Abstract:
The present invention provides a lithographic printing plate comprising on a roughened substrate a substantially conformal photosensitive layer and a substantially conformal overcoat. The photosensitive layer is substantially conformally coated on the roughened substrate surface and the overcoat is substantially conformally coated on the photosensitive layer surface so that the surface of the overcoat has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic surface. The lithographic plate of such a configuration can provide no or low tackiness and excellent block resistance, while allowing excellent press durability. For on-press developable lithographic plate, such a plate configuration also allows excellent on-press developability.
Abstract:
The present invention provides a lithographic printing plate comprising on a roughened substrate a substantially conformal photosensitive layer and a substantially conformal overcoat. The photosensitive layer is substantially conformally coated on the roughened substrate surface and the overcoat is substantially conformally coated on the photosensitive layer surface so that the surface of the overcoat has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic surface. The lithographic plate of such a configuration can provide no or low tackiness and excellent block resistance, while allowing excellent press durability. For on-press developable lithographic plate, such a plate configuration also allows excellent on-press developability.
Abstract:
A process for making flexible circuits wherein the etching of a polymeric film is accomplished by dissolving portions thereof with concentrated aqueous base using an aqueous processible crosslinked photoresist as a mask, comprising the steps of laminating the resist on a polymeric film, exposing a pattern into the resist, developing the resist with a dilute aqueous solution until desired image is obtained, etching portions of the polymeric film not covered by the crosslinked resist with a concentrated base at a temperature of from about 50.degree. C. to about 120.degree. C., and then stripping the resist off the polymeric film.
Abstract:
Novel radiation-curable coating compositions comprising curable cellulose esters dissolved in unsaturated monomer and containing a photoinitiator. In particular, the cellulose ester contains a .beta.-alkyl amino or .beta.-arylamino carboxylate moiety. Exposure of these compositions to ultraviolet radiation in the presence of ketonic photoinitiators gives clear insoluble coatings which are useful as protective coatings for substrates such as wood, glass, aluminum, and steel.
Abstract:
A photosensitive resin composition comprising pullulan, which is a polymer having repetition units of maltotriose and is represented by the formula, ##SPC1##Wherein n is an integer of 20 to 8,000, and/or a derivative thereof, a photopolymerizable monomer, a photosensitizer and a thermal polymerization inhibitor, or comprising the said pullulan, which has been incorporated with a photoactive reaction group to provide photosensitivity, and a photosensitizer, is a novel composition low in viscosity which can be prepared by use of water and can be formed into a photosensitive plate capable of being developed with water to give a clear image. Since the pullulan in said composition has no toxicity, the waste water formed at the time of development of said photosensitive plate can be treated with ease.
Abstract:
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.
Abstract:
A composition for touch panel electrode lines, a method of forming touch panel electrode lines, and a touch panel including electrode lines fabricated using the same. The composition for touch panel electrode lines includes a conductive powder, an organic binder, a photoinitiator, a photopolymerizable compound, and a solvent, wherein the conductive powder includes silver powder and ITO powder, and the ITO powder has an average particle diameter (D50) of about 1 nm to about 100 nm and a specific surface area (BET) of about 10 m2/g to about 50 m2/g.
Abstract:
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.
Abstract:
An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a negative-working imagable element having an outermost imagable layer that includes a free radically polymerizable component, a free radical initiator composition comprising a diaryliodonium borate, and an infrared radiation absorbing compound. The imagable layer also includes a polymeric binder that is represented by the following Structure (I): -(A)w-(A′)w′- (I) wherein A represents recurring units comprising a pendant reactive vinyl group, A′ represents recurring units other than those represented by A, w is from about 1 to about 70 mol %, and w′ is from about 30 to about 99 mol %. The imagewise exposed element is developed with a gum to remove only the non-exposed regions. The gum has a pH greater than 7 and up to about 11 and at least 1 weight % of an anionic surfactant.