公开(公告)号：US20210090849A1

公开(公告)日：2021-03-25

申请号：US17028488

申请日：2020-09-22

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Haruyuki ISHII ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/20 ,  H01J37/28

Abstract: The focused ion beam apparatus includes: an electron beam column; a focused ion beam column; a sample stage; a coordinate acquisition unit configured to acquire, when a plurality of irradiation positions to which the focused ion beam is to be applied are designated on a sample, plane coordinates of each of the irradiation positions; a movement amount calculation unit configured to calculate, based on the plane coordinates, a movement amount by which the sample stage is to be moved to a eucentric height so that the eucentric height matches an intersection position at which the electron beam and the focused ion beam match each other at each of the irradiation positions; and a sample stage movement control unit configured to move, based on the movement amount, the sample stage to the eucentric height at each of the irradiation positions.