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公开(公告)号：US11492337B2
公开(公告)日：2022-11-08
申请号：US16800447
申请日：2020-02-25
IPC分类号： C07D303/06 , G03F7/004 , G03F7/038 , G03F7/039 , C08F212/08 , C08F220/38 , C08L33/14
摘要： An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.
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公开(公告)号：US20200283400A1
公开(公告)日：2020-09-10
申请号：US16800447
申请日：2020-02-25
IPC分类号： C07D303/06 , G03F7/004 , G03F7/038 , C08L33/14 , C08F212/08 , C08F220/38 , G03F7/039
摘要： An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.
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公开(公告)号：US11579529B2
公开(公告)日：2023-02-14
申请号：US16800478
申请日：2020-02-25
IPC分类号： G03F7/039 , G03F7/004 , C07D303/40 , C08F220/18 , C08F220/28 , G03F7/16 , G03F7/32 , G03F7/20 , G03F7/38
摘要： A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.
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公开(公告)号：US20200285152A1
公开(公告)日：2020-09-10
申请号：US16800478
申请日：2020-02-25
IPC分类号： G03F7/039 , G03F7/004 , C07D303/40 , C08F220/18 , C08F220/28
摘要： A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.
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