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    Reticle cleaning device and method of use
    6.
    发明授权
    Reticle cleaning device and method of use 有权

    公开(公告)号：US11650512B2

    公开(公告)日：2023-05-16

    申请号：US17655877

    申请日：2022-03-22

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Che-Chang Hsu ,  Sheng-Kang Yu ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

    IPC: G03F7/20 ,  G03F1/82 ,  G03F1/62

    CPC classification number: G03F7/70925 ,  G03F1/62 ,  G03F1/82 ,  G03F7/70033

    Abstract: Some implementations described herein provide a reticle cleaning device and a method of use. The reticle cleaning device includes a support member configured for extension toward a reticle within an extreme ultraviolet lithography tool. The reticle cleaning device also includes a contact surface disposed at an end of the support member and configured to bond to particles contacted by the contact surface. The reticle cleaning device further includes a stress sensor configured to measure an amount of stress applied to the support member at the contact surface. During a cleaning operation in which the contact surface is moving toward the reticle, the stress sensor may provide an indication that the amount of stress applied to the support member satisfies a threshold. Based on satisfying the threshold, movement of the contact surface and/or the support member toward the reticle ceases to avoid damaging the reticle.

    INSPECTION SYSTEM FOR EXTREME ULTRAVIOLET (EUV) LIGHT SOURCE
    7.
    发明申请
    INSPECTION SYSTEM FOR EXTREME ULTRAVIOLET (EUV) LIGHT SOURCE 有权

    公开(公告)号：US20220326624A1

    公开(公告)日：2022-10-13

    申请号：US17382955

    申请日：2021-07-22

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Chiao-Hua Cheng ,  Shang-Chieh Chien ,  Heng-Hsin Liu ,  Li-Jui Chen ,  Sheng-Kang Yu

    IPC: G03F7/20 ,  H04N5/232 ,  G06T7/00

    Abstract: A method for inspecting an extreme ultraviolet (EUV) light source includes: removing a collector mirror of the EUV light source from a collector chamber; installing an inspection apparatus within the collector chamber, the apparatus including a selectively extendable and retractable member and a camera at one end of the member; operating a first actuator to extend the member along a path through the interior chamber of the EUV light source, thereby moving the camera to a given position within the interior chamber of the EUV light source; operating a second actuator to pan the camera about an axis of rotation, thereby establishing a given camera orientation within the interior of the EUV light source; and, capturing an image of the interior chamber of the EUV light source with the camera while the camera is at the given position and orientation established by the operation of the first and second actuators.

    Reticle cleaning device and method of use
    9.
    发明授权
    Reticle cleaning device and method of use 有权

    公开(公告)号：US12210295B2

    公开(公告)日：2025-01-28

    申请号：US18308700

    申请日：2023-04-28

    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

    Inventor： Che-Chang Hsu ,  Sheng-Kang Yu ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

    IPC: G03F7/00 ,  G03F1/62 ,  G03F1/82

    Abstract: Some implementations described herein provide a reticle cleaning device and a method of use. The reticle cleaning device includes a support member configured for extension toward a reticle within an extreme ultraviolet lithography tool. The reticle cleaning device also includes a contact surface disposed at an end of the support member and configured to bond to particles contacted by the contact surface. The reticle cleaning device further includes a stress sensor configured to measure an amount of stress applied to the support member at the contact surface. During a cleaning operation in which the contact surface is moving toward the reticle, the stress sensor may provide an indication that the amount of stress applied to the support member satisfies a threshold. Based on satisfying the threshold, movement of the contact surface and/or the support member toward the reticle ceases to avoid damaging the reticle.

    EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM
    10.
    发明公开
    EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM 审中-公开

    公开(公告)号：US20240345491A1

    公开(公告)日：2024-10-17

    申请号：US18133948

    申请日：2023-04-12

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD

    Inventor： Cheng Hung TSAI ,  Sheng-Kang Yu ,  Heng-Hsin Liu ,  Li-Jui Chen ,  Shang-Chieh Chien

    IPC: G03F7/20

    CPC classification number: G03F7/7085 ,  G03F7/70533 ,  G03F7/70858 ,  G03F7/70925

    Abstract: A system for monitoring and controlling an EUV light source includes a first temperature sensor, a signal processor, and a process controller. The first temperature sensor includes a portion inserted into a space surrounded by a plurality of vanes through a vane of the plurality of vanes, and obtains an ambient temperature that decreases with time as a function of tin contamination coating on the inserted portion. The signal processor determines an excess tin debris deposition on the vane based on the obtained chamber ambient temperature. The process controller activates a vane cleaning action upon being informed of the excess tin debris deposition by the signal processor, thereby improving availability of the EUV light source tool and reducing risks of tin pollution on other tools such as a reticle.

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