发明申请
- 专利标题： NOVEL SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
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申请号： US16669780申请日： 2019-10-31
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公开(公告)号： US20200159115A1公开(公告)日： 2020-05-21
- 发明人: Emiko Ono , Masayoshi Sagehashi , Masahiro Fukushima , Yuki Kera
- 申请人： Shin-Etsu Chemical Co., Ltd.
- 申请人地址： JP Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 优先权： com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@77f01ac0
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/039 ; G03F7/038 ; C07D307/77 ; C07C381/12 ; C07C309/12 ; C07D311/00 ; C07D333/76 ; C07D333/08 ; C07D327/06 ; C08F220/18
摘要：
A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
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