公开(公告)号：US08110813B2

公开(公告)日：2012-02-07

申请号：US12769712

申请日：2010-04-29

Applicant: Norman Hendrikus Rudolf Baars ,  Gerardus Fernandus Ten Berge ,  Stijn Willem Herman Karel Steenbrink

Inventor： Norman Hendrikus Rudolf Baars ,  Gerardus Fernandus Ten Berge ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/2482

Abstract: A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction. A substantial part of the electrostatic deflector extends beyond the passing window in the first direction.

Abstract translation: 一种带电粒子光学系统，包括用于产生多个带电粒子束的子束发生器和用于偏转子束的静电偏转器。 静电偏转器包括适于连接到用于在电极之间产生电场以用于偏转子束的电压的电压的第一和第二电极，电极至少部分地独立于静电偏转器的有效区域。 电极限定至少一个通过的窗口，用于在电极之间通过至少一部分子束，通过窗口具有在第一方向上的长度和在横向上的宽度。 该系统适于将子束排列在至少一排中，并且通过静电偏转器的通过窗口（该行的子束在第一方向上延伸）引导单排的子束。 静电偏转器的主要部分在第一方向上延伸超过通过的窗口。

公开(公告)号：US07557357B2

公开(公告)日：2009-07-07

申请号：US11729898

申请日：2007-03-28

Applicant: Takamasa Satoh ,  Koichi Hidaka ,  Ryozo Yoshino

Inventor： Takamasa Satoh ,  Koichi Hidaka ,  Ryozo Yoshino

IPC: H03M1/10

CPC classification number: H03M1/1047 ,  H01J37/1477 ,  H01J2237/1504 ,  H03M1/66

Abstract: The present invention is related to a D/A conversion device, it is provided with a first D/A conversion circuit which receives input of digital data composed of plural bits and outputs a corresponding electric output signal, and a second D/A conversion circuit which receives input of a correction code for the digital data and which outputs a corresponding electric correction signal, wherein the first and second D/A conversion circuits are connected to each other at their respective output terminals so that the electric output signal is corrected by the electric correction signal. The D/A conversion device comprises: storing means 105 for storing correction codes each for one bit of the digital data, the correction codes being determined in correlation with the first D/A conversion circuit 11; and calculating means 107 for performing serial entry and addition of the correction codes each for one bit of the digital data, and outputting a correction code for all bits of the digital data.

Abstract translation: 本发明涉及一种D / A转换装置，它具有一个第一D / A转换电路，它接收由多个比特组成的数字数据的输入并输出相应的电输出信号，以及一个第二D / A转换电路 其接收数字数据的校正码的输入并输出相应的电校正信号，其中第一和第二D / A转换电路在它们各自的输出端彼此连接，使得电输出信号由 电校正信号。 D / A转换装置包括：存储装置105，用于存储每个数字数据的一位的校正码，校正码与第一D / A转换电路11相关确定; 以及用于对数字数据的一位执行校正码的串行输入和相加的计算装置107，并输出数字数据的所有比特的校正码。

公开(公告)号：US20080054185A1

公开(公告)日：2008-03-06

申请号：US11729898

申请日：2007-03-28

Applicant: Takamasa Satoh ,  Koichi Hidaka ,  Ryozo Yoshino

Inventor： Takamasa Satoh ,  Koichi Hidaka ,  Ryozo Yoshino

IPC: H01J3/26 ,  H03M1/66

CPC classification number: H03M1/1047 ,  H01J37/1477 ,  H01J2237/1504 ,  H03M1/66

Abstract: The present invention is related to a D/A conversion device, it is provided with a first D/A conversion circuit which receives input of digital data composed of plural bits and outputs a corresponding electric output signal, and a second D/A conversion circuit which receives input of a correction code for the digital data and which outputs a corresponding electric correction signal, wherein the first and second D/A conversion circuits are connected to each other at their respective output terminals so that the electric output signal is corrected by the electric correction signal. The D/A conversion device comprises: storing means 105 for storing correction codes each for one bit of the digital data, the correction codes being determined in correlation with the first D/A conversion circuit 11; and calculating means 107 for performing serial entry and addition of the correction codes each for one bit of the digital data, and outputting a correction code for all bits of the digital data.

Abstract translation: 本发明涉及一种D / A转换装置，它具有一个第一D / A转换电路，它接收由多个比特组成的数字数据的输入并输出相应的电输出信号，以及一个第二D / A转换电路 其接收数字数据的校正码的输入并输出相应的电校正信号，其中第一和第二D / A转换电路在它们各自的输出端彼此连接，使得电输出信号由 电校正信号。 D / A转换装置包括：存储装置105，用于存储每个数字数据的一位的校正码，校正码与第一D / A转换电路11相关确定; 以及用于对数字数据的一位执行校正码的串行输入和相加的计算装置107，并输出数字数据的所有比特的校正码。

公开(公告)号：US06958477B2

公开(公告)日：2005-10-25

申请号：US10695756

申请日：2003-10-30

Applicant: Yoshiaki Kohama

Inventor： Yoshiaki Kohama

IPC: H01J37/04 ,  G01N23/225 ,  G01Q10/00 ,  G01Q20/02 ,  G01Q30/02 ,  H01J37/26 ,  H01J37/28 ,  H01J37/304 ,  H01J37/244

CPC classification number: H01J37/045 ,  G01N23/2251 ,  H01J37/26 ,  H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/0203 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/221 ,  H01J2237/2817

Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of election beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.

Abstract translation: 电子束装置防止运动停止或减速引起的剂量快速增加，并且当样本和电子束相对移动时，在用电子束照射样本时保护样本。 电子束源输出电子束。 测量每单位面积照射的选择光束的剂量。 存储部分将每单位面积的预定剂量存储在样品的存储器中。 当每单位面积的测量剂量大于存储部分中存储的每单位面积的剂量时，检测器检测电子束的过度曝光。 控制器控制电子束源以减少电子束单位面积的剂量低于存储部分中存储的每单位面积的剂量。

公开(公告)号：US06518582B1

公开(公告)日：2003-02-11

申请号：US09664136

申请日：2000-09-19

Applicant: Yoshiaki Kohama

Inventor： Yoshiaki Kohama

IPC: G01N2300

CPC classification number: H01J37/045 ,  G01N23/2251 ,  H01J37/26 ,  H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/0203 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/221 ,  H01J2237/2817

Abstract: An electron beam apparatus prevents a rapid increase of dosage caused by stoppage or deceleration of movement and protects the specimen when the specimen is irradiated with the electron beam while the specimen and the electron beam are being relatively moved. An electron beam source outputs the electron beam. The dosage of electron beam irradiated per unit area of the specimen is measured. A storage section stores a predetermined dosage per unit area in memory for the specimen. A detector detects over exposure of the electron beam when the measured dosage per unit area is greater than the dosage per unit area stored in the storage section. A controller controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the storage section.

公开(公告)号：US20010013581A1

公开(公告)日：2001-08-16

申请号：US09826913

申请日：2001-04-06

Inventor： Akio Takemoto ,  Yoshihisa Ooaeh ,  Tomohiko Abe ,  Hiroshi Yasuda ,  Takamasa Satoh ,  Hideki Nasuno ,  Hidefumi Yabara ,  Kenichi Kawakami ,  Kiichi Sakamoto ,  Tomohiro Sakazaki ,  Isamu Seto ,  Masami Takigawa ,  Tatsuro Ohkawa

IPC: G21K005/10 ,  H01J037/08

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/024 ,  H01J2237/1502 ,  H01J2237/1504 ,  H01J2237/216 ,  H01J2237/30472

Abstract: A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a focus coil provided above the deflector, obtaining a focus distance for each of the first marks, obtaining deflection-efficiency-correction coefficients for each of the first marks, and using linear functions of the focus distance for approximating the deflection-efficiency-correction coefficients to obtain the deflection-efficiency-correction coefficients for an arbitrary value of the focus distance. A device for carrying out the method is also set forth.

公开(公告)号：US06242751B1

公开(公告)日：2001-06-05

申请号：US09353586

申请日：1999-07-15

Applicant: Akio Takemoto ,  Yoshihisa Ooaeh ,  Tomohiko Abe ,  Hiroshi Yasuda ,  Takamasa Satoh ,  Hideki Nasuno ,  Hidefumi Yabara ,  Kenichi Kawakami ,  Kiichi Sakamoto ,  Tomohiro Sakazaki ,  Isamu Seto ,  Masami Takigawa ,  Tatsuro Ohkawa

Inventor： Akio Takemoto ,  Yoshihisa Ooaeh ,  Tomohiko Abe ,  Hiroshi Yasuda ,  Takamasa Satoh ,  Hideki Nasuno ,  Hidefumi Yabara ,  Kenichi Kawakami ,  Kiichi Sakamoto ,  Tomohiro Sakazaki ,  Isamu Seto ,  Masami Takigawa ,  Tatsuro Ohkawa

IPC: H01J37302

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/024 ,  H01J2237/1502 ,  H01J2237/1504 ,  H01J2237/216 ,  H01J2237/30472

Abstract: A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a focus coil provided above the deflector, obtaining a focus distance for each of the first marks, obtaining deflection-efficiency-correction coefficients for each of the first marks, and using linear functions of the focus distance for approximating the deflection-efficiency-correction coefficients to obtain the deflection-efficiency-correction coefficients for an arbitrary value of the focus distance. A device for carrying out the method is also set forth.

Abstract translation: 通过将晶片引导到晶片，通过偏转器偏转的带电粒子束将晶片暴露于带电粒子束的方法包括以下步骤：在不同的高度处布置多个第一标记，将带电粒子束聚焦在每个 通过使用设置在偏转器上方的聚焦线圈的第一标记，获得每个第一标记的聚焦距离，获得每个第一标记的偏转效率校正系数，并且使用焦距的线性函数来近似偏转 - 效率校正系数，以获得针对焦距的任意值的偏转效率校正系数。 还提出了一种用于执行该方法的装置。

公开(公告)号：US5965895A

公开(公告)日：1999-10-12

申请号：US964331

申请日：1997-11-04

Applicant: Takamasa Satoh ,  Hiroshi Yasuda ,  Junichi Kai ,  Yoshihisa Oae ,  Hisayasu Nishino ,  Kiichi Sakamoto ,  Hidefumi Yabara ,  Isamu Seto ,  Masami Takigawa ,  Akio Yamada ,  Soichiro Arai ,  Tomohiko Abe ,  Takashi Kiuchi ,  Kenichi Miyazawa

Inventor： Takamasa Satoh ,  Hiroshi Yasuda ,  Junichi Kai ,  Yoshihisa Oae ,  Hisayasu Nishino ,  Kiichi Sakamoto ,  Hidefumi Yabara ,  Isamu Seto ,  Masami Takigawa ,  Akio Yamada ,  Soichiro Arai ,  Tomohiko Abe ,  Takashi Kiuchi ,  Kenichi Miyazawa

IPC: H01J37/153 ,  H01J37/302 ,  H01J37/317

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/1504

Abstract: A method for providing charged particle beam exposure onto an object having a plurality of chip areas with a plurality of aligning marks formed in correspondence to each of said chip areas. A charged particle beam is irradiated upon an object mounted on a mobile step based upon positions of the aligning marks. Actual positions of the alignment marks are detected and compared to the design positions of the alignment marks to determine approximate relationships which are used to calculate an actual position to perform exposure.

Abstract translation: 一种用于向具有多个芯片区域的物体提供带电粒子束曝光的方法，所述多个芯片区域具有与每个所述芯片区域对应形成的多个对准标记。 基于对准标记的位置，将带电粒子束照射在安装在移动台阶上的物体上。 检测对准标记的实际位置并与对准标记的设计位置进行比较，以确定用于计算执行曝光的实际位置的近似关系。

公开(公告)号：US5757015A

公开(公告)日：1998-05-26

申请号：US634410

申请日：1996-04-18

Applicant: Akio Takemoto ,  Yoshihisa Ooaeh ,  Tomohiko Abe ,  Hiroshi Yasuda ,  Takamasa Satoh ,  Hideki Nasuno ,  Hidefumi Yabara ,  Kenichi Kawakami ,  Kiichi Sakamoto ,  Tomohiro Sakazaki ,  Isamu Seto ,  Masami Takigawa ,  Tatsuro Ohkawa

Inventor： Akio Takemoto ,  Yoshihisa Ooaeh ,  Tomohiko Abe ,  Hiroshi Yasuda ,  Takamasa Satoh ,  Hideki Nasuno ,  Hidefumi Yabara ,  Kenichi Kawakami ,  Kiichi Sakamoto ,  Tomohiro Sakazaki ,  Isamu Seto ,  Masami Takigawa ,  Tatsuro Ohkawa

IPC: G21K5/10 ,  H01J37/08 ,  H01J37/302 ,  H01J37/304

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/024 ,  H01J2237/1502 ,  H01J2237/1504 ,  H01J2237/216 ,  H01J2237/30472

Abstract: A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a focus coil provided above the deflector, obtaining a focus distance for each of the first marks, obtaining deflection-efficiency-correction coefficients for each of the first marks, and using linear functions of the focus distance for approximating the deflection-efficiency-correction coefficients to obtain the deflection-efficiency-correction coefficients for an arbitrary value of the focus distance. A device for carrying out the method is also set forth.

Abstract translation: 通过将晶片引导到晶片，通过偏转器偏转的带电粒子束将晶片暴露于带电粒子束的方法包括以下步骤：在不同的高度处布置多个第一标记，将带电粒子束聚焦在每个 通过使用设置在偏转器上方的聚焦线圈的第一标记，获得每个第一标记的聚焦距离，获得每个第一标记的偏转效率校正系数，并且使用焦距的线性函数来近似偏转 - 效率校正系数，以获得针对焦距的任意值的偏转效率校正系数。 还介绍了一种用于执行该方法的设备。

公开(公告)号：US5546319A

公开(公告)日：1996-08-13

申请号：US379712

申请日：1995-01-27

Applicant: Takamasa Satoh ,  Hiroshi Yasuda ,  Junichi Kai ,  Yoshihisa Oae ,  Hisayasu Nishino ,  Kiichi Sakamoto ,  Hidefumi Yabara ,  Isamu Seto ,  Masami Takigawa ,  Akio Yamada ,  Soichiro Arai ,  Tomohiko Abe ,  Takashi Kiuchi ,  Kenichi Miyazawa

Inventor： Takamasa Satoh ,  Hiroshi Yasuda ,  Junichi Kai ,  Yoshihisa Oae ,  Hisayasu Nishino ,  Kiichi Sakamoto ,  Hidefumi Yabara ,  Isamu Seto ,  Masami Takigawa ,  Akio Yamada ,  Soichiro Arai ,  Tomohiko Abe ,  Takashi Kiuchi ,  Kenichi Miyazawa

IPC: H01J37/153 ,  H01J37/302 ,  H01J37/317 ,  H01J37/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/1504

Abstract: To improve in the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and a deflector, a glitch waveform generated during a step change in the output or a D/A converter at the preceding stage of the amplifier, is anticipated and is canceled out with a correction waveform, after the output of the D/A converter has settled, this output is sample held and the step change is interpolated at a smoothing circuit, the deflection area is increased by positioning a electrostatic deflector offset around the optical axis relative to another electrostatic deflector, the response speed of the main deflection is improved by adding auxiliary deflection coils of one or two turn, and the alignment time is reduced by combining the coordinate conversion in the wafer area and in the chip area. In order to correct the astigmatism of the electromagnetic lens, two stages or coils are provided and an electric current corresponding to the quantity of deflection is supplied to the coils.

Abstract translation: 为了提高曝光系统的吞吐量，通过在放大器和偏转器之间切换电阻来减小放大器的输出阶跃变化期间的设定时间，在输出的阶跃变化期间产生的毛刺波形或D / 在放大器的前级的A转换器被预期并且被校正波形抵消，在D / A转换器的输出已经稳定之后，该输出被采样保持，并且在平滑电路中内插步长变化， 通过相对于另一个静电偏转器定位围绕光轴的静电偏转器偏移来增加偏转区域，通过添加一或两匝的辅助偏转线圈来改善主偏转的响应速度，并且通过组合坐标 在晶片区域和芯片区域中的转换。 为了校正电磁透镜的散光，设置两级或线圈，并将与偏转量相对应的电流提供给线圈。