/04 ,  H01J37/317 ,  H01J37/30

CPC classification number: H01J37/045 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435

Abstract: The present invention provides a blanking apparatus comprising a plurality of blankers configured to respectively blank a plurality of beams with respect to a target position on an object, and a driving device configured to drive the plurality of blankers, wherein the driving device includes a change device configured to change relation between a combination of beams of the plurality of beams, and a target dose.

Abstract translation: 本发明提供了一种消隐装置，包括多个消隐器，其被配置为相对于物体上的目标位置分别对多个光束进行空白;以及驱动装置，其构造成驱动多个消隐器，其中，所述驱动装置包括改变装置 被配置为改变所述多个光束中的光束的组合与目标剂量之间的关系。

公开(公告)号：US08841636B2

公开(公告)日：2014-09-23

申请号：US12911859

申请日：2010-10-26

Applicant: Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/317 ,  H01J37/04 ,  B82Y40/00 ,  B82Y10/00 ,  H01J37/07

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the beamlets. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and are electrically connected to one or more modulators. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators. The shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.

Abstract translation: 本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。 该系统包括光束发生器，子束遮挡器阵列，屏蔽结构和投影系统。 束发生器被布置用于产生多个带电粒子子束。 子束消隐器阵列被布置成用于图形化子束。 子束遮蔽器阵列包括多个调制器和多个光敏元件。 光敏元件布置成接收携带光束的图案数据，并且电连接到一个或多个调制器。 屏蔽结构是导电材料，用于基本上屏蔽在光敏元件附近从调制器产生的电场。 屏蔽结构被设置为预定电位。 投影系统布置成将图案化的子束投影到目标表面上。

公开(公告)号：US08822960B2

公开(公告)日：2014-09-02

申请号：US13412013

申请日：2012-03-05

Applicant: Kimitaka Ozawa

Inventor： Kimitaka Ozawa

IPC: H01J37/28

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/304 ,  H01J2237/31766 ,  H01J2237/31774

Abstract: The charged particle beam drawing apparatus of the present invention is a charged particle beam drawing apparatus that renders a pattern on a substrate using a charged particle beam and includes a detector that detects charge amount depending on the irradiation of the charged particle beam; first and second deflectors that are arranged along the direction of the irradiation of the charged particle beam and are capable of deflecting the charged particle beam; and a controller that controls the first and second deflectors, wherein the controller transmits a signal, which is used for switching the irradiation/nonirradiation of the charged particle beam to the detector, to the first and second deflectors at a predetermined timing, and adjusts the operation timing of the first and second deflectors based on the output of the detector depending on the signal.

Abstract translation: 本发明的带电粒子束描绘装置是一种带电粒子束描绘装置，其使用带电粒子束在基板上形成图案，并包括根据带电粒子束的照射检测电荷量的检测器; 第一和第二偏转器，其沿着带电粒子束的照射方向布置并且能够使带电粒子束偏转; 以及控制器，其控制所述第一和第二偏转器，其中所述控制器在预定的定时将用于将所述带电粒子束的照射/非照射转换到所述检测器的信号传送到所述第一和第二偏转器，并且调整 根据检测器的输出信号，第一和第二偏转器的操作定时。

公开(公告)号：US08759787B2

公开(公告)日：2014-06-24

申请号：US13937321

申请日：2013-07-09

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

IPC: G21K5/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: The invention relates to a charged particle lithography system for patterning a target. The lithography system has a beam generator for generating a plurality of charged particle beamlets, a beam stop array with a beam-blocking surface provided with an array of apertures; and a modulation device for modulating the beamlets by deflection. The modulation device has a substrate provided with a plurality of modulators arranged in arrays, each modulator being provided with electrodes extending on opposing sides of a corresponding aperture. The modulators are arranged in groups for directing a group of beamlets towards a single aperture in the beam stop array. Individual modulators within each group have an orientation such that a passing beamlet, if blocking is desired, is directed to a blocking position onto the beam stop array. Beamlet blocking positions for different beamlets are substantially homogeneously spread around the corresponding single aperture in the beam stop array.

Abstract translation: 本发明涉及一种用于图案化靶的带电粒子光刻系统。 光刻系统具有用于产生多个带电粒子束的光束发生器，具有设置有孔阵列的光束阻挡表面的光束停止阵列; 以及用于通过偏转调制子束的调制装置。 调制装置具有设置有排列成阵列的多个调制器的基板，每个调制器设置有在对应的孔的相对侧上延伸的电极。 调制器被分组地布置成用于将一组子束引向光束停止阵列中的单个孔。 每个组内的各个调制器具有这样的取向，使得如果需要阻挡，则通过的子束被引导到光束停止阵列上的阻挡位置。 不同子束的光束阻挡位置基本均匀地分布在光束停止阵列中相应的单个孔周围。

公开(公告)号：US08723136B2

公开(公告)日：2014-05-13

申请号：US13626736

申请日：2012-09-25

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Volker Wieczorek

IPC: G21K5/02

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/2487 ,  H01J2237/2602

Abstract: A method of operating a particle beam system includes determining a deflection amount and a deflection time of a beam deflection module connected to a data network. The method also includes determining an un-blank time of a beam blanking module connected to the data network, and determining a blank time of the beam blanking module connected to the data network. The method further includes generating a data structure which includes plural data records, wherein each data record includes a command representing an instruction for at least one of the modules, and a command time representing a time at which the instruction is to be sent to the data network. In addition, the method includes sorting the records of the data structure by command time, and generating a set of digital commands based on the data structure. Moreover, the method includes sending the digital commands of the set to the network in an order corresponding to an order of the sorted records.

Abstract translation: 操作粒子束系统的方法包括确定连接到数据网络的光束偏转模块的偏转量和偏转时间。 该方法还包括确定连接到数据网络的波束消隐模块的非空白时间，以及确定连接到数据网络的波束消隐模块的空白时间。 该方法还包括生成包括多个数据记录的数据结构，其中每个数据记录包括表示至少一个模块的指令的命令，以及表示将指令发送到数据的时间的命令时间 网络。 此外，该方法包括通过命令时间对数据结构的记录进行排序，并且基于数据结构生成一组数字命令。 此外，该方法包括以与排序记录的顺序对应的顺序将集合的数字命令发送到网络。