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公开(公告)号：US11747735B2
公开(公告)日：2023-09-05
申请号：US17462695
申请日：2021-08-31
Inventor： Che-Chang Hsu , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC classification number: G03F7/70033 , G06T1/0014 , G06T7/0004 , G21K1/06 , H05G2/005 , H05G2/006 , H05G2/008 , G06T2207/30148
Abstract: In a method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system one or more streams of a gas is directed, through one or more gas outlets mounted over a rim of a collector mirror of an EUV radiation source, to generate a flow of the gas over a surface of the collector mirror. The one or more flow rates of the one or more streams of the gas are adjusted to reduce an amount of metal debris deposited on the surface of the collector mirror.
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公开(公告)号：US11694820B2
公开(公告)日：2023-07-04
申请号：US17407291
申请日：2021-08-20
Inventor： Wei-Chung Tu , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC classification number: G21K1/06 , G02B5/0808 , G02B5/0891 , G02B5/10 , G03F7/70025 , G03F7/70033 , H05G2/008
Abstract: A radiation source apparatus includes a vessel, a laser source, a collector, and a reflective mirror. The vessel has an exit aperture. The laser source is at one end of the vessel and configured to excite a target material to form a plasma. The collector is disposed in the vessel and configured to collect a radiation emitted by the plasma and to direct the collected radiation to the exit aperture of the vessel. The reflective mirror is in the vessel and configured to reflect the laser beam toward an edge of the vessel.
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公开(公告)号：US11380566B2
公开(公告)日：2022-07-05
申请号：US17134211
申请日：2020-12-25
Inventor： Fu-Hsien Li , Sheng-Kang Yu , Chi-Feng Tung , Hsiang Yin Shen , Guancyun Li
IPC: G05B19/19 , G05B19/4061 , H01L21/67 , B66C17/26 , B66C15/00 , B66C13/16 , B66C13/18 , H01L21/677 , G03F7/20
Abstract: A system for a semiconductor fabrication facility includes a manufacturing tool including a load port, a maintenance crane, a rectangular zone overlapping with the load port of the manufacturing tool, a plurality of first sensors at corners of the rectangular zone, an OHT vehicle, a second sensor on the OHT vehicle, a third sensor on the load port, and a control unit. The first sensors are configured to detect a location of the maintenance crane and to generate a first location data. The second sensor is configured to generate a second location data. The control unit is configured to receive the first location data of the maintenance crane and the second location data of the OHT vehicle. The control unit further sends signals to the second sensor and the third sensor or to cut off the signal to the second sensor.
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公开(公告)号：US12228863B2
公开(公告)日：2025-02-18
申请号：US18133948
申请日：2023-04-12
Inventor： Cheng Hung Tsai , Sheng-Kang Yu , Heng-Hsin Liu , Li-Jui Chen , Shang-Chieh Chien
IPC: G03F7/00
Abstract: A system for monitoring and controlling an EUV light source includes a first temperature sensor, a signal processor, and a process controller. The first temperature sensor includes a portion inserted into a space surrounded by a plurality of vanes through a vane of the plurality of vanes, and obtains an ambient temperature that decreases with time as a function of tin contamination coating on the inserted portion. The signal processor determines an excess tin debris deposition on the vane based on the obtained chamber ambient temperature. The process controller activates a vane cleaning action upon being informed of the excess tin debris deposition by the signal processor, thereby improving availability of the EUV light source tool and reducing risks of tin pollution on other tools such as a reticle.
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Patent Agency Ranking
公开(公告)号：US12061423B2
公开(公告)日：2024-08-13
申请号：US17488131
申请日：2021-09-28
Inventor： Cheng Hung Tsai , Sheng-Kang Yu , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen
IPC: G03F7/00
CPC classification number: G03F7/70916 , G03F7/70033 , G03F7/70875
Abstract: Microwave heating of debris collecting vanes within the source vessel of a lithography apparatus is used to accomplish uniform temperature distribution in order to reduce fall-on contamination and formation of clogs on the inner and outer surfaces of the vanes.
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公开(公告)号：US11854846B2
公开(公告)日：2023-12-26
申请号：US17809582
申请日：2022-06-29
Inventor： Fu-Hsien Li , Sheng-Kang Yu , Chi-Feng Tung , Hsiang Yin Shen , Guancyun Li
IPC: G05B19/19 , G05B19/4061 , H01L21/67 , B66C17/26 , B66C15/00 , B66C13/16 , B66C13/18 , H01L21/677 , G03F7/00
CPC classification number: H01L21/67265 , B66C13/16 , B66C13/18 , B66C15/00 , B66C17/26 , G03F7/70033 , G03F7/7075 , G03F7/7085 , G03F7/70533 , G03F7/70741 , G03F7/70975 , G03F7/70991 , G05B19/19 , G05B19/4061 , H01L21/67259 , H01L21/67706 , H01L21/67721 , H01L21/67724 , H01L21/67733 , H01L21/67736 , G05B2219/40292 , G05B2219/45031
Abstract: A system for a semiconductor fabrication facility includes a maintenance tool, a control unit, a first track, a second track, a maintenance crane movably mounted on the first track, a plurality of first sensors disposed on the first track, an OHT vehicle movably mounted on the second track, and a second sensor on the OHT vehicle. The first sensors detect a location of the maintenance crane and generate a first location data to the control unit. The second sensor generates a second location data to the control unit.
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公开(公告)号：US20230359125A1
公开(公告)日：2023-11-09
申请号：US18223496
申请日：2023-07-18
Inventor： Che-Chang HSU , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC classification number: G03F7/70033 , H05G2/008 , H05G2/006 , G21K1/06 , G06T7/0004 , G06T1/0014 , H05G2/005 , G06T2207/30148
Abstract: In a method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system one or more streams of a gas is directed, through one or more gas outlets mounted over a rim of a collector mirror of an EUV radiation source, to generate a flow of the gas over a surface of the collector mirror. The one or more flow rates of the one or more streams of the gas are adjusted to reduce an amount of metal debris deposited on the surface of the collector mirror.
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公开(公告)号：US11567415B2
公开(公告)日：2023-01-31
申请号：US17382955
申请日：2021-07-22
Inventor： Chiao-Hua Cheng , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen , Sheng-Kang Yu
Abstract: A method for inspecting an extreme ultraviolet (EUV) light source includes: removing a collector mirror of the EUV light source from a collector chamber; installing an inspection apparatus within the collector chamber, the apparatus including a selectively extendable and retractable member and a camera at one end of the member; operating a first actuator to extend the member along a path through the interior chamber of the EUV light source, thereby moving the camera to a given position within the interior chamber of the EUV light source; operating a second actuator to pan the camera about an axis of rotation, thereby establishing a given camera orientation within the interior of the EUV light source; and, capturing an image of the interior chamber of the EUV light source with the camera while the camera is at the given position and orientation established by the operation of the first and second actuators.
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公开(公告)号：US11553581B2
公开(公告)日：2023-01-10
申请号：US17369740
申请日：2021-07-07
Inventor： Chiao-Hua Cheng , Hsin-Feng Chen , Yu-Fa Lo , Yu-Kuang Sun , Wei-Shin Cheng , Yu-Huan Chen , Ming-Hsun Tsai , Cheng-Hao Lai , Cheng-Hsuan Wu , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen , Sheng-Kang Yu
Abstract: A method for using an extreme ultraviolet radiation source is provided. The method includes assembling a first droplet generator onto a port of a vessel; ejecting a target droplet from the first droplet generator to a zone of excitation in front of a collector; emitting a laser toward the zone of excitation, such that the target droplet is heated by the laser to generate extreme ultraviolet (EUV) radiation; stopping the ejection of the target droplet; after stopping the ejection of the target droplet, disassembling the first droplet generator from the port of the vessel; after disassembling the first droplet generator from the port of the vessel, inserting a cleaning device into the vessel through the port; and cleaning the collector by using the cleaning device.
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