公开(公告)号：US11724353B2

公开(公告)日：2023-08-15

申请号：US17834207

申请日：2022-06-07

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  David Koonce ,  Biraja Prasad Kanungo

IPC分类号： B24B31/00 ,  B24B31/116 ,  B24B57/04 ,  B24B5/40 ,  B23B35/00 ,  B24B33/02

CPC分类号： B24B31/006 ,  B23B35/00 ,  B24B5/40 ,  B24B31/003 ,  B24B31/116 ,  B24B33/02 ,  B24B57/04 ,  B23B2220/445 ,  B23B2226/18

摘要： Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 μin.

公开(公告)号：US20230160055A1

公开(公告)日：2023-05-25

申请号：US18089807

申请日：2022-12-28

申请人： APPLIED MATERIALS, INC.

发明人： Vahid Firouzdor ,  Christopher Laurent Beaudry ,  Hyun-Ho Doh ,  Joseph Frederick Behnke ,  Joseph Frederick Sommers

IPC分类号： C23C14/08 ,  H01J37/32 ,  C23C4/134 ,  C23C14/00 ,  H01L21/67 ,  C23C14/22 ,  C04B35/486 ,  C04B35/505 ,  C04B35/622 ,  C04B35/111

CPC分类号： C23C14/083 ,  H01J37/32495 ,  C23C4/134 ,  C23C14/0052 ,  H01L21/67213 ,  C23C14/221 ,  C04B35/486 ,  C04B35/505 ,  C04B35/62222 ,  C23C14/081 ,  C04B35/111

摘要： Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.

公开(公告)号：US11566317B2

公开(公告)日：2023-01-31

申请号：US15711885

申请日：2017-09-21

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC分类号： C04B41/89 ,  C04B41/00 ,  C04B41/52 ,  C04B35/505 ,  C04B35/622 ,  C04B41/45 ,  C04B35/00 ,  C23C14/08 ,  C04B41/50 ,  C23C14/46 ,  C23C14/58 ,  H01J37/32 ,  C04B41/87

摘要： An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide is selected from a group consisting of YF3, Er4Al2O9, ErAlO3, and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

公开(公告)号：US11424136B2

公开(公告)日：2022-08-23

申请号：US17137076

申请日：2020-12-29

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Ying Zhang

IPC分类号： H01J37/32 ,  H01L21/67 ,  B65D43/02 ,  C23C4/11 ,  C23C4/12 ,  C23C4/04 ,  C23C4/10 ,  C23C4/01 ,  C23C14/00 ,  C23C4/134 ,  C23C4/14 ,  C23C4/16 ,  C23C14/08

摘要： A component for a processing chamber includes a ceramic body having at least one surface with a first average surface roughness. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 μm over the at least one surface and having a second average surface roughness that is less than the first average surface roughness.

公开(公告)号：US11053581B2

公开(公告)日：2021-07-06

申请号：US16685341

申请日：2019-11-15

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Tom Cho

IPC分类号： B32B18/00 ,  C23C14/08 ,  C23C14/22 ,  H01J37/32 ,  C23C14/34

摘要： An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Er2O3, Er3Al5O12, and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

公开(公告)号：US20180105922A1

公开(公告)日：2018-04-19

申请号：US15844251

申请日：2017-12-15

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC分类号： C23C14/08 ,  C04B35/505 ,  C04B35/622 ,  C04B41/00 ,  C04B41/45 ,  C04B41/50 ,  C23C14/46 ,  C04B41/87 ,  C04B41/89 ,  H01J37/32 ,  C23C14/58 ,  C04B41/52

CPC分类号： C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4529 ,  C04B41/5045 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  C04B2235/428 ,  C04B2235/445 ,  C23C14/08 ,  C23C14/083 ,  C23C14/46 ,  C23C14/5806 ,  H01J37/32477 ,  Y10T428/26 ,  Y10T428/265 ,  C04B35/10 ,  C04B35/50 ,  C04B35/14 ,  C04B35/584 ,  C04B35/565 ,  C04B41/5032 ,  C04B41/5042 ,  C04B41/5035 ,  C04B2103/54

摘要： An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y2O3, over 0 mol % to 60 mol % of ZrO2, and 0 mol % to 9 mol % of Al2O3.

公开(公告)号：US20180100228A1

公开(公告)日：2018-04-12

申请号：US15837787

申请日：2017-12-11

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Ying Zhang

IPC分类号： C23C14/00 ,  H01L21/67 ,  B65D43/02 ,  H01J37/32 ,  C23C14/08 ,  C23C4/16 ,  C23C4/14 ,  C23C4/12 ,  C23C4/10 ,  C23C4/04

CPC分类号： H01L21/67023 ,  B65D43/02 ,  C23C4/01 ,  C23C4/04 ,  C23C4/10 ,  C23C4/11 ,  C23C4/12 ,  C23C4/134 ,  C23C4/14 ,  C23C4/16 ,  C23C14/0015 ,  C23C14/0021 ,  C23C14/0031 ,  C23C14/0036 ,  C23C14/0052 ,  C23C14/0084 ,  C23C14/0094 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/088 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32513 ,  H01J2237/334 ,  H01L21/67063 ,  H01L21/67069 ,  H01L21/6708 ,  H01L21/67086 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/139 ,  Y10T428/1393

摘要： A component for a semiconductor processing chamber includes a ceramic body having at least one surface with a first average surface roughness of approximately 8-16 micro-inches. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 μm over the at least one surface and having a second average surface roughness of below 10 micro-inches, wherein the second average surface roughness is less than the first average surface roughness.

公开(公告)号：US20180073125A1

公开(公告)日：2018-03-15

申请号：US15814597

申请日：2017-11-16

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Tom Cho

IPC分类号： C23C14/08 ,  H01J37/32 ,  C23C14/34 ,  C23C14/22 ,  B32B18/00

CPC分类号： C23C14/08 ,  B32B18/00 ,  C23C14/083 ,  C23C14/22 ,  C23C14/228 ,  C23C14/34 ,  H01J37/32477 ,  H01J37/32495 ,  Y10T428/24355 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/265

摘要： An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Y4Al2O9, Er2O3, Gd2O3, Er3Al5O12, Gd3Al5O12 and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

公开(公告)号：US09797037B2

公开(公告)日：2017-10-24

申请号：US15211993

申请日：2016-07-15

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC分类号： C23C14/08 ,  C23C14/46 ,  C04B41/50 ,  C04B41/52 ,  C23C14/58 ,  C04B41/89 ,  C04B35/505 ,  C04B35/622 ,  H01J37/32 ,  C04B41/87 ,  C04B41/00

CPC分类号： C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4529 ,  C04B41/5045 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  C04B2235/428 ,  C04B2235/445 ,  C23C14/08 ,  C23C14/083 ,  C23C14/46 ,  C23C14/5806 ,  H01J37/32477 ,  Y10T428/26 ,  Y10T428/265 ,  C04B35/10 ,  C04B35/50 ,  C04B35/14 ,  C04B35/584 ,  C04B35/565 ,  C04B41/5032 ,  C04B41/5042 ,  C04B41/5035 ,  C04B2103/54

摘要： An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide has a composition of 40-45 mol % of Y2O3, 5-10 mol % of ZrO2, 35-40 mol % of Er2O3, 5-10 mol % of Gd2O3, and 5-15 mol % of SiO2.

公开(公告)号：US20170247795A1

公开(公告)日：2017-08-31

申请号：US15595888

申请日：2017-05-15

申请人： Applied Materials, Inc.

发明人： Jennifer Y. Sun ,  Vahid Firouzdor

IPC分类号： C23C24/04 ,  C25D11/18 ,  C25D11/16 ,  C23C28/00 ,  C25D11/26

CPC分类号： C25D11/34 ,  C23C24/04 ,  C23C28/321 ,  C23C28/322 ,  C23C28/345 ,  C23C28/3455 ,  C25D11/04 ,  C25D11/16 ,  C25D11/18 ,  C25D11/26 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/12757 ,  Y10T428/12764

摘要： A component for a manufacturing chamber comprises a cold spray coating and an anodization layer on the cold spray coating. The anodization layer has a thickness of about 2-10 mil. The anodization layer comprises a low porosity bottom layer portion having a porosity that is less than about 40-50% and a porous columnar top layer portion having a porosity of about 40-40% and comprising a plurality of columnar nanopores having a diameter of about 10-50 nm.