公开(公告)号：US20210046584A1

公开(公告)日：2021-02-18

申请号：US17088704

申请日：2020-11-04

Applicant: Gigaphoton Inc.

Inventor： Akira SUWA ,  Osamu WAKABAYASHI ,  Masashi SHIMBORI ,  Masakazu KOBAYASHI

IPC: B23K26/14 ,  B23K26/12

Abstract: A laser processing apparatus according to the present disclosure includes a placement base on which a processing receiving object is placed, an optical system that guides laser light to the processing receiving object, a gas supply port via which a gas is supplied to a laser light irradiated region of the processing receiving object, a gas recovery port via which the supplied gas is recovered, a mover that moves the irradiated region, and a controller that controls, in accordance with the moving direction of the irradiated region, the direction of the flow of the gas flowing from the gas supply port to the gas recovery port, and the controller changes the direction of the gas flow in response to a change in the moving direction of the irradiated region in such a way that the gas flows in the direction opposite the moving direction of the irradiated region.

公开(公告)号：US20200266105A1

公开(公告)日：2020-08-20

申请号：US16855427

申请日：2020-04-22

Applicant: Gigaphoton Inc. ,  KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION

Inventor： Hiroshi IKENOUE ,  Osamu WAKABAYASHI ,  Hiroaki OIZUMI ,  Akira SUWA

IPC: H01L21/78 ,  G02F1/01 ,  G02B27/09 ,  H01S3/11 ,  H01S3/225 ,  H01S3/23 ,  H01L21/223 ,  H01L21/268 ,  H01L21/67

Abstract: A laser irradiation method of irradiating, with a pulse laser beam, an irradiation object in which an impurity source film is formed on a semiconductor substrate includes: reading fluence per pulse of the pulse laser beam with which a rectangular irradiation region set on the irradiation object is irradiated and the number of irradiation pulses the irradiation region is irradiated, the fluence being equal to or larger than a threshold at or beyond which ablation potentially occurs to the impurity source film when the irradiation object is irradiated with pulses of the pulse laser beam in the irradiation pulse number and smaller than a threshold at or beyond which damage potentially occurs to the surface of the semiconductor substrate; calculating a scanning speed Vdx; and moving the irradiation object at the scanning speed Vdx relative to the irradiation region while irradiating the irradiation region with the pulse laser beam at the repetition frequency f.

公开(公告)号：US20200249452A1

公开(公告)日：2020-08-06

申请号：US16853611

申请日：2020-04-20

Applicant: Gigaphoton Inc.

Inventor： Akiyoshi SUZUKI ,  Osamu WAKABAYASHI

IPC: G02B19/00 ,  G02B27/09 ,  G02B5/00 ,  G02B27/30 ,  G02B26/08 ,  G01J1/42 ,  H01L21/027 ,  G03F7/20

Abstract: A laser radiation system according to a viewpoint of the present disclosure includes a first optical system configured to convert a first laser flux into a second laser flux, a multimirror device including mirrors, configured to be capable of controlling the angle of the attitude of each of the mirrors, and configured to divide the second laser flux into laser fluxes and reflect the laser fluxes in directions to produce the divided laser fluxes, a Fourier transform optical system configured to focus the divided laser fluxes, and a control section configured to control the angle of the attitude of each of the mirrors in such a way that the Fourier transform optical system superimposes the laser fluxes, which are divided by the mirrors separate from each other by at least a spatial coherence length of the second laser flux, on one another.

公开(公告)号：US20200244029A1

公开(公告)日：2020-07-30

申请号：US16853489

申请日：2020-04-20

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  H01S3/23 ,  B01D53/04 ,  B01D53/68 ,  B01D53/86

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20200068695A1

公开(公告)日：2020-02-27

申请号：US16665335

申请日：2019-10-28

Applicant: Gigaphoton Inc.

Inventor： Hitoshi NAGANO ,  Yasunori WADA ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  H01S3/16 ,  H01S3/13 ,  H01L21/027 ,  G21K1/06 ,  H01S3/00 ,  H01S3/23 ,  H01S3/107 ,  H01S3/10 ,  G03F7/20

Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.

公开(公告)号：US20190283179A1

公开(公告)日：2019-09-19

申请号：US16378102

申请日：2019-04-08

Applicant: Gigaphoton Inc.

Inventor： Kouji KAKIZAKI ,  Osamu WAKABAYASHI

IPC: B23K26/06 ,  B23K26/08 ,  B23K26/12 ,  B23K26/0622 ,  B23K26/03 ,  B23K26/16 ,  B23K26/362 ,  B23K26/40 ,  B23K26/064 ,  H01S3/13 ,  H01S3/225 ,  H01S3/23

Abstract: A laser processing system includes: a wavelength-variable laser device configured to output each of a laser beam at an absorption line as a wavelength at which light is absorbed by oxygen and a laser beam at a non-absorption line as a wavelength at which the amount of light absorption by oxygen is smaller than at the absorption line; an optical system configured to irradiate a workpiece with the laser beam; and a laser control unit configured to control the wavelength-variable laser device, set the wavelength of the laser beam output from the wavelength-variable laser device to be the non-absorption line when laser processing is performed on the surface of the workpiece in gas containing oxygen, and set the wavelength of the laser beam output from the wavelength-variable laser device to be the absorption line when ozone cleaning is performed on the surface of the workpiece in gas containing oxygen.

公开(公告)号：US20190245321A1

公开(公告)日：2019-08-08

申请号：US16389860

申请日：2019-04-19

Applicant: Gigaphoton Inc.

Inventor： Kouji KAKIZAKI ,  Osamu WAKABAYASHI

IPC: H01S3/10 ,  H01S3/11

CPC classification number: H01S3/10015 ,  H01S3/10 ,  H01S3/10084 ,  H01S3/11 ,  H01S3/2251

Abstract: A laser apparatus includes: (A) a solid-state laser apparatus that outputs burst seed pulsed light containing a plurality of pulses; (B) an excimer amplifier that amplifies the burst seed pulsed light in a discharge space in a single occurrence of discharge and outputs the amplified light as amplified burst pulsed light; (C) an energy sensor that measures the energy of the amplified burst pulsed light; and (D) a laser controller that corrects the timing at which the solid-state laser apparatus is caused to output the burst seed pulsed light based on the relationship of the difference between the timing at which the solid-state laser apparatus outputs the burst seed pulsed light and the timing at which the discharge occurs in the discharge space with a measured value of the energy.

公开(公告)号：US20190181607A1

公开(公告)日：2019-06-13

申请号：US16266357

申请日：2019-02-04

Applicant: Gigaphoton Inc.

Inventor： Hirotaka MIYAMOTO ,  Osamu WAKABAYASHI

IPC: H01S3/137 ,  H01S3/225 ,  G01J3/02 ,  H01S3/08

CPC classification number: H01S3/137 ,  G01J3/0229 ,  H01S3/08009 ,  H01S3/0812 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

Abstract: A laser apparatus includes first and second wavelength dispersion elements, an optical element, first and second actuators, and a control unit. The first wavelength dispersion element generates wavelength dispersion in a direction orthogonal to an electric discharge direction between a pair of electric discharge electrodes. The second wavelength dispersion element generates wavelength dispersion in a direction parallel to the electric discharge direction. The optical element corrects wavelength dispersion generated by the second wavelength dispersion element. The first actuator drives the first wavelength dispersion element. The second actuator drives the optical element. The control unit controls the first actuator so that the center wavelength of the laser light approaches to a target wavelength and controls the second actuator so as to correct the wavelength dispersion generated by the second wavelength dispersion element.

公开(公告)号：US20190081451A1

公开(公告)日：2019-03-14

申请号：US16185542

申请日：2018-11-09

Applicant: GIGAPHOTON INC.

Inventor： Akihiko KUROSU ,  Takashi MATSUNAGA ,  Hiroyuki MASUDA ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO ,  Takeshi OHTA

IPC: H01S3/036 ,  H01S3/04 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/097 ,  H01S3/225 ,  H01S3/041 ,  H01S3/134 ,  H01S3/13 ,  H01S3/08 ,  H01S3/03

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

公开(公告)号：US20190006817A1

公开(公告)日：2019-01-03

申请号：US16124434

申请日：2018-09-07

Applicant: GIGAPHOTON INC.

Inventor： Takashi ONOSE ,  Osamu WAKABAYASHI

IPC: H01S3/23 ,  H01S3/16 ,  H01S3/067 ,  G02F1/35 ,  G02F1/355 ,  H01S3/109 ,  H01S3/115 ,  H01S3/11 ,  H01S3/108

CPC classification number: H01S3/2308 ,  G02F1/353 ,  G02F1/3532 ,  G02F1/3551 ,  G02F2001/354 ,  H01S3/0092 ,  H01S3/06716 ,  H01S3/06754 ,  H01S3/09415 ,  H01S3/0971 ,  H01S3/10007 ,  H01S3/10015 ,  H01S3/1003 ,  H01S3/108 ,  H01S3/109 ,  H01S3/11 ,  H01S3/115 ,  H01S3/1618 ,  H01S3/2325 ,  H01S3/2366 ,  H01S3/2375 ,  H01S3/2391

Abstract: A solid state laser device includes a seed laser that outputs continuous wave laser seed light, a light intensity changeable unit that changes a light intensity thereof and outputs seed pulse light, a CW excitation laser that outputs continuous wave excitation light, an amplifier that amplifies the seed pulse light and outputs amplified light based on an amplification gain increased by the excitation light, a wavelength conversion unit that converts a wavelength of the amplified light and outputs harmonic light, and a light intensity control unit that allows the light intensity changeable unit to output the seed pulse light after a certain time elapsed from an input of an external trigger signal each time the signal is input and output suppression light that suppresses an increase of the amplification gain in a period after an output of the seed pulse light until an input of a next external trigger signal.