公开(公告)号：US20180185795A1

公开(公告)日：2018-07-05

申请号：US15856197

申请日：2017-12-28

Applicant: SEMES CO., LTD.

Inventor： BYUNGSUN BANG ,  JIN TACK YU ,  YOUNGJUN CHOI ,  JONGHAN KIM ,  YOUNG JIN JANG

IPC: B01F3/22 ,  B01F3/08 ,  H01L21/67 ,  B08B3/10 ,  B08B3/08 ,  B08B3/02

CPC classification number: B01F3/2223 ,  B01F3/0861 ,  B01F5/0057 ,  B01F2215/0096 ,  B05B1/34 ,  B05B7/0408 ,  B08B3/02 ,  B08B3/08 ,  B08B3/102 ,  B08B2203/002 ,  H01L21/67051

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. The substrate treating apparatus includes a liquid supply unit configured to supply a treatment liquid in which a first liquid and a second liquid are mixed, onto the substrate unit, wherein the liquid supply unit includes a nozzle configured to discharge the treatment liquid, a first liquid supply line supplying the first liquid to the nozzle, and a second liquid supply supplying the second liquid to the nozzle, and the nozzle includes a body having a mixing space in which the first liquid and the second liquid are mixed and a buffer space extending from the mixing space, in the interior thereof, and a collision member located in the buffer space and configured to decrease a flow velocity of the treatment liquid supplied to the buffer space.

公开(公告)号：US20190189471A1

公开(公告)日：2019-06-20

申请号：US16224891

申请日：2018-12-19

Applicant: SEMES CO., LTD.

Inventor： BUYOUNG JUNG ,  JONGHAN KIM ,  YOUNG JIN JANG ,  JIN TACK YU ,  YOUNGJUN CHOI ,  DAEHUN KIM ,  BYUNGSUN BANG ,  JONGHYEON WOO ,  HEEHWAN KIM ,  CHEOL-YONG SHIN ,  GUI SU PARK

IPC: H01L21/67 ,  H01L21/683

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.