公开(公告)号：US20160093467A1

公开(公告)日：2016-03-31

申请号：US14859726

申请日：2015-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota TORIKAWA ,  Tatsuya ASAHATA ,  Atsushi UEMOTO ,  Makoto SATO

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/3045 ,  H01J2237/317

Abstract: A charged particle beam apparatus includes a stage for fixing a sample, a driving mechanism for driving the stage, a focused ion beam column, an electron beam column, a detector that detects a secondary charged particle emitted from the sample irradiated with a charged particle beam, a gas supplying device that supplies gas for forming a deposition film on a surface of the sample, and a control device that generates image data indicating the position distribution of the secondary charged particle detected by the detector. The control device irradiates the sample with the electron beam prior to irradiating the sample with a focused ion beam, recognizes an alignment mark provided in the sample in the image data by the electron beam, and performs positioning of an irradiation region of the sample using the alignment mark.

Abstract translation: 带电粒子束装置包括用于固定样品的台，用于驱动台的驱动机构，聚焦离子束柱，电子束柱，检测从照射了带电粒子束的样品发射的二次带电粒子的检测器 在样品的表面上供给用于形成沉积膜的气体的气体供给装置，以及生成表示由检测器检测出的二次带电粒子的位置分布的图像数据的控制装置。 控制装置在用聚焦离子束照射样品之前用电子束照射样品，通过电子束识别图像数据中的样品中提供的对准标记，并使用该样品的照射区域进行定位 对齐标记。

公开(公告)号：US20150262788A1

公开(公告)日：2015-09-17

申请号：US14728004

申请日：2015-06-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi UEMOTO ,  Xin MAN ,  Tatsuya ASAHATA

IPC: H01J37/26 ,  G01N23/04 ,  H01J37/28 ,  H01J37/304 ,  H01J37/30 ,  G01N23/225 ,  G01T1/36

CPC classification number: H01J37/265 ,  G01N1/32 ,  G01N23/04 ,  G01N23/2208 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/2255 ,  G01T1/36 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3045 ,  H01J2237/2611 ,  H01J2237/28 ,  H01J2237/2807 ,  H01J2237/2812 ,  H01J2237/30472 ,  H01J2237/30483 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A cross-section processing and observation method performed by a cross-section processing and observation apparatus comprises a cross-section processing step of forming a cross-section by irradiating a sample with an ion beam; a cross-section observation step of obtaining an observation image of the cross-section by irradiating the cross-section with an electron beam; and repeating the cross-section processing step and the cross-section observation step so as to obtain observation images of a plurality of cross-sections. In a case where Energy Dispersive X-ray Spectrometry (EDS) measurement of the cross-section is performed and an X-ray of a specified material or of a non-specified material that is different from a pre-specified material is detected, an irradiation condition of the ion beam is changed so as to obtain observation images of a plurality of cross-sections of the specified material, and the cross-section processing and observation of the specified material is performed.

Abstract translation: 由横截面加工和观察装置执行的横截面加工和观察方法包括：用离子束照射样品形成横截面的横截面处理步骤; 横截面观察步骤，通过用电子束照射横截面来获得横截面的观察图像; 并且重复横截面处理步骤和横截面观察步骤，以获得多个横截面的观察图像。 在执行横截面的能量分散X射线光谱法（EDS）测量并且检测到与预定材料不同的指定材料或非指定材料的X射线的情况下， 改变离子束的照射条件以获得指定材料的多个横截面的观察图像，并且执行指定材料的横截面处理和观察。

公开(公告)号：US20140291511A1

公开(公告)日：2014-10-02

申请号：US14220981

申请日：2014-03-20

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/30 ,  H01J37/252 ,  H01J37/26

CPC classification number: H01J37/3002 ,  H01J37/252 ,  H01J37/26 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/30455

Abstract: A charged particle beam apparatus includes a sample stage, a focused ion beam column, a scattered electron detector that detects backscattered electrons generated from a cross-section of a sample, a crystal orientation information generation unit that generates crystal orientation information on a predetermined region of the cross-section, and an angle calculation unit that calculates attachment angles of the sample stage, corresponding to a direction of the cross-section. In response to receiving input of information indicating that the crystal orientation information on the region displayed on a display unit is changed to aimed second crystal orientation information, the angle calculation unit calculates the attachment angles corresponding to the direction of the cross-section for generating the second crystal orientation information, and the focused ion beam column performs etching processing on the cross-section at the calculated attachment angles.

Abstract translation: 带电粒子束装置包括：样品台，聚焦离子束柱，检测从样品的横截面产生的反向散射电子的散射电子检测器;晶体取向信息生成单元，其在预定区域上生成晶体取向信息; 横截面，以及角度计算单元，其计算与横截面方向对应的样品台的附着角度。 响应于接收到指示将显示在显示单元上的区域的晶体取向信息改变为目标第二晶体取向信息的信息的输入，角度计算单元计算与用于生成显示单元的横截面的方向相对应的附着角度 第二晶体取向信息，聚焦离子束列以计算出的安装角度对横截面进行蚀刻处理。

公开(公告)号：US20130248732A1

公开(公告)日：2013-09-26

申请号：US13845582

申请日：2013-03-18

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya ASAHATA ,  Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J37/10

CPC classification number: H01J37/10 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/0206 ,  H01J2237/04924 ,  H01J2237/216 ,  H01J2237/24535 ,  H01J2237/31749

Abstract: An ion beam apparatus including: an ion source configured to emit an ion beam; a condenser lens electrode configured to condense the ion beam; a condenser lens power source configured to apply a voltage to the condenser lens electrode; a storage portion configured to store, a first voltage value, a second voltage value, a third voltage value, and a fourth voltage value; and a control portion configured to retrieve the third voltage value from the storage portion and set the retrieved third voltage value to the condenser lens power source when an observation mode is switched to a wide-range observation mode, and retrieve the fourth voltage value from the storage portion and set the retrieved fourth voltage value to the condenser lens power source when a processing mode is switched to the wide-range observation mode.

Abstract translation: 一种离子束装置，包括：被配置为发射离子束的离子源; 配置成冷凝离子束的聚光透镜电极; 聚光透镜电源，被配置为向聚光透镜电极施加电压; 存储部，被配置为存储第一电压值，第二电压值，第三电压值和第四电压值; 以及控制部，被配置为当观察模式切换到宽范围观察模式时，从存储部分检索第三电压值，并将检索到的第三电压值设置为聚光透镜电源，并且从第 存储部分，并且当处理模式切换到宽范围观察模式时，将获取的第四电压值设置到聚光透镜电源。

公开(公告)号：US20220084785A1

公开(公告)日：2022-03-17

申请号：US17500627

申请日：2021-10-13

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana MURAKI ,  Tatsuya ASAHATA ,  Atsushi UEMOTO

IPC: H01J37/304 ,  H01J37/22 ,  H01J37/28

Abstract: Automated processing is provided. A charged particle beam apparatus includes: an image identity degree determination unit determining whether an identity degree is equal to or greater than a predetermined value, the identity degree indicating a degree of identity between a processing cross-section image that is an SEM image obtained through observation of a cross section of the sample by a scanning electron microscope, and a criterion image that is the processing cross-section image previously registered; and a post-determination processing unit performing a predetermined processing operation according to a result of the determination by the image identity degree determination unit.

公开(公告)号：US20210090849A1

公开(公告)日：2021-03-25

申请号：US17028488

申请日：2020-09-22

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Haruyuki ISHII ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/20 ,  H01J37/28

Abstract: The focused ion beam apparatus includes: an electron beam column; a focused ion beam column; a sample stage; a coordinate acquisition unit configured to acquire, when a plurality of irradiation positions to which the focused ion beam is to be applied are designated on a sample, plane coordinates of each of the irradiation positions; a movement amount calculation unit configured to calculate, based on the plane coordinates, a movement amount by which the sample stage is to be moved to a eucentric height so that the eucentric height matches an intersection position at which the electron beam and the focused ion beam match each other at each of the irradiation positions; and a sample stage movement control unit configured to move, based on the movement amount, the sample stage to the eucentric height at each of the irradiation positions.

公开(公告)号：US20190304745A1

公开(公告)日：2019-10-03

申请号：US16364898

申请日：2019-03-26

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masato SUZUKI ,  Satoshi TOMIMATSU ,  Makoto SATO ,  Tatsuya ASAHATA

IPC: H01J37/305 ,  H01J37/20

Abstract: To automatically repeat an operation of isolating a sample piece, which is formed by processing a sample with an ion beam, and transferring the sample piece to a sample piece holder, a charged particle beam device includes a computer configured to perform control so that, without rotating a needle with which the sample piece is fixed to the sample piece holder, a deposition film deposited on the needle is irradiated with a charged particle beam from a charged particle beam irradiation optical system.

公开(公告)号：US20170178858A1

公开(公告)日：2017-06-22

申请号：US15448308

申请日：2017-03-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi TOMIMATSU ,  Makoto SATO ,  Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Yo YAMAMOTO

IPC: H01J37/302 ,  H01J37/20

CPC classification number: H01J37/3023 ,  H01J37/20 ,  H01J2237/208 ,  H01J2237/31745

Abstract: A charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.

公开(公告)号：US20160372301A1

公开(公告)日：2016-12-22

申请号：US15181702

申请日：2016-06-14

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya ASAHATA ,  Akito MORI ,  Asumi YUZURIHA

IPC: H01J37/20 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/20292

Abstract: Disclosed herein is a microsample stage that can be formed through an automatic manufacturing process. The microsample stage includes a base, a microsample-fixing portion that is formed on the base and to which a microsample is fixed, and multiple alignment marks.

Abstract translation: 本文公开了可以通过自动制造过程形成的微样品台。 微样品台包括基部，形成在基部上并且微型样品固定到其上的微取样固定部分和多个对准标记。

公开(公告)号：US20150206702A1

公开(公告)日：2015-07-23

申请号：US14601497

申请日：2015-01-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi UEMOTO ,  Xin MAN ,  Tatsuya ASAHATA

IPC: H01J37/147 ,  H01J37/26

CPC classification number: H01J37/265 ,  H01J2237/15 ,  H01J2237/30483

Abstract: A cross-section processing observation apparatus includes an ion beam control unit for controlling a charged particle beam generation-focusing portion and a deflector and including a DAC which converts an input digital signal into an analog signal which is to be input to the deflector, and a field-of-view setting portion for setting a value of a field of view of a charged particle beam where the scanning performed by the deflector is performed on the basis of a set value of a slice amount.

Abstract translation: 横截面处理观察装置包括：离子束控制单元，用于控制带电粒子束产生聚焦部分和偏转器，并且包括将输入数字信号转换为要被输入到偏转器的模拟信号的DAC;以及 视场设定部，其基于切片量的设定值来设定由偏转器执行的扫描的带电粒子束的视场的值。