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公开(公告)号：US11492337B2
公开(公告)日：2022-11-08
申请号：US16800447
申请日：2020-02-25
IPC分类号： C07D303/06 , G03F7/004 , G03F7/038 , G03F7/039 , C08F212/08 , C08F220/38 , C08L33/14
摘要： An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.
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公开(公告)号：US11286320B2
公开(公告)日：2022-03-29
申请号：US16744594
申请日：2020-01-16
IPC分类号： C08F212/14 , C08F220/68 , C08F220/38 , C07C43/23
摘要： Polymerization reaction is performed using a polymerizable monomer shown by the following general formula (1) and at least one monomer selected from monomers each having a structure of a salt among a lithium salt, a sodium salt, a potassium salt, and a nitrogen compound salt of a fluorosulfonic acid or the like; then, the structure of the salt of the repeating unit of a polymer obtained by the polymerization reaction is changed to the fluorosulfonic acid or the like by ion exchange. Thus, the present invention provides a polymer compound for a conductive polymer and a method for producing the polymer compound which is suitably used as a dopant for a fuel cell and a conductive material, and which is a copolymer containing a repeating unit of styrene having a 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylisobutyl ether group, and a repeating unit having any of a fluorosulfonic acid, a fluorosulfonimide group, and a n-carbonyl-fluoro-sulfonamide group.
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公开(公告)号：US20200283400A1
公开(公告)日：2020-09-10
申请号：US16800447
申请日：2020-02-25
IPC分类号： C07D303/06 , G03F7/004 , G03F7/038 , C08L33/14 , C08F212/08 , C08F220/38 , G03F7/039
摘要： An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.
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公开(公告)号：US20200159115A1
公开(公告)日：2020-05-21
申请号：US16669780
申请日：2019-10-31
发明人： Emiko Ono , Masayoshi Sagehashi , Masahiro Fukushima , Yuki Kera
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038 , C07D307/77 , C07C381/12 , C07C309/12 , C07D311/00 , C07D333/76 , C07D333/08 , C07D327/06 , C08F220/18
摘要： A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
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公开(公告)号：US10591819B2
公开(公告)日：2020-03-17
申请号：US16380093
申请日：2019-04-10
IPC分类号： G03F7/038 , C08F220/28 , C09D133/16 , C07D307/93 , C07D493/08 , C07D493/18 , G03F7/004 , G03F7/32 , C07C69/653 , C08F220/68 , G03F7/16 , G03F7/20
摘要： A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R1-R6 are monovalent hydrocarbon groups, X1 is a divalent hydrocarbon, group, Z1 is an aliphatic group, Z2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.
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公开(公告)号：US10131730B2
公开(公告)日：2018-11-20
申请号：US14836081
申请日：2015-08-26
IPC分类号： G03F7/039 , G03F7/038 , G03F7/30 , G03F7/32 , C08F220/18 , C08F224/00 , G03F7/004
摘要： A resist composition comprising a polymer comprising recurring units of lactone and a PAG is provided. The resist composition has a high dissolution contrast during organic solvent development, and improved resist properties including MEF and CDU and forms a fine hole pattern with improved roundness and size control.
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公开(公告)号：US10126649B2
公开(公告)日：2018-11-13
申请号：US15634469
申请日：2017-06-27
IPC分类号： G03F7/004 , G03F7/30 , C08F220/22 , C08F220/24 , C08F220/28 , C08F220/30 , C08F220/38 , C08F220/56 , C08F224/00 , C08F228/02 , G03F7/039 , G03F7/20 , C08F28/02 , C08F220/18 , G03F7/16 , G03F7/32 , G03F7/38
摘要： The present invention provides a resist composition containing a base resin composed of a polymer compound that contains a repeating unit “a” shown by formula (1) and a repeating unit “b” having either or both of a carboxyl group in which a hydrogen atom is substituted with an acid-labile group and a phenolic hydroxyl group in which a hydrogen atom is substituted with an acid-labile group, with a weight average molecular weight of 1,000 to 500,000. There can be provided a resist composition that has high sensitivity and high resolution, and can give a pattern with low dimensional variation and good pattern profile after exposure. wherein R1 represents a hydrogen atom or a methyl group; Z represents a hydroxybenzoquinone group, or a hydroxynaphthoquinone group optionally containing a substituent; and a fraction “a” of the repeating unit “a” satisfies 0
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公开(公告)号：US09758609B2
公开(公告)日：2017-09-12
申请号：US14972612
申请日：2015-12-17
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C08F220/28 , C08F220/20 , C08F224/00 , C07C69/54
CPC分类号： C08F224/00 , C07C69/54 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C08F220/20 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , C08F220/22 , C08F2220/283 , C08F2220/382 , C08F212/04 , C08F212/32
摘要： A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution.
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公开(公告)号：US20170226252A1
公开(公告)日：2017-08-10
申请号：US15426227
申请日：2017-02-07
发明人： Masayoshi Sagehashi , Masahiro Fukushima , Koji Hasegawa , Teppei Adachi , Kazuhiro Katayama , Jun Hatakeyama
IPC分类号： C08F222/20 , C08F220/28 , G03F7/004 , G03F7/32 , G03F7/16 , G03F7/20 , G03F7/38 , C07C69/675 , G03F7/038
CPC分类号： C08F222/20 , C07C69/675 , C07C381/12 , C07C2601/14 , C07C2603/14 , C07C2603/74 , C08F220/18 , C08F220/24 , C08F220/28 , C08F220/30 , C08F2220/283 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0388 , G03F7/0397 , G03F7/162 , G03F7/168 , G03F7/2004 , G03F7/322 , G03F7/38
摘要： A monomer having a substituent group capable of polarity switch under the action of acid is provided. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high resolution and etch resistance which is insoluble in alkaline developer.
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公开(公告)号：US20160179002A1
公开(公告)日：2016-06-23
申请号：US14972612
申请日：2015-12-17
IPC分类号： G03F7/038 , C08F224/00 , C07C69/593 , C08F220/68 , C07C69/013 , C07C69/54
CPC分类号： C08F224/00 , C07C69/54 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C08F220/20 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , C08F220/22 , C08F2220/283 , C08F2220/382 , C08F212/04 , C08F212/32
摘要： A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution.
摘要翻译： 提供具有多个叔醇羟基的单体。 通过聚合单体获得有用的聚合物。 从包含聚合物的抗蚀剂组合物，以高分辨率形成不溶于碱性显影剂并具有高耐蚀刻性的负型图案。
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