Lithographic plate having conformal overcoat and photosensitive layer on a rough substrate
    1.
    发明授权
    Lithographic plate having conformal overcoat and photosensitive layer on a rough substrate 有权
    平版印刷版在粗糙基材上具有保形外涂层和感光层

    公开(公告)号:US06495310B2

    公开(公告)日:2002-12-17

    申请号:US10046789

    申请日:2002-01-15

    Abstract: The present invention provides a lithographic printing plate comprising on a roughened substrate a substantially conformal photosensitive layer and a substantially conformal overcoat. The photosensitive layer is substantially conformally coated on the roughened substrate surface and the overcoat is substantially conformally coated on the photosensitive layer surface so that the surface of the overcoat has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic surface. The lithographic plate of such a configuration can provide no or low tackiness and excellent block resistance, while allowing excellent press durability. For on-press developable lithographic plate, such a plate configuration also allows excellent on-press developability.

    Abstract translation: 本发明提供一种平版印刷版,其在粗糙化的基材上包含基本上保形的感光层和基本上共形的外涂层。 感光层基本上保形地涂覆在粗糙化的基底表面上,并且外涂层基本上保形地涂覆在感光层表面上,使得外涂层的表面具有基本上对应于基底微观表面的主要峰和谷的峰谷。 这种构造的平版印刷板可以提供没有或低粘性和优异的阻挡性,同时具有优异的印刷耐久性。 对于印刷中可印刷的平版印刷版,这种印版配置也允许出色的印刷显影性。

    Method for making flexible circuits
    3.
    发明授权
    Method for making flexible circuits 失效
    制造柔性电路的方法

    公开(公告)号:US5227008A

    公开(公告)日:1993-07-13

    申请号:US823899

    申请日:1992-01-23

    Abstract: A process for making flexible circuits wherein the etching of a polymeric film is accomplished by dissolving portions thereof with concentrated aqueous base using an aqueous processible crosslinked photoresist as a mask, comprising the steps of laminating the resist on a polymeric film, exposing a pattern into the resist, developing the resist with a dilute aqueous solution until desired image is obtained, etching portions of the polymeric film not covered by the crosslinked resist with a concentrated base at a temperature of from about 50.degree. C. to about 120.degree. C., and then stripping the resist off the polymeric film.

    Abstract translation: 一种用于制造柔性电路的方法,其中通过使用水性可加工的交联光致抗蚀剂作为掩模将其部分溶解在浓缩的水性碱中来实现聚合物膜的蚀刻,包括以下步骤:将抗蚀剂层压在聚合物膜上,将图案暴露于 抗蚀剂,用稀释的水溶液显影抗蚀剂,直到获得所需的图像,在约50℃至约120℃的温度下,用浓缩碱蚀刻未被交联抗蚀剂覆盖的聚合物膜的部分, 然后将抗蚀剂剥离聚合物膜。

    Radiation curable cellulose compositions
    4.
    发明授权
    Radiation curable cellulose compositions 失效
    辐射固化纤维素组合物

    公开(公告)号:US4147603A

    公开(公告)日:1979-04-03

    申请号:US709016

    申请日:1976-07-27

    CPC classification number: G03F7/0325 C09D101/14 Y10S430/114

    Abstract: Novel radiation-curable coating compositions comprising curable cellulose esters dissolved in unsaturated monomer and containing a photoinitiator. In particular, the cellulose ester contains a .beta.-alkyl amino or .beta.-arylamino carboxylate moiety. Exposure of these compositions to ultraviolet radiation in the presence of ketonic photoinitiators gives clear insoluble coatings which are useful as protective coatings for substrates such as wood, glass, aluminum, and steel.

    Abstract translation: 新型可辐射固化涂料组合物,其包含溶解在不饱和单体中并含有光引发剂的可固化纤维素酯。 特别地,纤维素酯含有β-烷基氨基或β-芳基氨基羧酸酯部分。 在存在酮光引发剂的情况下,将这些组合物暴露于紫外线辐射下,得到透明的不溶性涂层,其可用作木材,玻璃,铝和钢等基材的保护涂层。

    Photosensitive resin composition containing pullulan or esters thereof
    5.
    发明授权
    Photosensitive resin composition containing pullulan or esters thereof 失效
    含有支链淀粉或其酯的感光性树脂组合物

    公开(公告)号:US3960685A

    公开(公告)日:1976-06-01

    申请号:US521151

    申请日:1974-11-05

    CPC classification number: G03F7/0325

    Abstract: A photosensitive resin composition comprising pullulan, which is a polymer having repetition units of maltotriose and is represented by the formula, ##SPC1##Wherein n is an integer of 20 to 8,000, and/or a derivative thereof, a photopolymerizable monomer, a photosensitizer and a thermal polymerization inhibitor, or comprising the said pullulan, which has been incorporated with a photoactive reaction group to provide photosensitivity, and a photosensitizer, is a novel composition low in viscosity which can be prepared by use of water and can be formed into a photosensitive plate capable of being developed with water to give a clear image. Since the pullulan in said composition has no toxicity, the waste water formed at the time of development of said photosensitive plate can be treated with ease.

    Abstract translation: 一种感光性树脂组合物,其包含支链淀粉,其是具有麦芽三糖重复单元并由下式表示的聚合物:其中N是20至8,000的整数,和/或其衍生物,可光聚合的单体,光致变色剂和热聚合 抑制剂或包含已经与光敏反应组合并提供光敏性的已知PULLULAN和光敏剂是一种低粘度的新型组合物,可通过使用水制备,并可形成可感知的感光层 用水开发以清除图像。 由于所述组合物中的支链淀粉没有毒性,因此可以容易地处理在所述感光板显影时形成的废水。

    Methods for imaging and processing negative-working imageable elements
    10.
    发明授权
    Methods for imaging and processing negative-working imageable elements 失效
    用于成像和处理负性可成像元件的方法

    公开(公告)号:US07763413B2

    公开(公告)日:2010-07-27

    申请号:US11872772

    申请日:2007-10-16

    Abstract: An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a negative-working imagable element having an outermost imagable layer that includes a free radically polymerizable component, a free radical initiator composition comprising a diaryliodonium borate, and an infrared radiation absorbing compound. The imagable layer also includes a polymeric binder that is represented by the following Structure (I): -(A)w-(A′)w′-  (I) wherein A represents recurring units comprising a pendant reactive vinyl group, A′ represents recurring units other than those represented by A, w is from about 1 to about 70 mol %, and w′ is from about 30 to about 99 mol %. The imagewise exposed element is developed with a gum to remove only the non-exposed regions. The gum has a pH greater than 7 and up to about 11 and at least 1 weight % of an anionic surfactant.

    Abstract translation: 成像和显影元件,例如平版印刷版,通过具有最外层成像层的负作用可成像元件的红外辐射成像提供,该最外可成像层包括可自由基聚合的组分,包含二芳基碘鎓硼酸盐的自由基引发剂组合物和 红外辐射吸收化合物。 可成像层还包括由以下结构(I)表示的聚合物粘合剂: - (A)w-(A')w'-(I)其中A表示包含侧链的反应性乙烯基的重复单元,A'表示 除了由A代表的重复单元,w为约1至约70mol%,w'为约30至约99mol%。 成像曝光元件用树胶显影,仅去除非曝光区域。 口香糖具有大于7且高至约11和至少1重量%阴离子表面活性剂的pH。

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