公开(公告)号：US20190333731A1

公开(公告)日：2019-10-31

申请号：US16394920

申请日：2019-04-25

Applicant: ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIVERSITY OF ARIZONA

Inventor： Mohammed Tharwat Hassan Mohammed

IPC: H01J37/06 ,  H01J37/05 ,  H01J37/22

Abstract: System and method for Ultrafast Electron Diffraction (UED) and Microscopy (UEM) configured to image atomic motion in real time with sub-femtosecond temporal resolution. Presented methodology utilizes the interaction of the pump optical pulse with the initial electron pulse that has been gated with the gating optical pulse. The initial electron pulse is generated in the electron microscope by the pulse of auxiliary light. In one case, the pump and gating pulses have attosecond duration and are duplicates of one another. The use of attosecond optical pulse (with frequency spectrum extending over two octaves in the visible and flanking spectral ranges) for optical gating of a pulse of electrons.

公开(公告)号：US20190318904A1

公开(公告)日：2019-10-17

申请号：US16256124

申请日：2019-01-24

Applicant: NISSIN ION EQUIPMENT CO., LTD.

Inventor： Tetsuro YAMAMOTO

IPC: H01J37/08 ,  H01J37/05

Abstract: An ion source is provided. The ion source includes a plasma generation container, an electron supply, an electromagnet and a shift means. The plasma generation container generates an ion beam to be extracted therefrom in an ion beam extraction direction. The electron supply supplies electrons into the plasma generation container. The electromagnet generates a magnetic field for capturing the electrons from the electron supply. The shift means shifts a center of the magnetic field in the ion beam extraction direction to change a rate of a desired type of ion to be contained in the ion beam.

公开(公告)号：US10431420B2

公开(公告)日：2019-10-01

申请号：US15971896

申请日：2018-05-04

Applicant: FEI Company

Inventor： Alexander Henstra ,  Peter Christiaan Tiemeijer

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/05 ,  H01J37/14 ,  H01J37/22

Abstract: A method of operating a Post Column Filter (PCF) in a Scanning/Transmission Electron Microscope, and a Post Column Filter configured to operate according to the method. In an embodiment, the method includes receiving, at an entrance plane, an incoming beam of electrons; dispersing, by an energy dispersive element, the incoming beam of electrons into an energy dispersed beam of electrons; disposing a first plurality of quadrupoles between the entrance plane and a slit plane; operating the PCF in an EELS mode; and operating the PCF in an EFTEM mode. Operating the PCF in an EELS mode includes exciting one or more quadrupoles of the first plurality of quadrupoles at a first excitation level, wherein the first excitation level does not enlarge the energy dispersion of the energy dispersed beam of electrons; and forming an image of the energy dispersed beam of electrons on the image plane, the image being an EELS spectrum. Operating the PCF in the EFTEM mode includes including a slit at the slit plane in an optical path; exciting one or more quadrupoles of the first plurality of quadrupoles at a second excitation level, the second excitation level different from the first excitation level; forming an energy dispersed focus of the energy dispersed beam of electrons on the slit at the slit plane; and enlarging the energy dispersion of the energy dispersed beam of electrons caused by the energy dispersive element based on the one or more first plurality quadrupoles excited at the second excitation level.

公开(公告)号：US20190171098A1

公开(公告)日：2019-06-06

申请号：US16273013

申请日：2019-02-11

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Richard C. Svrluga ,  Stephen M. Blinn

IPC: G03F1/80 ,  H01L21/265 ,  H01J37/05 ,  H01J37/317 ,  H01L21/311 ,  H01L21/02 ,  G03F1/82 ,  H05H3/02 ,  H01J37/147

Abstract: An apparatus and method provides a drug layer formed on a surface region of a medical device, the drug layer comprised of a drug deposition and a carbonized or densified layer formed from the drug deposition by irradiation on an outer surface of the drug deposition, wherein the carbonized or densified layer does not penetrate through the drug deposition and is adapted to release drug from the drug deposition at a predetermined rate.

公开(公告)号：US20190137868A1

公开(公告)日：2019-05-09

申请号：US16239272

申请日：2019-01-03

Applicant: Joseph B. Khoury ,  Laurence B. Tarrant ,  Sean R. Kirkpatrick

Inventor： Joseph B. Khoury ,  Laurence B. Tarrant ,  Sean R. Kirkpatrick

IPC: G03F1/80 ,  H01L21/265 ,  H01J37/05 ,  H01J37/317 ,  H01L21/311 ,  H01L21/02 ,  G03F1/82 ,  H05H3/02 ,  H01J37/147

Abstract: A method for preparing a biological material for implanting provides irradiating at least a portion of the surface of the material with an accelerated Neutral Beam.

公开(公告)号：US20190131104A1

公开(公告)日：2019-05-02

申请号：US16089269

申请日：2016-03-31

Applicant: HITACHI, LTD.

Inventor： Yasuhiro SHIRASAKI ,  Momoyo ENYAMA

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/28 ,  H01J37/153

Abstract: A charged particle beam device that detects a secondary charged particle beam generated by irradiation of a sample by a primary charged particle beam, includes: an image shift deflector that shifts an irradiation region for irradiation of the sample by the primary charged particle beam; a magnetic sector that separates the primary charged particle beam passing therein from the secondary charged particle beam from the sample using a magnetic field generated therein; a correction mechanism that is placed off of a trajectory of the primary charged particle beam but on a trajectory of the secondary charged particle beam inside the magnetic sector, the correction mechanism deflecting the secondary charged particle beam passing through; and a controller that controls the correction mechanism according to a defined relationship between a shift amount by the image shift deflector and a correction amount by the correction mechanism.

公开(公告)号：US10242840B2

公开(公告)日：2019-03-26

申请号：US15602761

申请日：2017-05-23

Applicant: Infineon Technologies AG

Inventor： Roland Rupp ,  Andre Brockmeier

IPC: H01J37/05 ,  H01J37/317

Abstract: A method of producing an implantation ion energy filter, suitable for processing a power semiconductor device. In one example, the method includes creating a preform having a first structure; providing an energy filter body material; and structuring the energy filter body material by using the preform, thereby establishing an energy filter body having a second structure.

公开(公告)号：US20180345242A1

公开(公告)日：2018-12-06

申请号：US16054243

申请日：2018-08-03

Applicant: Xyleco, Inc.

Inventor： Marshall Medoff

IPC: B01J19/08 ,  H01J37/05 ,  B01J19/10 ,  B01J19/12 ,  C10L1/02 ,  C10L9/00 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  C10L5/44

CPC classification number: B01J19/081 ,  B01J19/085 ,  B01J19/10 ,  B01J19/12 ,  B01J2219/0879 ,  B01J2219/12 ,  C10L1/02 ,  C10L5/44 ,  C10L9/00 ,  C10L2200/0469 ,  C10L2290/26 ,  C10L2290/36 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  H01J37/05 ,  Y02E50/30

Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

公开(公告)号：US20180301315A1

公开(公告)日：2018-10-18

申请号：US15952989

申请日：2018-04-13

Applicant: JEOL Ltd.

Inventor： Masaki Mukai

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/21 ,  H01J37/05 ,  H01J37/14 ,  H01J37/12

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/12 ,  H01J37/14 ,  H01J37/21 ,  H01J37/22 ,  H01J2237/057 ,  H01J2237/1532 ,  H01J2237/24578 ,  H01J2237/24585

Abstract: An electron microscope includes a monochromator, an image acquiring portion for obtaining an electron microscope image containing interference fringes of the electron beam formed by an aperture located behind the monochromator, a line profile acquiring portion for obtaining a plurality of line profiles passing through the center of the aperture on the EM image, an energy dispersion direction identifying portion for identifying the direction of energy dispersion of the monochromator on the basis of the line profiles obtained by the line profile acquiring portion, and an optics controller for controlling an optical system on the basis of a line profile in the direction of energy dispersion to bring the focal plane for the electron beam exiting from the monochromator into coincidence with the achromatic plane.

公开(公告)号：US20180292745A1

公开(公告)日：2018-10-11

申请号：US16008573

申请日：2018-06-14

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Kiet A. Chau ,  Son T. Chau

IPC: G03F1/80 ,  H01L21/265 ,  G03F1/82 ,  H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01L21/02 ,  H05H3/02 ,  H01L21/311 ,  B24B37/04 ,  H01L29/36

Abstract: A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening with high aspect ratio (into depth from opening to base or bottom divided by minimum space of the trench therebetween) by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.