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1.发明公开公开(公告)号：US20240329532A1
公开(公告)日：2024-10-03
申请号：US18599750
申请日：2024-03-08
发明人： Masahiro Fukushima , Satoshi Watanabe , Kenji Funatsu , Keiichi Masunaga , Masaaki Kotake , Yuta Matsuzawa
CPC分类号： G03F7/0392 , G03F7/32
摘要： An acetal modifier affording a triple bond-bearing group serving as a protective group for an aliphatic or aromatic hydroxy group is provided as well as a polymer adapted to turn alkali soluble as a result of deprotection under the action of acid, the polymer comprising repeat units A1 having on side chain a structure including an aromatic hydroxy group protected with a triple bond-bearing group acid labile group. A chemically amplified positive resist composition comprising the polymer is also provided.
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公开(公告)号：US20240118613A1
公开(公告)日：2024-04-11
申请号：US18239333
申请日：2023-08-29
发明人： Keiichi Masunaga , Satoshi Watanabe , Masaaki Kotake , Kenji Funatsu , Masahiro Fukushima , Yuta Matsuzawa
IPC分类号： G03F7/039 , C08F212/14 , G03F1/76
CPC分类号： G03F7/0392 , C08F212/24 , G03F1/76 , G03F7/0397
摘要： A chemically amplified positive resist composition is provided comprising a polymer comprising units containing a phenolic hydroxy group and units containing a phenolic hydroxy group protected with an acid labile group, in which a carbon atom neighboring the carbon atom to which the phenolic hydroxy group protected with an acid labile group is attached is substituted with a specific group. A resist pattern with a high resolution, reduced LER, rectangularity, minimized influence of develop loading, and few development residue defects can be formed.
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公开(公告)号：US20240094635A1
公开(公告)日：2024-03-21
申请号：US18229232
申请日：2023-08-02
发明人： Keiichi Masunaga , Satoshi Watanabe , Kenji Funatsu , Masahiro Fukushima , Masaaki Kotake , Yuta Matsuzawa
IPC分类号： G03F7/039 , C08F212/14
CPC分类号： G03F7/0395 , C08F212/24
摘要： A chemically amplified positive resist composition comprising (A) a base polymer, (B) a photoacid generator, and (C) a quencher is provided. The base polymer (A) contains a polymer comprising phenolic hydroxy group-containing units, aromatic ring-containing units, and units containing a phenolic hydroxy group protected with an acid labile group. The photoacid generator (B) and the quencher (C) are present in a weight ratio (B)/(C) of less than 3/1. The resist composition exhibits a very high isolated-space resolution and forms a pattern with reduced LER, rectangularity, minimized influences of develop loading and residue defects.
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公开(公告)号：US11852974B2
公开(公告)日：2023-12-26
申请号：US16801357
申请日：2020-02-26
IPC分类号： G03F7/11 , C08G73/02 , C08K5/098 , C08K5/09 , C09D179/02 , G03F7/20 , G03F7/32 , C08K5/19 , C09D5/24
CPC分类号： G03F7/11 , C08G73/0266 , C08K5/098 , C08K5/19 , C09D5/24 , C09D179/02 , G03F7/20 , G03F7/327
摘要： An object of the present invention is to provide a conductive polymer composition which has good filterability and good film formability of a flat film on an electron beam resist and can be suitably used for an antistatic film for electron beam resist writing, showing excellent antistatic property in the electron beam writing process due to the property of low volume resistivity (Ω·cm), and, reducing an effect on lithography by making an effect of an acid diffused from the film minimum, and further having excellent peelability by H2O or an alkaline developer after writing.
A conductive polymer composition which comprises (A) a polyaniline-based conductive polymer having at least one kind or more of a repeating unit represented by the following general formula (1), and (B) a carboxylic acid salt represented by the following general formula (2):-
公开(公告)号：US20220276557A1
公开(公告)日：2022-09-01
申请号：US17591719
申请日：2022-02-03
摘要： A chemically amplified negative resist composition comprising (A) a sulfurane or selenurane compound having formula (A1) wherein M is sulfur or selenium and (B) a base polymer containing a polymer comprising repeat units having formula (B1) is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER or LWR.
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公开(公告)号：US20220269174A1
公开(公告)日：2022-08-25
申请号：US17591741
申请日：2022-02-03
摘要： A chemically amplified positive resist composition is provided comprising (A) a sulfurane or selenurane compound having formula (A1) wherein M is sulfur or Selenium and (B) a base polymer containing a polymer comprising repeat units having formula (B1). The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER and CDU.
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公开(公告)号：US10345700B2
公开(公告)日：2019-07-09
申请号：US14479378
申请日：2014-09-08
发明人： Luisa D. Bozano , Daisuke Domon , Yoshio Kawai , Keiichi Masunaga , Martha I. Sanchez , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda K. Sundberg , Satoshi Watanabe
IPC分类号： G03F7/20 , G03F7/038 , G03F7/32 , C08F220/18 , C08F220/30 , C08F220/24 , G03F7/004
摘要： A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
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8.发明授权Conductive polymer composition, coated article having antistatic film formed from the composition, and patterning process using the composition 有权导电聚合物组合物，具有由组合物形成的抗静电膜的涂布制品，以及使用该组合物的图案化工艺公开(公告)号：US09558862B2
公开(公告)日：2017-01-31
申请号：US14408911
申请日：2013-06-06
CPC分类号： H01B1/127 , C08K5/20 , G03F7/093 , G03F7/20 , G03F7/2059 , G03F7/2061
摘要： The present invention is a conductive polymer composition containing a π-conjugated conductive polymer, a polyanion, and a gemini surfactant. There can be provided a conductive polymer composition that has excellent antistatic performance and excellent application properties, does not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.
摘要翻译： 本发明是含有π共轭导电聚合物，聚阴离子和双子表面活性剂的导电聚合物组合物。 可以提供具有优异的抗静电性能和优异的应用性能的导电聚合物组合物，不会对抗蚀剂产生不利影响，并且可以适用于使用电子束等的光刻。
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9.发明申请CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE HAVING ANTISTATIC FILM FORMED FROM THE COMPOSITION, AND PATTERNING PROCESS USING THE COMPOSITION 有权导电聚合物组合物，具有由组合物形成的抗静电膜的涂覆制品和使用组合物的图案处理公开(公告)号：US20150140492A1
公开(公告)日：2015-05-21
申请号：US14408911
申请日：2013-06-06
CPC分类号： H01B1/127 , C08K5/20 , G03F7/093 , G03F7/20 , G03F7/2059 , G03F7/2061
摘要： The present invention is a conductive polymer composition containing a π-conjugated conductive polymer, a polyanion, and a gemini surfactant. There can be provided a conductive polymer composition that has excellent antistatic performance and excellent application properties, does not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.
摘要翻译： 本发明是含有共轭导电聚合物，聚阴离子和双子表面活性剂的导电聚合物组合物。 可以提供具有优异的抗静电性能和优异的应用性能的导电聚合物组合物，不会对抗蚀剂产生不利影响，并且可以适用于使用电子束等的光刻。
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公开(公告)号：US20140342274A1
公开(公告)日：2014-11-20
申请号：US14450725
申请日：2014-08-04
CPC分类号： G03F7/0045 , C08F26/06 , C08F214/18 , C08F220/30 , G03F7/0046 , G03F7/0382 , G03F7/2041 , H01L21/0271 , Y10S430/114
摘要： A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition ensures an effective sensitivity, makes more uniform the distribution and diffusion of the acid generating component in a resist film, and suppresses deactivation of acid at the substrate interface. The pattern can be formed to a profile which is improved in LER and undercut.
摘要翻译： 使用包含0.5-10摩尔％具有产酸能力的重复单元和50-99.5摩尔％的在碱性显影剂中溶解的重复单元的聚合物来配制化学放大的负性抗蚀剂组合物。 当在光刻工艺中使用时，组合物确保有效的灵敏度，使酸产生组分在抗蚀剂膜中的分布和扩散更均匀，并抑制底物界面处酸的失活。 该图案可以形成为在LER和底切方面得到改进的轮廓。
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