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公开(公告)号：US20140199631A1
公开(公告)日：2014-07-17
申请号：US14108549
申请日：2013-12-17
IPC分类号： G03F7/038 , C07D309/12 , C07C69/533
CPC分类号： G03F7/0392 , C07C69/54 , C07C2602/42 , C07C2603/68 , C07D309/12 , G03F7/0046 , G03F7/0325 , G03F7/038 , G03F7/0397 , G03F7/2041
摘要： A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3 and R2 is H or an acid labile group. A resist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
摘要翻译： 用于抗蚀剂的聚合物可从具有式（1）的单体获得，其中R1是H，CH3或CF3，R2是H或酸不稳定基团。 包含聚合物的抗蚀剂组合物在碱性显影和有机溶剂显影期间显示出高灵敏度和高溶解度对比度。
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公开(公告)号：US11579529B2
公开(公告)日：2023-02-14
申请号：US16800478
申请日：2020-02-25
IPC分类号： G03F7/039 , G03F7/004 , C07D303/40 , C08F220/18 , C08F220/28 , G03F7/16 , G03F7/32 , G03F7/20 , G03F7/38
摘要： A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.
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33.发明授权公开(公告)号：US11548844B2
公开(公告)日：2023-01-10
申请号：US16417909
申请日：2019-05-21
发明人： Daisuke Domon , Masayoshi Sagehashi , Masaaki Kotake , Naoya Inoue , Keiichi Masunaga , Satoshi Watanabe
IPC分类号： G03F7/038 , G03F7/20 , G03F7/16 , G03F7/32 , G03F7/38 , G03F1/20 , G03F1/22 , C07C33/30 , C07C69/54 , C08F220/30 , G03F1/60 , C08F212/14 , C08F220/28
摘要： A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.
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公开(公告)号：US11009793B2
公开(公告)日：2021-05-18
申请号：US16108598
申请日：2018-08-22
IPC分类号： G03F7/00 , G03F7/039 , G03F7/20 , G03F7/038 , G03F7/004 , C08F220/28 , C08F220/30
摘要： A monomer and polymer having a substituent group capable of polarity switch under the action of acid are provided. A resist composition comprising the polymer forms at a high resolution a negative pattern insoluble in alkaline developer and having high etch resistance.
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公开(公告)号：US20200285152A1
公开(公告)日：2020-09-10
申请号：US16800478
申请日：2020-02-25
IPC分类号： G03F7/039 , G03F7/004 , C07D303/40 , C08F220/18 , C08F220/28
摘要： A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.
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公开(公告)号：US10023674B2
公开(公告)日：2018-07-17
申请号：US15426227
申请日：2017-02-07
发明人： Masayoshi Sagehashi , Masahiro Fukushima , Koji Hasegawa , Teppei Adachi , Kazuhiro Katayama , Jun Hatakeyama
IPC分类号： G03F7/004 , C08F222/20 , C07C69/675 , C08F220/28 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32 , C08F220/24 , C07C381/12 , C08F220/18 , C08F220/30
摘要： A monomer having a substituent group capable of polarity switch under the action of acid is provided. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high resolution and etch resistance which is insoluble in alkaline developer.
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公开(公告)号：US09927708B2
公开(公告)日：2018-03-27
申请号：US14991050
申请日：2016-01-08
IPC分类号： G03F7/40 , C09D133/10 , C09D137/00 , C09D135/02 , C09D125/18 , C08F12/20 , C08F12/24 , C08F212/14
CPC分类号： G03F7/40 , C08F12/20 , C08F12/24 , C08F212/14 , C09D125/18 , C09D133/10 , C09D135/02 , C09D137/00 , G03F7/0392 , G03F7/0397 , G03F7/325 , G03F7/405 , C08F2220/365 , C08F2220/282
摘要： A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a first polymer comprising recurring units capable of forming carboxyl, hydroxyl or lactone ring and a second polymer comprising recurring units capable of forming amino and fluorinated recurring units in an ester and/or ketone solvent, baking the coating, and removing the excessive shrink agent for thereby shrinking the size of spaces in the pattern.
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公开(公告)号：US09790166B2
公开(公告)日：2017-10-17
申请号：US15156411
申请日：2016-05-17
IPC分类号： G03F7/038 , G03F7/039 , C07C69/54 , C08F16/20 , C08F20/26 , C08F216/10 , C08F224/00 , G03F7/004
CPC分类号： C07C69/54 , C07C2601/08 , C07C2601/14 , C07C2603/74 , C08F216/10 , C08F220/20 , C08F224/00 , G03F7/0045 , G03F7/0046 , G03F7/0382 , C08F228/06 , C08F220/22
摘要： A pattern forming process is provided comprising the steps of applying a resist composition comprising a polymer comprising recurring units having formula (1a) and/or (1b), an acid generator and a solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing in an alkaline developer to form a negative tone pattern.
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公开(公告)号：US09740100B2
公开(公告)日：2017-08-22
申请号：US15041498
申请日：2016-02-11
IPC分类号： G03F7/038 , G03F7/039 , C08F224/00 , C08F228/06 , C07D307/04 , C07D493/18 , C07D307/93 , G03F7/32
CPC分类号： G03F7/038 , C07D307/04 , C07D307/93 , C07D493/18 , C08F224/00 , C08F228/06 , G03F7/039 , G03F7/0397 , G03F7/322 , G03F7/325
摘要： A polymer for resist use is obtainable from a hemiacetal compound having formula (1a) wherein R1 is H, CH3 or CF3, R2 to R4 each are H or a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k1=0 or 1, and k2=0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.
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公开(公告)号：US09663593B2
公开(公告)日：2017-05-30
申请号：US14752425
申请日：2015-06-26
IPC分类号： C08F28/02 , C08F14/18 , C08F214/18 , C08F228/02 , C08F128/02
CPC分类号： C08F28/02 , C08F14/18 , C08F14/185 , C08F128/02 , C08F214/18 , C08F214/182 , C08F214/186 , C08F228/02 , C08F218/14
摘要： The present invention provides a polymer compound for a conductive polymer, containing one or more repeating units (a) represented by the following general formula (1), the polymer compound for a conductive polymer being synthesized by ion-exchange of a lithium salt, a sodium salt, a potassium salt, or a nitrogen compound salt of a sulfonic acid residue, and having a weight average molecular weight in the range of 1,000 to 500,000. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material.
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