公开(公告)号：US20190378684A1

公开(公告)日：2019-12-12

申请号：US16141150

申请日：2018-09-25

Applicant: KLA-Tencor Corporation

Inventor： Ilya Bezel ,  Eugene Shifrin ,  Gildardo Delgado ,  Rudy F. Garcia

IPC: H01J37/26 ,  H01J37/08 ,  H01J37/317 ,  H01J37/28 ,  H01J37/304

Abstract: An imaging system utilizing atomic atoms is provided. The system may include a neutral atom source configured to generate a beam of neutral atoms. The system may also include an ionizer configured to collect neutral atoms scattered from the surface of a sample. The ionizer may also be configured to ionize the collected neutral atoms. The system may also include a selector configured to receive ions from the ionizer and selectively filter received ions. The system may also include one or more optical elements configured to direct selected ions to a detector. The detector may be configured to generate one or more images of the surface of the sample based on the received ions.

公开(公告)号：US20190131465A1

公开(公告)日：2019-05-02

申请号：US16151225

申请日：2018-10-03

Applicant: KLA-Tencor Corporation

Inventor： Jehn-Huar Chern ,  Ali R. Ehsani ,  Gildardo Delgado ,  David L. Brown ,  Yung-Ho Alex Chuang ,  John Fielden

IPC: H01L31/0216 ,  G01N21/956 ,  H01L27/146 ,  G01N21/95 ,  H01L27/148 ,  G01N21/88

CPC classification number: H01L31/0216 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  H01L27/1462 ,  H01L27/1464 ,  H01L27/14685 ,  H01L27/14689 ,  H01L27/14806

Abstract: An inspection system including an optical system (optics) to direct light from an illumination source to a sample, and to direct light reflected/scattered from the sample to one or more image sensors. At least one image sensor of the system is formed on a semiconductor membrane including an epitaxial layer having opposing surfaces, with circuit elements formed on one surface of the epitaxial layer, and a pure boron layer and a doped layer on the other surface of the epitaxial layer. The image sensor may be fabricated using CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor) technology. The image sensor may be a two-dimensional area sensor, or a one-dimensional array sensor. The image sensor can be included in an electron-bombarded image sensor and/or in an inspection system.

公开(公告)号：US09810991B2

公开(公告)日：2017-11-07

申请号：US14578301

申请日：2014-12-19

Applicant: KLA-Tencor Corporation

Inventor： Frank Chilese ,  Gildardo Delgado ,  Rudy F. Garcia

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70925 ,  G03F7/70933

Abstract: A system for cleaning or suppressing contamination or oxidation in a EUV optical setting includes an illumination source, a detector, a first set of optical elements to direct light from the illumination source to a specimen and a second set of optical elements to receive illumination from the specimen and direct the illumination to the detector. The system also includes one or more vacuum chambers for containing the first and second set of optical elements and containing a selected purge gas ionizable by the light emitted by the illumination source. The first or second set of optical elements includes an electrically biased optical element having at least one electrically biased surface. The electrically biased optical element has a bias configuration suitable to attract one or more ionic species of the selected purge gas to the electrically biased surface in order to clean contaminants from the electrically biased surface.

公开(公告)号：US20160163516A1

公开(公告)日：2016-06-09

申请号：US15043804

申请日：2016-02-15

Applicant: KLA-Tencor Corporation

Inventor： Lauren Wilson ,  Anant Chimmalgi ,  Ilya Bezel ,  Anatoly Shchemelinin ,  Matthew Derstine ,  Gildardo Delgado

IPC: H01J37/32 ,  H01J65/04

CPC classification number: H01J37/32339 ,  H01J37/32449 ,  H01J65/04

Abstract: An open plasma lamp includes a cavity section. A gas input and gas output of the cavity section are arranged to flow gas through the cavity section. The plasma lamp also includes a gas supply assembly fluidically coupled to the gas input of the cavity section and configured to supply gas to an internal volume of the cavity section. The plasma lamp also includes a nozzle assembly fluidically coupled to the gas output of the cavity section. The nozzle assembly and cavity section are arranged such that a volume of the gas receives pumping illumination from a pump source, where a sustained plasma emits broadband radiation. The nozzle assembly is configured to establish a convective gas flow from within the cavity section to a region external to the cavity section such that a portion of the sustained plasma is removed from the cavity section by the gas flow.

公开(公告)号：US09188544B2

公开(公告)日：2015-11-17

申请号：US13855475

申请日：2013-04-02

Applicant: KLA-Tencor Corporation

Inventor： Gildardo Delgado

IPC: G01N21/88 ,  G02B1/11 ,  G01N21/95 ,  G01N21/956 ,  G02B1/10 ,  G02B1/113 ,  H01L31/0216 ,  G02B7/16

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02B1/105 ,  G02B1/11 ,  G02B1/113 ,  G02B1/115 ,  G02B1/14 ,  G02B7/16 ,  H01L31/02168 ,  Y02E10/50

Abstract: An optical component includes a substrate and a fluorine-doped thin film formed on the substrate. This fluorine-doped thin film is dense, and thus very low absorbing and insensitive to various vacuum, temperature, and humidity conditions. This dense film has a high refractive index, which remains stable irrespective of environmental conditions. The fluorine-doped thin film can advantageously ensure low scattering, low reflectance, and high transmittance. Moreover, the fluorine-doped thin film is damage resistant to incident radiation density. The fluorine-doped thin film may be a fluorine-doped silicon oxide film having a thickness of approximately 1-10 nm and a fluorine concentration of 0.1% to 5%.

Abstract translation: 光学部件包括在基板上形成的基板和氟掺杂薄膜。 这种氟掺杂的薄膜是致密的，因此对各种真空，温度和湿度条件的吸收非常低和不敏感。 该致密膜具有高折射率，不管环境条件如何，均保持稳定。 氟掺杂薄膜可以有利地确保低散射，低反射率和高透射率。 此外，氟掺杂薄膜对入射辐射密度具有抗损伤性。 氟掺杂薄膜可以是厚度约为1-10nm，氟浓度为0.1％至5％的氟掺杂氧化硅膜。

公开(公告)号：US20150253675A1

公开(公告)日：2015-09-10

申请号：US14578301

申请日：2014-12-19

Applicant: KLA-Tencor Corporation

Inventor： Frank Chilese ,  Gildardo Delgado ,  Rudy F. Garcia

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70925 ,  G03F7/70933

Abstract: A system for cleaning or suppressing contamination or oxidation in a EUV optical setting includes an illumination source, a detector, a first set of optical elements to direct light from the illumination source to a specimen and a second set of optical elements to receive illumination from the specimen and direct the illumination to the detector. The system also includes one or more vacuum chambers for containing the first and second set of optical elements and containing a selected purge gas ionizable by the light emitted by the illumination source. The first or second set of optical elements includes an electrically biased optical element having at least one electrically biased surface. The electrically biased optical element has a bias configuration suitable to attract one or more ionic species of the selected purge gas to the electrically biased surface in order to clean contaminants from the electrically biased surface.

Abstract translation: 用于清洁或抑制EUV光学设置中的污染或氧化的系统包括照明源，检测器，用于将来自照明源的光引导到样本的第一组光学元件和第二组光学元件，以从 标本并将照明指示到检测器。 该系统还包括一个或多个真空室，用于容纳第一组光学元件和第二组光学元件并且包含可由照射源发射的光可离子化的选定的吹扫气体。 第一或第二组光学元件包括具有至少一个电偏置表面的电偏置光学元件。 电偏置光学元件具有适于将所选择的净化气体的一种或多种离子种类吸引到电偏压表面的偏置构型，以便从电偏压表面清洁污染物。

公开(公告)号：US20140168758A1

公开(公告)日：2014-06-19

申请号：US13839570

申请日：2013-03-15

Applicant: KLA-Tencor Corporation

Inventor： Garry Rose ,  Guorong Vera Zhuang ,  Gildardo Delgado ,  Qiang Zhang

IPC: G02B5/08

CPC classification number: G02B5/0891 ,  G21K1/062 ,  G21K1/067

Abstract: A mirror for reflecting extreme ultraviolet light (EUV) comprising: a substrate layer; and an upper layer above the substrate layer, that reflects EUV wavelengths and refracts longer wavelengths, said upper layer being dense and hard carbon having an Sp2 to Sp3 carbon bond ratio of 0 to about 3 and a normal incidence EUV mirror comprising an optical coating on an uppermost surface which permits transmission of EUV and protects the surface from environmental degradation, said coating being dense and hard and having an Sp2 carbon bond ratio of 0 to about 3 and a thickness of 0.1 to about 5 nanometers. The invention also includes EUV mirror systems protected by a dense carbon layer and includes a multilayer EUV reflecting system having an out of band absorbing layer.

Abstract translation: 一种用于反射极紫外光（EUV）的反射镜，包括：基底层; 以及反射EUV波长并折射较长波长的上层，所述上层是具有0至约3的Sp2至Sp3碳键比的致密和硬碳，以及包含光学涂层的法向入射EUV镜 允许EUV传播并保护表面免受环境恶化的最上表面，所述涂层致密且硬，并且具有0至约3的Sp 2碳键比和0.1至约5纳米的厚度。 本发明还包括由致密碳层保护的EUV反射镜系统，并且包括具有带外吸收层的多层EUV反射系统。

公开(公告)号：US20140158914A1

公开(公告)日：2014-06-12

申请号：US14101065

申请日：2013-12-09

Applicant: Sandia Corporation ,  KLA-Tencor Corporation

Inventor： Leonard E. Klebanoff ,  Jeromy T. Hollenshead ,  Gildardo Delgado ,  Elena Starodub ,  Karl R. Umstadter ,  Guorong V. Zhuang ,  Garry Rose

IPC: G02B27/00 ,  G01N23/00

CPC classification number: G02B1/18 ,  G02B27/0006

Abstract: An optical component arranged for use in a low pressure environment including: a surface arranged to receive extreme ultra-violet (EUV) light and a coating, on the surface, arranged to block at least one contaminant in the low pressure environment from binding to the surface. A method of mitigating contamination of a surface of an optical component, including: inserting the optical component into a chamber for a semi-conductor inspection system, controlling a temperature and a pressure within the chamber, introducing a blocking material, in a gaseous state, into the chamber, coating a surface of the optical component with the blocking material, and preventing, using the coating, a contaminant in the chamber from binding to the optical component.

Abstract translation: 布置成用于低压环境的光学部件，包括：布置成接收极紫外（EUV）光的表面和表面上的涂层，其布置成阻挡低压环境中的至少一种污染物结合到 表面。 一种减轻光学部件的表面污染的方法，包括：将光学部件插入用于半导体检查系统的室中，控制室内的温度和压力，以气态引入阻塞材料， 进入室中，用阻挡材料涂覆光学部件的表面，并且防止使用涂层将室内的污染物结合到光学部件。

公开(公告)号：US20140007910A1

公开(公告)日：2014-01-09

申请号：US13935960

申请日：2013-07-05

Applicant: KLA-Tencor Corporation

Inventor： Garry Rose ,  Gildardo Delgado ,  H. Steven Larson ,  Daniel R. Hennigan

IPC: B08B5/02

CPC classification number: B08B5/02 ,  G02B27/0006

Abstract: An apparatus for cross-flow purging for optical components in a chamber, including: a housing with first and second axial ends, a side wall extending in an axial direction and connecting the first and second axial ends, and the chamber formed by the first and second axial ends and the side wall; an optical component disposed within the chamber and fixed with respect to the housing via at least one connecting point on the optical component; an inlet port aligned with the side wall, between the first and second axial ends in the axial direction, in a radial direction orthogonal to the axial direction and arranged to inject a purge gas into the chamber and across the optical component in a radial direction orthogonal to the axial direction; and an exhaust port aligned with the side wall in the radial direction and arranged to exhaust the purge gas from the chamber.

Abstract translation: 一种用于腔室中的光学部件的横流吹扫的装置，包括：具有第一和第二轴向端部的壳体，沿轴向方向延伸并连接第一和第二轴向端部的侧壁以及由第一和第二轴向端部形成的腔室 第二轴向端和侧壁; 光学部件，设置在所述腔室内并且经由所述光学部件上的至少一个连接点相对于所述壳体固定; 入口端口，其与所述侧壁对准，在所述第一和第二轴向端部之间沿轴向方向在与所述轴向方向正交的径向方向上，并且布置成将吹扫气体沿径向正交地喷射到所述腔室中并穿过所述光学部件 到轴向; 以及排气口，其在径向方向上与所述侧壁对准并且布置成从所述室排出净化气体。

公开(公告)号：US20130270461A1

公开(公告)日：2013-10-17

申请号：US13860198

申请日：2013-04-10

Applicant: KLA-TENCOR CORPORATION

Inventor： Gildardo Delgado ,  Frank Chilese

IPC: G21K5/10 ,  G21K5/04

CPC classification number: G02B27/0006 ,  G01N21/33 ,  G02B5/208 ,  G03F1/84 ,  G21K5/04 ,  G21K5/10

Abstract: An apparatus for actinic extreme ultra-violet (EUV) reticle inspection including at least one shape memory metal actuator adapted to displace an inspection component in an EUV inspection tool. An apparatus for actinic EUV reticle inspection including a tilt mechanism including at least one shape memory metal actuator adapted to angularly displace an inspection component in an EUV inspection tool. An apparatus for actinic EUV reticle inspection, including a translation stage adapted to fixedly connect to an inspection component, at least one flexure stage, and at least one shape memory metal actuator adapted to displace the translation stage.

Abstract translation: 一种用于光化极紫外（EUV）掩模版检查的装置，其包括至少一种形状记忆金属致动器，其适于移动EUV检查工具中的检查部件。 一种用于光化性EUV掩模版检查的装置，包括倾斜机构，该倾斜机构包括至少一种形状记忆金属致动器，其适于使EUV检查工具中的检查部件成角度地移位。 一种用于光化性EUV掩模版检查的装置，包括适于固定地连接到检查部件的平移台，至少一个挠曲台，以及适于移动平移台的至少一个形状记忆金属致动器。