公开(公告)号：US20050017599A1

公开(公告)日：2005-01-27

申请号：US10855135

申请日：2004-05-27

申请人： William Puskas

发明人： William Puskas

IPC分类号： B01J19/10 ,  B06B1/02 ,  B06B1/06 ,  B08B3/12 ,  G10K11/00 ,  H01L41/09

CPC分类号： G10K11/004 ,  B01J19/10 ,  B06B1/0269 ,  B06B1/0276 ,  B06B1/0284 ,  B06B1/0618 ,  B06B1/0622 ,  B06B2201/70 ,  B06B2201/71 ,  B06B2201/72 ,  B08B3/12 ,  B08B2203/002 ,  G10K11/006

摘要： The invention utilizes a multiple frequency ultrasound generator driving a multiple frequency harmonic transducer array to improve cleaning and processing effects while eliminating damage to parts being cleaned. An AC switch and circuitry to modify the output of an ultrasound generator in combination with techniques such as random AM and FM signals are used to produce ultrasound waves that have no single frequency components which eliminates exciting parts being cleaned into resonance. Generator signals that increase cavitation efficiency and that have successive time periods with predominately stable cavitation and predominantly transient cavitation further improve the performance of the cleaning or processing systems.

摘要翻译： 本发明利用驱动多频谐波换能器阵列的多频超声波发生器来改善清洁和处理效果，同时消除对被清洁部件的损坏。 AC开关和用于修改超声波发生器的输出以及诸如随机AM和FM信号的技术的电路用于产生没有单一频率分量的超声波，其消除被清理成谐振的兴奋部分。 具有增加气蚀效率并且具有主要稳定的气蚀和主要是瞬时空化的连续时间段的发电机信号进一步改善了清洁或处理系统的性能。

公开(公告)号：US06167891A

公开(公告)日：2001-01-02

申请号：US09318156

申请日：1999-05-25

申请人： Stephan Kudelka ,  David Rath

发明人： Stephan Kudelka ,  David Rath

IPC分类号： B08B312

CPC分类号： H01L21/67057 ,  B08B3/12 ,  B08B2203/002

摘要： A system is provided to prepare deionized water having a 100% saturated concentration of a gas, e.g., nitrogen, at a hot temperature, e.g., 50-85° C., and an attendant pressure, e.g., atmospheric pressure, to clean a semiconductor wafer, e.g., of silicon. The gas concentration of deionized water having a predetermined concentration of the gas at a cold temperature, e.g., 15-30° C., is adjusted in a degassifier chamber having a vacuum pump and a pressure sensor, to provide an under-saturated concentration of the gas at the cold temperature corresponding to the saturated concentration thereof at the hot temperature and attendant pressure. The adjusted gas concentration water is then heated in a heating vessel having a heater and a temperature sensor, to the hot temperature to form a hot bath having such saturated gas concentration to clean the wafer, e.g., in a cleaning tank under megasonic vibrations. A controller is connected to the pump, pressure sensor, heater and temperature sensor to control the chamber pressure and vessel temperature.

摘要翻译： 提供一种系统来制备具有100％饱和浓度的气体（例如氮气）的去离子水，其在例如50-85℃的热温度和伴随的压力（例如大气压）下清洁半导体 晶片，例如硅。 在具有真空泵和压力传感器的脱气室中调节在例如15-30℃的冷温度下具有预定浓度的气体的去离子水的气体浓度，以提供不饱和的浓度 在温度较低的温度下，与其饱和浓度对应的气体和伴随的压力。 然后将经调节的气体浓度的水在具有加热器和温度传感器的加热容器中加热到热的温度，以形成具有饱和气体浓度的热浴，以清洁晶片，例如在超声波振动下的清洗槽中。 控制器连接到泵，压力传感器，加热器和温度传感器，以控制腔室的压力和容器温度。

公开(公告)号：US6039814A

公开(公告)日：2000-03-21

申请号：US887883

申请日：1997-07-03

申请人： Tadahiro Ohmi ,  Takahisa Nitta

发明人： Tadahiro Ohmi ,  Takahisa Nitta

IPC分类号： B01D19/00 ,  B08B3/12 ,  H01L21/304

CPC分类号： B08B3/12 ,  B01D19/0005 ,  B08B2203/002

摘要： A cleaning method comprising the steps of degassing gas dissolved in a cleaning liquid therefrom to a value not more than 5 ppm, loading ultrasonics with a frequency of 1 MHz or more to the cleaning liquid, and cleaning an object for cleaning with the cleaning liquid. Also included, is a cleaning method comprising the steps of: degassing gas dissolved in a surface-active agent-containing cleaning liquid therefrom to a value not more than 5 ppm, loading ultrasonics with a frequency of 1 MHz or more to the cleaning liquid, and cleaning an object for cleaning with the cleaning liquid. Water vapor may be used to sweep gas from a degassing device.

摘要翻译： 一种清洁方法，包括以下步骤：将溶解在其中的清洁液体中的气体脱气至不大于5ppm的值，向清洗液体加载频率为1MHz或更高的超声波，并用清洗液清洁物体进行清洁。 还包括一种清洁方法，包括以下步骤：将溶解在其中含有表面活性剂的清洗液中的气体脱气至不大于5ppm的值，向清洗液加载频率为1MHz以上的超声波， 并用清洁液清洗物体进行清洁。 水蒸气可用于从脱气装置中吹扫气体。

公开(公告)号：US5626016A

公开(公告)日：1997-05-06

申请号：US329718

申请日：1994-10-26

申请人： Bruno H. Walter

发明人： Bruno H. Walter

IPC分类号： B01F11/00 ,  B01J19/00 ,  B09C1/02 ,  G01V1/133 ,  F15B21/12

CPC分类号： B01F11/0071 ,  B01J19/008 ,  B09C1/02 ,  G01V1/133 ,  B08B2203/002

摘要： The invention provides a vibrator which may be used to vibrate industrial apparatus such as a conveyor, hopper, bin, screen, shaker table, or to agitate a fluid. The vibrator has a element comprising a concave outer skin on one side and a convex outer skin on the other side which define between them a cavity. The cavity is connected to a hydraulic driving circuit which provides a continuous series of high pressure pulses. Each pulse causes the deformable element to change shape. The continuous application of a series of pulses causes the deformable element to continuously vibrate. The high pressure pulses are generated by creating a water hammer within a conduit by means of a valve which can be rapidly opened and closed to allow fluid to flow through the conduit and then suddenly block the fluid flow. The vibrating apparatus may be used to shake industrial structures such as shaking screens, shaking tables, hoppers, bins or the like.

摘要翻译： 本发明提供一种振动器，其可用于振动工业设备如输送机，料斗，料斗，筛网，振动台，或搅拌流体。 振动器具有一个元件，该元件包括一侧的凹形外皮和另一侧的凸形外皮，它们在它们之间限定一个空腔。 空腔连接到提供连续一系列高压脉冲的液压驱动电路。 每个脉冲使可变形元件改变形状。 连续施加一系列脉冲导致可变形元件连续振动。 高压脉冲是通过阀门产生水锤而产生的，该阀可以被快速地打开和关闭，以允许流体流过管道，然后突然阻塞流体流动。 振动装置可以用于摇动振动筛，摇台，料斗，料仓等工业结构。

公开(公告)号：US5597003A

公开(公告)日：1997-01-28

申请号：US520094

申请日：1995-08-28

申请人： Keith S. Campbell

发明人： Keith S. Campbell

IPC分类号： B08B3/12

CPC分类号： B08B3/12 ,  B08B2203/002

摘要： Apparatus for cleaning a chandelier in situ by ultrasonic cavitation. The chandelier is made up of downwardly extending sags or pendants arranged in a circle.

摘要翻译： 用于通过超声波空化来原位清洁吊灯的装置。 枝形吊灯由向下延伸的下垂或挂在圆圈上的吊坠组成。

公开(公告)号：US5213619A

公开(公告)日：1993-05-25

申请号：US443471

申请日：1989-11-30

申请人： David P. Jackson ,  Michael A. Lepp

发明人： David P. Jackson ,  Michael A. Lepp

IPC分类号： A61L2/025 ,  A61L2/18 ,  B08B3/12 ,  B08B6/00 ,  B08B7/00

CPC分类号： A61L2/025 ,  A61L2/18 ,  B08B3/12 ,  B08B6/00 ,  B08B7/0021 ,  B08B2203/002

摘要： An environmentally safe process for pre-cleaning, sterilizing, preserving, and enhancing performance characteristics of materials used in critical environments with stringent end-product cleanliness and sterilization requirements in a single process using high energy dense fluids. One or more dense fluids are mixed with one or more chemical agents and are simultaneously subjected to a non-uniform electrostatic field and high powered acoustic radiation to remove, in a process called acoustic-electroextraction, deeply recessed contaminants from internal and external surfaces of intricately arranged or formulated materials such as biomaterials, surgical tools, or dental implants. Subsequently, the cleaned materials are than subjected to a high energy dense fluid oxidizing environment to provide for deep material penetration and sterilization and removal of biological contaminants. Finally, the cleaned and sterilized materials may be implanted with chemical agents using an acoustic deposition process to provide for long term preservation. In an alternative embodiment of the present invention, chemical agents may be implanted in materials to provide new and improved material properties such as increased electrical insulation. Finally, the entire process may be performed on materials which are prepackaged in semi-permeable membranes, preventing recontamination of the clean, sterile, or implanted materials.

摘要翻译： 在使用高能量致密流体的单个过程中，在严格的最终产品清洁度和灭菌要求的关键环境中预先清洁，消毒，保存和增强材料的性能特征的环境安全过程。 将一种或多种致密流体与一种或多种化学试剂混合，同时经受非均匀的静电场和高功率声辐射，以在称为声电萃取的过程中，从复杂的内外表面去除深度凹陷的污染物 布置或配制的材料，例如生物材料，手术工具或牙科植入物。 随后，清洁的材料比经受高能量致密的流体氧化环境以提供深物质渗透和灭菌和除去生物污染物。 最后，清洁和灭菌的材料可以使用声学沉积方法植入化学试剂以提供长期保存。 在本发明的替代实施例中，化学试剂可以植入材料中以提供新的和改进的材料性质，例如增加的电绝缘。 最后，整个过程可以对预先包装在半透膜中的材料进行，防止清洁，无菌或植入材料的再污染。

公开(公告)号：US4907611A

公开(公告)日：1990-03-13

申请号：US130552

申请日：1987-12-09

申请人： Yoshihide Shibano

发明人： Yoshihide Shibano

IPC分类号： B01D19/00 ,  B08B3/12

CPC分类号： B01D19/0078 ,  B08B3/12 ,  B08B2203/002

摘要： Disclosed is an improvement of ultrasonic washing apparatus comprising at least one washing vessel, an ultrasonic vibrator for radiating ultrasonic wave into the washing bath, an oscillator for operating the ultrasonic vibrator and degassing means for removing dissolved air and other gases from the washing liquid, thereby enhancing cavitation in the washing bath when the ultrasonic wave is radiated therein, said degassing means including gas separating means and barrier means for preventing surrounding air from dissolving into the washing liquid while it is degassed. Thanks to deaeration in the washing bath cavitation can be used to its full extent in removing soil from a soiled object in the washing bath.

摘要翻译： 公开了一种超声波洗涤装置的改进，其包括至少一个洗涤容器，用于将超声波放入洗涤槽中的超声波振动器，用于操作超声波振动器的振荡器和用于从洗涤液中除去溶解的空气和其它气体的脱气装置，从而 当超声波在其中被辐射时，在洗涤槽中增强气蚀，所述脱气装置包括气体分离装置和阻挡装置，用于防止周围空气在脱气时溶解到洗涤液中。 由于洗涤浴中的脱气，可以充分利用空化来去除洗涤浴中被污染物体的污垢。

公开(公告)号：US4865060A

公开(公告)日：1989-09-12

申请号：US301152

申请日：1989-01-25

申请人： Yoshihide Shibano

发明人： Yoshihide Shibano

IPC分类号： B08B3/12

CPC分类号： B08B3/12 ,  B08B2203/002

摘要： Disclosed is an improvement of ultrasonic cleaning system equipped with degassing means or boiling vessel to remove gases from cleaning liquid for activating the formation of cavitation in the cleaning bath. The ultrasonic cleaning system is improved according to the present invention in that the boiling vessel is used to supply the degassed liquid to the cleaning vessel to form a high-temperature zone on the cleaning bath, and that a circulation conduit is provided to supply the cleaning liquid from the high-temperature zone to the bottom of the cleaning vessel. The improved structure permits the creation of a high-temperature zone and a low-temperature or cleaning zone in one cleaning vessel, thereby preventing the dissolution of surrounding gases into the cleaning liquid, and at the same time, subjecting objects to ultrasonic-cleaning at a controlled temperature which is appropriate for ultrasonic cleaning, thereby improving the cleaning effect, and hence the cleaning efficiency.

摘要翻译： 公开了一种具有脱气装置或沸腾容器的超声波清洗系统的改进，以从清洁液中除去气体，以激活在清洗浴中形成气蚀。 根据本发明，超声波清洗系统得到改进，因为沸腾容器用于将脱气液体供应到清洗容器，以在清洗槽上形成高温区，并且设置循环管道以提供清洁 液体从高温区到清洁容器的底部。 改进的结构允许在一个清洁容器中形成高温区域和低温或清洁区域，从而防止周围气体溶解到清洁液体中，并且同时使物体经受超声波清洗 适用于超声波清洗的受控温度，从而提高清洁效果，从而提高清洁效率。

公开(公告)号：US4064884A

公开(公告)日：1977-12-27

申请号：US670432

申请日：1976-03-25

申请人： Hans Eskil Asp

发明人： Hans Eskil Asp

IPC分类号： C23G3/02 ,  B08B3/00 ,  B08B3/02 ,  B08B3/08 ,  B21B45/02 ,  B21C43/04 ,  D06L1/22 ,  F26B5/00 ,  B08B1/02

CPC分类号： B21B45/0224 ,  B08B3/00 ,  B08B3/08 ,  B08B2203/002

摘要： Objects in long lengths such as strip, wire, rod, sections or fibres which have been surface treated in a preceding step are, according to the present invention, liberated from entrained surface treating agent or agents by a method for stripping off said agent or agents, washing and drying said objects, said method being performed continuously and the individual steps viz. the stripping off, the washing and the drying taking place sequentially against the feeding direction of the object in question. Also an apparatus for performing the method is described. The apparatus includes a fluid inlet assembly and a fluid discharge assembly, there being a passage through said assemblies through which the object can pass in an object-feeding direction. Liquid is discharged through a jet nozzle, which surrounds the object, in an opposite direction. The liquid is recirculated, and can be transferred to a station which is prior in treatment.

摘要翻译： 根据本发明，通过前述步骤进行表面处理的较长长度的物体，例如条，线，杆，段或纤维，通过剥离所述试剂或试剂的方法从夹带的表面处理剂或试剂中释放出来 ，洗涤和干燥所述物体，所述方法连续进行，各个步骤即可。 剥离，洗涤和干燥顺序地相对于所讨论的物体的进给方向发生。 还描述了一种用于执行该方法的装置。 该装置包括流体入口组件和流体排出组件，其中存在通过所述组件的通道，物体可以通过该通道沿着物体馈送方向通过。 液体通过围绕物体的喷嘴沿相反方向排出。 液体被再循环，并且可以转移到处理之前的一个站。

公开(公告)号：US20230256479A1

公开(公告)日：2023-08-17

申请号：US18305727

申请日：2023-04-24

申请人： SCREEN Holdings Co., Ltd.

发明人： Akihisa IWASAKI ,  Hiroaki TAKAHASHI

IPC分类号： B08B3/08 ,  H01L21/02

CPC分类号： B08B3/08 ,  H01L21/02057 ,  B08B2203/002 ,  H01L21/02052

摘要： A substrate processing method includes a substrate holding step of holding a substrate having a front surface on which a metal is exposed, an inert gas replacing step of replacing an atmosphere around the front surface of the substrate with an inert gas by supplying an inert gas to a vicinity of the front surface of the substrate, an adjusting step of adjusting a pH of the rinsing liquid so as to form an inactive state in which the metal does not react with the rinsing liquid or so as to form a passive state by allowing the metal to react with the rinsing liquid, and a rinsing liquid supplying step of supplying the rinsing liquid whose pH has been adjusted to the front surface of the substrate after the atmosphere around the front surface of the substrate has been replaced with the inert gas.