公开(公告)号：US20130112873A1

公开(公告)日：2013-05-09

申请号：US13806057

申请日：2011-07-26

Applicant: Yoichi Hirayama

Inventor： Yoichi Hirayama

IPC: H01J3/12 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/0492 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: To provide an aberration correction device and a charged particle beam device employing same that are jointly usable with a tunneling electron microscope (TEM) and a scanning tunneling electron microscope (SEM), an aberration correction device (1) comprises, between a TEM objective lens (6a) and an STEM objective lens (6b): a transfer lens group (4, 5), for transferring a coma-free surface (11) of the TEM objective lens (6a) to a multipolar lens (3); a transfer lens group (7, 8) for transferring the coma-free surface of the TEM objective lens to a multipolar lens (2); and a transfer lens (13) for correcting fifth-order spherical aberration of the STEM objective lens (6b).

Abstract translation: 为了提供与隧道电子显微镜（TEM）和扫描隧道电子显微镜（SEM）共同使用的使用其的像差校正装置和带电粒子束装置，像差校正装置（1）包括在TEM物镜 （6a）和STEM物镜（6b）：用于将TEM物镜（6a）的无消耗表面（11）传送到多极透镜（3）的转印透镜组（4,5）; 用于将TEM物镜的无彗形面传递到多极透镜（2）的转印透镜组（7,8）; 以及用于校正STEM物镜（6b）的五阶球面像差的转印透镜（13）。

公开(公告)号：US07858951B1

公开(公告)日：2010-12-28

申请号：US11880222

申请日：2007-07-20

Applicant: David Douglas

Inventor： David Douglas

IPC: H01J3/12

CPC classification number: H05H11/00 ,  H01S3/0903

Abstract: A skewed chicane eigenmode exchange module (SCEEM) that combines in a single beamline segment the separate functionalities of a skew quad eigenmode exchange module and a magnetic chicane. This module allows the exchange of independent betatron eigenmodes, alters electron beam orbit geometry, and provides longitudinal parameter control with dispersion management in a single beamline segment with stable betatron behavior. It thus reduces the spatial requirements for multiple beam dynamic functions, reduces required component counts and thus reduces costs, and allows the use of more compact accelerator configurations than prior art design methods.

Abstract translation: 偏斜的拐角本征模式交换模块（SCEEM），其在单个波束线段中组合了偏斜四分之一本征模式交换模块和磁性拐弯的单独功能。 该模块允许交换独立的betatron本征模，改变电子束轨道几何，并且在具有稳定的betatron行为的单个束线段中提供具有色散管理的纵向参数控制。 因此，它减少了多束动态功能的空间要求，减少了所需的组件数量，从而降低了成本，并允许使用比现有技术设计方法更紧凑的加速器配置。

公开(公告)号：US20100181494A1

公开(公告)日：2010-07-22

申请号：US12617505

申请日：2009-11-12

Applicant: Detlef Mattern

Inventor： Detlef Mattern

IPC: A61N5/10 ,  H01J3/12 ,  H01J3/14 ,  G02B5/00

CPC classification number: G21K1/10 ,  A61N5/1077 ,  A61N2005/1087

Abstract: The present embodiments relate to lowering the widening of a radiation beam, for example, using a chamber arranged between a beam output and an object to be irradiated. The chamber is filled with a gas or a gas mixture, the average atomic number of which is smaller than that of air, and the volume expansion of which is changeable. The advantage here is that a widening of a radiation beam caused by multiple scattering is reduced.

Abstract translation: 本实施例涉及降低辐射束的加宽，例如使用布置在光束输出和被照射物体之间的腔室。 该室充满气体或气体混合物，其平均原子序数小于空气的原子数，其体积膨胀是可变化的。 这里的优点是减少了由多次散射引起的辐射束的加宽。

公开(公告)号：US20050017193A1

公开(公告)日：2005-01-27

申请号：US10623754

申请日：2003-07-21

Applicant: Gerald Jackson

Inventor： Gerald Jackson

IPC: G01Q60/00 ,  G21K1/093 ,  H01J3/14 ,  H05H7/12 ,  H01J3/12

CPC classification number: H05H7/12 ,  G21K1/093 ,  H01J3/14

Abstract: A method for slowing and controlling a beam of charged particles includes the steps of superimposing at least one magnetic field on a mass and passing the beam through the mass and at least one magnetic field such that the beam and the mass slows but does not stop the particles. An apparatus for slowing and controlling a beam of charged particles includes a bending magnetic field superimposed on a focusing magnetic field within a mass.

Abstract translation: 一种用于减慢和控制带电粒子束的方法包括以下步骤：在质量上叠加至少一个磁场并使光束通过物质和至少一个磁场，使得光束和质量减慢但不会停止 粒子。 用于减慢和控制带电粒子束的装置包括叠加在质量块内的聚焦磁场上的弯曲磁场。

公开(公告)号：US5336891A

公开(公告)日：1994-08-09

申请号：US899433

申请日：1992-06-16

Applicant: Albert V. Crewe

Inventor： Albert V. Crewe

IPC: H01J3/12 ,  H01J37/153 ,  H01J37/10

CPC classification number: H01J3/12 ,  H01J37/153

Abstract: A system for reducing aberration effects in a charged particle beam. The system includes a source of charged particles, such as electrons or ions, and various building blocks for operating on the charged particle beam to generate a desired particle beam pattern. These building blocks can include at least one of a uniform magnetic field component and a uniform electrostatic field component arrangeable in different combinations, enabling coefficients of spherical and chromatic aberration to be canceled out thereby providing a charged particle beam having greatly diminished aberration.

Abstract translation: 一种用于减少带电粒子束中的像差效应的系统。 该系统包括带电粒子的源，例如电子或离子，以及用于在带电粒子束上操作以产生期望的粒子束图案的各种构建块。 这些构造块可以包括均匀的磁场分量和可以以不同组合布置的均匀静电场分量中的至少一个，从而能够抵消球面和色差的系数，从而提供具有大大减小的像差的带电粒子束。

公开(公告)号：US4570072A

公开(公告)日：1986-02-11

申请号：US458058

申请日：1983-01-14

Applicant: Chikara Kimura ,  Keiji Yada

Inventor： Chikara Kimura ,  Keiji Yada

IPC: H01J3/22 ,  H01J37/141 ,  H01J37/244 ,  H01J37/252 ,  H01J3/12

CPC classification number: H01J37/141

Abstract: Disclosed is an electromagnetic lens polepiece structure for use in an electron microscope comprising an upper polepiece and an opposite lower polepiece, each having a lens bore, wherein the lens bore portion of the upper polepiece protrudes toward the lens bore of the lower polepiece. The protrudant lens bore portion allows the provision of an X-ray conducting bore for the measurement without disturbing the magnetic field of the lens. This makes it possible a smaller lens bore and, consequently, the spherical aberration is reduced and the resolution of the microscope is improved. The protrudant lens bore structure allows the upper polepiece to be divided into two sections so that the bore section can be replaced easily for the measurement of X-rays.

Abstract translation: 公开了一种用于电子显微镜的电磁透镜杆结构，其包括上极片和相对的下极靴，每个具有透镜孔，其中上电极件的透镜孔部分朝向下极靴的透镜孔突出。 突起透镜孔部分允许提供用于测量的X射线导电孔而不干扰透镜的磁场。 这使得可能的是较小的透镜孔，并且因此减小了球面像差，并提高了显微镜的分辨率。 突出透镜孔结构允许上极片被分成两部分，使得可以容易地更换孔部分用于测量X射线。

公开(公告)号：US4414474A

公开(公告)日：1983-11-08

申请号：US349442

申请日：1982-02-17

Applicant: Albert V. Crewe

Inventor： Albert V. Crewe

IPC: G01Q30/02 ,  G01Q30/06 ,  H01J37/153 ,  H01J3/12

CPC classification number: H01J37/153

Abstract: Means for compensating for third and higher order aberrations in an electron optic system comprises two sextupoles and a field lens, the latter being spaced intermediate the sextupoles. The resolving power of the optic system can be reduced to the range of about 0.5 Angstrom unit.

Abstract translation: 用于补偿电子光学系统中的第三和更高阶像差的装置包括两个六极和一个场透镜，后者在六极间隔开。 光学系统的分辨率可以降低到大约0.5埃的单位范围。

公开(公告)号：US20230013095A1

公开(公告)日：2023-01-19

申请号：US17375488

申请日：2021-07-14

Applicant: Applied Materials, Inc.

Inventor： Richard Allen Sprenkle ,  Richard White ,  Eric Donald Wilson ,  Shane Conley ,  Ana Samolov ,  Nilay A. Pradhan

IPC: H01J3/12 ,  G05B19/4155 ,  G06N20/00

Abstract: Techniques for adjusting the shape of an ion beam are described. Characteristics of a desired beam shape may be defined. The ion beam generator may include beam shaping elements associated with tunable parameters that can be set in combination with each other. A search space for the possible combinations is defined. A set of exploratory points in the search space are measured and used to interpolate a large number of interpolated points based on a regression model. Interpolated points that are associated with low confidence values may be measured. Based on the measured and interpolated points, clusters of tunable parameter combinations may be identified for evaluation. The clusters are evaluated for stability and sensitivity, and one of the clusters is selected based on the evaluation. The ion beam generator may be configured based on the selected cluster.

公开(公告)号：US09653256B2

公开(公告)日：2017-05-16

申请号：US15035265

申请日：2014-11-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira Ikegami ,  Hideto Dohi ,  Hideyuki Kazumi ,  Yoichi Ose ,  Naomasa Suzuki ,  Momoyo Enyama ,  Ryuji Nishi ,  Akio Takaoka

IPC: H01J3/26 ,  H01J37/28 ,  H01J37/147 ,  H01J37/153 ,  H01J3/12 ,  H01J37/14

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/15 ,  H01J2237/2611 ,  H01J2237/2814

Abstract: Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

公开(公告)号：US09202662B2

公开(公告)日：2015-12-01

申请号：US13756178

申请日：2013-01-31

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

IPC: G21K5/04 ,  H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the mirror array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接镜阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。