- 专利标题： Chamber components with polished internal apertures
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申请号： US17834207申请日： 2022-06-07
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公开(公告)号： US11724353B2公开(公告)日： 2023-08-15
- 发明人: Jennifer Y. Sun , Vahid Firouzdor , David Koonce , Biraja Prasad Kanungo
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Lowenstein Sandler LLP
- 分案原申请号： US16216796 2018.12.11
- 主分类号： B24B31/00
- IPC分类号： B24B31/00 ; B24B31/116 ; B24B57/04 ; B24B5/40 ; B23B35/00 ; B24B33/02
摘要：
Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 μin.
公开/授权文献
- US20220297256A1 CHAMBER COMPONENTS WITH POLISHED INTERNAL APERTURES 公开/授权日：2022-09-22
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