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公开(公告)号：US20210096465A1
公开(公告)日：2021-04-01
申请号：US17022368
申请日：2020-09-16
IPC分类号： G03F7/038 , C08F220/40 , C09D133/08 , G03F7/039 , C08F212/14 , C09D125/18 , C08F220/28 , C09D133/14
摘要： A polymer comprising recurring units having a multiple bond-containing acid labile group, recurring units having a phenolic hydroxyl group, and recurring units adapted to generate an acid upon exposure is used to formulate a resist composition, which exhibits a high sensitivity, low LWR and improved CDU when processed by lithography using EUV of wavelength 13.5 nm.
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公开(公告)号：US11435666B2
公开(公告)日：2022-09-06
申请号：US16669780
申请日：2019-10-31
发明人： Emiko Ono , Masayoshi Sagehashi , Masahiro Fukushima , Yuki Kera
IPC分类号： G03F7/004 , G03F7/038 , C07D307/77 , C07C381/12 , C07C309/12 , C07D311/00 , C07D333/76 , C07D333/08 , C07D327/06 , C08F220/18 , G03F7/039 , G03F7/32 , G03F7/16 , G03F7/20 , G03F7/38
摘要： A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
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公开(公告)号：US20200159115A1
公开(公告)日：2020-05-21
申请号：US16669780
申请日：2019-10-31
发明人： Emiko Ono , Masayoshi Sagehashi , Masahiro Fukushima , Yuki Kera
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038 , C07D307/77 , C07C381/12 , C07C309/12 , C07D311/00 , C07D333/76 , C07D333/08 , C07D327/06 , C08F220/18
摘要： A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
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公开(公告)号：US12032289B2
公开(公告)日：2024-07-09
申请号：US17022368
申请日：2020-09-16
IPC分类号： G03F7/038 , C08F212/14 , C08F220/28 , C08F220/40 , C09D125/18 , C09D133/08 , C09D133/14 , G03F7/039
CPC分类号： G03F7/0388 , C08F212/24 , C08F220/283 , C08F220/40 , C09D125/18 , C09D133/08 , C09D133/14 , G03F7/039
摘要： A polymer comprising recurring units having a multiple bond-containing acid labile group, recurring units having a phenolic hydroxyl group, and recurring units adapted to generate an acid upon exposure is used to formulate a resist composition, which exhibits a high sensitivity, low LWR and improved CDU when processed by lithography using EUV of wavelength 13.5 nm.
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