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    SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
    22.
    发明申请
    SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD 审中-公开

    公开(公告)号：US20180169712A1

    公开(公告)日：2018-06-21

    申请号：US15821287

    申请日：2017-11-22

    申请人： SCREEN Holdings Co., Ltd.

    发明人： Shuichi YASUDA ,  Michinori IWAO ,  Noriyuki KIKUMOTO ,  Mitsutoshi SASAKI

    IPC分类号： B08B3/02 ,  H01L21/67 ,  B08B3/14 ,  B01D19/00

    CPC分类号： B08B3/02 ,  B01D19/0005 ,  B08B3/14 ,  B08B2203/002 ,  H01L21/67017 ,  H01L21/67023 ,  H01L21/67051

    摘要： A substrate treatment apparatus is provided with a plurality of substrate treatment parts and a liquid treatment system. The substrate treatment part has a substrate retaining part, which retains a substrate, and a discharge nozzle, which discharges a treatment liquid to the substrate retained by the substrate retaining part. The liquid treatment system has: a storage tank that stores in the treatment liquid; a supply piping part that is connected to the storage tank and forms a supply passage through which the treatment liquid to be supplied to the discharge nozzle passes; a return piping part that is connected to the storage tank and forms a return passage that returns the treatment liquid passed through the supply piping part to the storage tank; and a gas supply part that supplies a nitrogen gas different from oxygen dissolved in the treatment liquid into the return passage of the return piping part.

    Sensing system for measuring cavitation
    23.
    发明申请
    Sensing system for measuring cavitation 有权
    用于测量气蚀的感应系统

    公开(公告)号：US20050188751A1

    公开(公告)日：2005-09-01

    申请号：US11047110

    申请日：2005-01-31

    申请人： William Puskas

    发明人： William Puskas

    IPC分类号： B01J19/10 ,  B06B1/02 ,  B06B1/06 ,  B08B3/12 ,  G10K11/00 ,  G01N21/70 ,  G01N33/00

    CPC分类号： G10K11/004 ,  B01J19/10 ,  B06B1/0276 ,  B06B1/0284 ,  B06B1/0618 ,  B06B1/0622 ,  B06B2201/71 ,  B08B3/12 ,  B08B2203/002

    摘要： The invention provides a sensing system for sensing process conditions within an ultrasonic process tank that includes process liquid, the liquid being subjected to ultrasound produced by transducers coupled to a generator. The sensing system includes an enclosure for housing a sample liquid, the enclosure passing ultrasonic energy from the process liquid to the sample liquid, the sample liquid being responsive to the ultrasonic energy, and at least one sensing device within the sample liquid, the sensing device generating signals indicative of characteristics of the sample liquid. The sample liquid includes materials adapted to produce chemiluminescence in response to the ultrasonic energy. The at least one sensing device includes a photo sensor for sensing the produced chemiluminescence and generating signals in response to the produced chemiluminescence.

    摘要翻译： 本发明提供了一种感测系统，用于感测超声波处理槽内的处理条件，其包括处理液体，该液体经受与发生器耦合的换能器产生的超声波。 感测系统包括用于容纳样品液体的外壳，外壳将超声能量从处理液体传递到样品液体，样品液体响应于超声波能量，以及至少一个检测装置，在检测液体内，感测装置 产生指示样品液体特性的信号。 样品液体包括适于响应于超声能量产生化学发光的材料。 所述至少一个感测装置包括用于感测产生的化学发光并响应于所产生的化学发光产生信号的光传感器。

    Systems and methods for ultrasonically processing delicate parts
    24.
    发明授权
    Systems and methods for ultrasonically processing delicate parts 失效
    用于超声处理精密零件的系统和方法

    公开(公告)号：US6016821A

    公开(公告)日：2000-01-25

    申请号：US97374

    申请日：1998-06-15

    申请人： William L. Puskas

    发明人： William L. Puskas

    IPC分类号： B01J19/10 ,  B06B1/02 ,  B06B1/06 ,  B08B3/12 ,  G10K11/00

    CPC分类号： B01J19/10 ,  B06B1/0276 ,  B06B1/0284 ,  B06B1/0618 ,  B06B1/0622 ,  B08B3/12 ,  G01N27/06 ,  G01N29/032 ,  G01N29/222 ,  G01N29/348 ,  G10K11/004 ,  G10K11/006 ,  B06B2201/71 ,  B08B2203/002 ,  G01N2291/02818 ,  G01N2291/02863

    摘要： The invention provides systems, methods and apparatus for processing delicate parts within a process tank such as an ultrasonic tank. Typically, one or more transducers connect to the tank and respond to drive signals from a generator to produce ultrasound within process liquid within the tank. Specific features of the invention include: (1) a power up-sweep ultrasonic system for moving contaminants upwards within the tank by sweeping transducer drive signals from an upper frequency to a lower frequency without sweeping from the lower frequency to the upper frequency; (2) a multi-generator system for producing ultrasound at selected different frequencies within the tank by switching a common transducer bank to one of the generators in response to remote relays initiated by the user; (3) a probe sensing system for sensing process conditions within the tank including an enclosure for housing a sample liquid and one or more sensing transducers within the sample liquid, the transducers generating signals indicative of characteristics of the sample liquid, a subsystem analyzing the signals in feedback with the generator to modify process conditions; (4) variable voltage ultrasonic generator systems to accommodate varying world-wide voltage supplies; (5) a laminar process tank for efficiently pushing contaminants upwards in a tank; (6) a quick dump rinse tank including a pressure cavity to accelerate dumping processes; (7) an ultrasonic generating unit formed of a printed circuit board (PCB) and multiple transducers within the PCB; (8) an AC power system to produce an AC voltage at frequency f that is impressed across a capacitive element; and (9) various configurations of transducers, including acid-safe transducers, double-compression transducers, and transducers with increased reliability.

    摘要翻译： 本发明提供了用于处理诸如超声波罐的处理罐内的精密部件的系统，方法和装置。 通常，一个或多个换能器连接到油箱并响应来自发电机的驱动信号，以在罐内的处理液体内产生超声波。 本发明的具体特征包括：（1）上行扫描超声波系统，用于通过从较高频率向较低频率扫描换能器驱动信号而不用从较低频率扫频到上频频段来将污染物向上移动; （2）多发生器系统，用于响应由用户发起的远程继电器，通过将公共换能器组切换到发电机中的一个，在罐内以选定的不同频率产生超声波; （3）用于感测罐内的工艺条件的探针感测系统，包括用于容纳样品液体和样品液体内的一个或多个传感传感器的外壳，换能器产生指示样品液体特性的信号，分析信号的子系统 用发电机反馈修改工艺条件; （4）可变电压超声波发生器系统，以适应不同的世界范围的电压源; （5）用于在罐中有效地将污染物向上推动的层流工艺罐; （6）快速倾倒冲洗槽，包括压力腔，以加速倾倒过程; （7）由印刷电路板（PCB）和PCB内的多个换能器构成的超声波发生单元; （8）交流电力系统，以产生跨过电容元件施加的频率f的交流电压; 和（9）各种配置的传感器，包括耐酸性传感器，双压缩传感器和具有更高可靠性的传感器。

    Cleaning equipment for semiconductor substrates
    25.
    发明授权
    Cleaning equipment for semiconductor substrates 失效
    半导体衬底清洗设备

    公开(公告)号：US5979474A

    公开(公告)日：1999-11-09

    申请号：US76119

    申请日：1998-05-12

    申请人： Kazuyoshi Manako

    发明人： Kazuyoshi Manako

    IPC分类号： B08B3/10 ,  H01L21/00 ,  B08B3/04

    CPC分类号： H01L21/67057 ,  B08B3/10 ,  B08B2203/002 ,  Y10S134/902

    摘要： A cleaning equipment for semiconductor substrates, which includes a cleaning tank 2 for cleaning the semiconductor substrates and a circulation filtering device, wherein the cleaning equipment has a pump 6 and a filter unit 7 disposed in a filtering line for cleaning impurities contained in a cleaning liquid, a gas mixing device 8 having a temperature-adjusting function and which is disposed downstream of the pump 6 and the filter unit 7 for adjusting a temperature of the cleaning liquid and dissolving the gas into the cleaning liquid, and a gas-separating device 9 which is disposed downstream of the gas mixing device 8 for separating an undissolved portion of the mixed gas from the cleaning liquid.

    摘要翻译： 一种用于半导体衬底的清洁设备，其包括用于清洁半导体衬底的清洁槽2和循环过滤装置，其中清洁设备具有泵6和过滤器单元7，过滤器单元7设置在用于清洁包含在清洗液体中的杂质的过滤管线中 具有温度调节功能的气体混合装置8，其设置在泵6的下游，并且用于调节清洗液的温度并将气体溶解到清洗液中的过滤器单元7以及气体分离装置9 其设置在气体混合装置8的下游，用于将混合气体的未溶解部分与清洗液分离。

    Water hammer driven cavitation chamber
    27.
    发明授权
    Water hammer driven cavitation chamber 失效
    水锤驱动气穴室

    公开(公告)号：US5519670A

    公开(公告)日：1996-05-21

    申请号：US316915

    申请日：1994-10-03

    申请人： Bruno H. Walter

    发明人： Bruno H. Walter

    IPC分类号： B01F11/00 ,  B01J19/00 ,  B08B3/12 ,  B09C1/02 ,  G01V1/133 ,  H04R23/00

    CPC分类号： G01V1/133 ,  B01F11/0071 ,  B01J19/008 ,  B08B3/12 ,  B09C1/02 ,  B08B2203/002

    摘要： A cavitation chamber is driven by a hydraulic driving system in which acoustic pulses are generated by repeated water hammers. In the driving system a liquid is pumped through a conduit. The flow of liquid through the conduit is periodically interrupted by a valve. A water hammer is created each time the valve closes. Acoustic pulses produced by the water hammer propagate directly into a cavitation chamber where they are reflected back and forth by acoustically reflective plates. The cavitation chamber may be applied to degas liquids, mix chemicals or slurries, or promote sono-chemical reactions. The design generates acoustic pulses efficiently. The acoustic pulses are coupled to the cavitation chamber with minimal losses. The apparatus is rugged and inexpensive when compared to systems which incorporate electromechanical transducers.

    摘要翻译： 气蚀室由液压驱动系统驱动，其中由反复的水锤产生声脉冲。 在驱动系统中，液体被泵送通过导管。 通过导管的液体流被阀门周期性地中断。 每次阀关闭时都会产生水锤。 由水锤产生的声脉冲直接传播到空化室中，在那里它们被声反射板反射回来。 空化室可用于对液体进行脱气，混合化学品或浆料，或促进超声波化学反应。 该设计有效地产生声脉冲。 声波脉冲以最小的损耗耦合到空化室。 与结合机电换能器的系统相比，该装置坚固且便宜。

    Apparatus for treating wafers with process fluids
    28.
    发明授权
    Apparatus for treating wafers with process fluids 失效
    用过程流体处理晶片的设备

    公开(公告)号：US4917123A

    公开(公告)日：1990-04-17

    申请号：US252823

    申请日：1988-10-03

    申请人： Christopher F. McConnell ,  Alan E. Walter

    发明人： Christopher F. McConnell ,  Alan E. Walter

    IPC分类号： B05C3/109 ,  B08B3/04 ,  B08B7/00 ,  H01L21/00

    CPC分类号： B05C3/109 ,  B08B3/04 ,  B08B7/0092 ,  H01L21/67028 ,  B08B2203/002 ,  Y10S134/902

    摘要： Contamination of wafers is reduced by an enclosed full-flow method and apparatus for the cleaning and other wet processing of semiconductor wafers. Process fluids flow sequentially and continuously past the wafers such that the processing does not require movement or operator handling of the wafers between processing steps. The vessel containing the wafers is hydraulically full during each process step. Wafers may be cleaned using a hot corrosive fluid, such as sulfuric acid; rinsed using high purity water at high flow rates; and dried using a drying fluid such as isopropanol. In addition, chemical reagents such as dilute hydrofluoric acid or hydrogen peroxide may be precisely mixed in situ and applied to the wafer surface for a precisely controlled period, by injecting concentrated reagent into rinse water purified by multipass filtration.

    摘要翻译： 通过用于半导体晶片的清洗和其它湿法处理的封闭全流动方法和装置来减少晶片的污染。 工艺流体顺序并连续地流过晶片，使得处理不需要在处理步骤之间移动或操作处理晶片。 在每个工艺步骤期间，容纳晶片的容器是液压充满的。 可以使用热腐蚀性流体如硫酸清洁晶片; 用高流量的高纯度水冲洗; 并使用干燥流体如异丙醇干燥。 此外，化学试剂如稀氢氟酸或过氧化氢可以通过将浓缩的试剂注入通过多次过滤纯化的漂洗水中而在原位精确混合并施加到晶片表面上以精确控制的时间。

    Process and apparatus for drying surfaces
    29.
    发明授权
    Process and apparatus for drying surfaces 失效
    干燥表面的方法和设备

    公开(公告)号：US4911761A

    公开(公告)日：1990-03-27

    申请号：US184544

    申请日：1988-04-20

    申请人： Christopher F. McConnell ,  Alan E. Walter

    发明人： Christopher F. McConnell ,  Alan E. Walter

    IPC分类号： B05C3/109 ,  B08B3/04 ,  B08B7/00 ,  H01L21/00

    CPC分类号： B05C3/109 ,  B08B3/04 ,  B08B7/0092 ,  H01L21/67028 ,  B08B2203/002 ,  Y10S134/902

    摘要： Object surfaces such as semiconductor wafers which are suspended in a rinsing fluid may be dried by replacing the rinsing fluid, such as water, with a drying vapor by directly displacing the water from the surfaces at such a rate that substantially no liquid droplets are left on the surfaces after replacement of the water with drying vapor. Preferably, the drying vapor is miscible with water and forms a minimum-boiling azeotrope with water, such as isopropanol. The drying vapor is then purged with a stream of dry, inert, non-condensable gas such as nitrogen. A vaporizer with automatic refill mechanism produces saturated drying vapor which may then be flashed to a superheated vapor prior to contacting the surfaces, which preferably are at the same temperature as the vapor. Preferably, no liquid is removed by evaporation, and the drying takes place in an enclosed, hydraulically full system which does not require movement or handling of the surfaces between rinsing and drying steps.

    摘要翻译： 悬浮在冲洗流体中的物体表面如半导体晶片可以通过用干燥蒸气替换冲洗流体例如水来干燥，该干燥蒸汽通过直接从表面移出水，其速度基本上不留下液滴 用干燥蒸汽替换水后的表面。 优选地，干燥蒸气与水混溶并与水形成最小沸点共沸物，例如异丙醇。 然后用干燥，惰性，不可冷凝的气体如氮气吹扫干燥蒸气。 具有自动补充机构的蒸发器产生饱和的干燥蒸气，然后在接触表面之前将其蒸发至过热蒸汽，其优选地处于与蒸气相同的温度。 优选地，不通过蒸发除去液体，并且干燥发生在封闭的液压完全系统中，其不需要移动或处理漂洗和干燥步骤之间的表面。