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    System and method for controlling charge-up in an electron beam apparatus
    31.
    发明授权
    System and method for controlling charge-up in an electron beam apparatus 有权
    用于控制电子束装置中的电荷的系统和方法

    公开(公告)号：US09000370B2

    公开(公告)日：2015-04-07

    申请号：US14512672

    申请日：2014-10-13

    Applicant: Hermes Microvision Inc.

    Inventor： Weiming Ren ,  Zhongwei Chen

    IPC: H01J37/02 ,  H01J37/28

    CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

    Abstract translation: 本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。 该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。 这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。

    METAL SEAL FOR ULTRA HIGH VACUUM SYSTEM
    32.
    发明申请
    METAL SEAL FOR ULTRA HIGH VACUUM SYSTEM 有权
    用于超高真空系统的金属密封

    公开(公告)号：US20150091258A1

    公开(公告)日：2015-04-02

    申请号：US14567075

    申请日：2014-12-11

    Applicant: Hermes Microvision, Inc.

    Inventor： Qingpo Xi ,  Tao Li ,  Feng Cao ,  Fumin He ,  Zhongwei Chen

    IPC: F16J15/08

    CPC classification number: F16J15/0881 ,  F16L23/20

    Abstract: The present invention introduces a metal seal flange assembly for a vacuum system. A new designed metal gasket has a crosses-section shape of irregular quadrangle with two sharp angle forms by the longer base and legs. The long base of the irregular quadrangle is the vertical inner wall of the metal gasket. A preferred cross section shape of the metal gasket is trapezoid or isosceles trapezoid. This design can reduce the normal force applied to the metal seal flange assembly and reduce the number of bolts used in a limit working space.

    Abstract translation: 本发明引入了用于真空系统的金属密封凸缘组件。 新设计的金属垫片具有不规则四边形的横截面形状，具有较长的底座和腿部的两个尖角形状。 不规则四边形的长基座是金属垫片的垂直内壁。 金属垫片的优选截面形状是梯形或等腰梯形。 该设计可以减少施加到金属密封凸缘组件的法向力，并减少在极限工作空间中使用的螺栓数量。

    Multi-axis magnetic lens for focusing a plurality of charged particle beams
    33.
    发明授权
    Multi-axis magnetic lens for focusing a plurality of charged particle beams 有权
    用于聚焦多个带电粒子束的多轴磁性透镜

    公开(公告)号：US08835867B2

    公开(公告)日：2014-09-16

    申请号：US13741654

    申请日：2013-01-15

    Applicant: Hermes-Microvision, Inc.

    Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuedong Liu

    IPC: H01J3/14 ,  H01J3/26 ,  H01J49/42

    CPC classification number: H01J3/22 ,  B82Y10/00 ,  B82Y40/00 ,  H01F7/0205 ,  H01J3/20 ,  H01J37/14 ,  H01J37/3177 ,  H01J2237/1415 ,  H05K9/00

    Abstract: A cellular-type PD unit is proposed and a plurality of the cellular-type PD units is used in pairs in a multi-axis magnetic lens for focusing a plurality of charged beams. First type PD units or second type PD units (called as hybrid PD unit as well) can be applied to cellular-type PD units to flexibly construct sub-lenses. Furthermore, magnetic shielding plates with a plurality of through openings can be placed above and/or below the multi-axis magnetic lens to make magnetic flux leaking out of the multi-axis magnetic lens vanish away rapidly outside the magnetic shielding plates.

    Abstract translation: 提出了一种蜂窝型PD单元，并且多个蜂窝型PD单元成对地用于多轴磁性透镜中以聚焦多个带电波束。 可以将第一类PD单元或第二类PD单元（也称为混合PD单元）应用于蜂窝型PD单元以灵活地构建子透镜。 此外，具有多个通孔的磁屏蔽板可以放置在多轴磁性透镜的上方和/或下方，以使从多轴磁性透镜泄漏的磁通在磁屏蔽板之外快速消失。

    Objective lens system for fast scanning large FOV
    34.
    发明授权
    Objective lens system for fast scanning large FOV 有权

    公开(公告)号：US11837431B2

    公开(公告)日：2023-12-05

    申请号：US16018008

    申请日：2018-06-25

    Applicant: Hermes Microvision, Inc.

    Inventor： Shuai Li ,  Zhongwei Chen

    IPC: H01J37/147 ,  H01J37/145 ,  H01J37/28 ,  H01J37/141

    CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

    Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

    Apparatus of plural charged-particle beams
    35.
    发明授权
    Apparatus of plural charged-particle beams 有权

    公开(公告)号：US10236156B2

    公开(公告)日：2019-03-19

    申请号：US15078369

    申请日：2016-03-23

    Applicant: Hermes Microvision Inc.

    Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen ,  Jack Jau

    IPC: H01J37/22 ,  H01J37/28

    Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.

    Apparatus of plural charged-particle beams
    36.
    发明授权
    Apparatus of plural charged-particle beams 有权

    公开(公告)号：US10115559B2

    公开(公告)日：2018-10-30

    申请号：US15403685

    申请日：2017-01-11

    Applicant: Hermes Microvision Inc.

    Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

    IPC: H01J37/14 ,  H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

    Objective lens system for fast scanning large FOV
    37.
    发明授权
    Objective lens system for fast scanning large FOV 有权

    公开(公告)号：US10008360B2

    公开(公告)日：2018-06-26

    申请号：US15007873

    申请日：2016-01-27

    Applicant: Hermes-Microvision, Inc.

    Inventor： Shuai Li ,  Zhongwei Chen

    IPC: H01J37/14 ,  H01J37/145 ,  H01J37/147 ,  H01J37/141

    CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

    Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

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