Abstract:
A display device includes a substrate including a display area in which a plurality of pixels is disposed, and a non-display area near the display area; an insulating layer disposed on the substrate; a metal wiring disposed on the substrate; and a plurality of dummy patterns disposed in the non-display area of the substrate. The plurality of dummy patterns includes a plurality of first patterns including an insulating material and a plurality of second patterns including a metal material.
Abstract:
A display device includes a display panel, a camera module, and a heat sink plate. The display panel displays an image on a front surface, and includes a first substrate, a sub-pixel structure, and a reflection pattern. The display panel includes a plurality of pixel regions each having sub-pixel regions, a transparent region, and a reflection region surrounding the sub-pixel regions and the transparent region. The sub-pixel structure is disposed in the sub-pixel region. The second substrate is disposed on the sub-pixel structure. The reflection pattern is disposed on the second substrate, but not on the sub-pixel region and the transparent region. The camera module is disposed in a second surface on the display panel, and the second surface is opposite to the first surface. The heat sink plate is disposed between the display panel and the camera module, and has an opening that is aligned with the camera module.
Abstract:
A display device includes a reflecting layer. A display device according to an exemplary embodiment of the present invention includes: a lower substrate; an upper substrate facing the lower substrate; a thin film transistor on the lower substrate; and a first reflecting layer on a first surface of the upper substrate, the first surface facing the lower substrate, in which the lower substrate and the upper substrate include a display area for displaying an image, and a peripheral area outside the display area, and wherein the first reflecting layer is at the peripheral area, at display area, and at an area adjacent an edge of the upper substrate.
Abstract:
An organic light-emitting diode display and a method of manufacturing the same are disclosed. In one aspect, the display includes a substrate including a display area configured to display an image and a peripheral area surrounding the display area. The display also includes a thin film transistor formed in the display area over the substrate, a first planarization layer covering the TFT in the display area, and an OLED formed over the first planarization layer and electrically connected to the TFT. The display also includes a second planarization layer formed in the peripheral area, the second planarization layer including a plurality of out-gassing holes formed therein, and at least a portion of the second planarization layer thinner than the first planarization layer.
Abstract:
A display device includes a reflecting layer. A display device according to an exemplary embodiment of the present invention includes: a lower substrate; an upper substrate facing the lower substrate; a thin film transistor on the lower substrate; and a first reflecting layer on a first surface of the upper substrate, the first surface facing the lower substrate, in which the lower substrate and the upper substrate include a display area for displaying an image, and a peripheral area outside the display area, and wherein the first reflecting layer is at the peripheral area, at display area, and at an area adjacent an edge of the upper substrate.
Abstract:
A display device includes a reflecting layer. A display device according to an exemplary embodiment of the present invention includes: a lower substrate; an upper substrate facing the lower substrate; a thin film transistor on the lower substrate; and a first reflecting layer on a first surface of the upper substrate, the first surface facing the lower substrate, in which the lower substrate and the upper substrate include a display area for displaying an image, and a peripheral area outside the display area, and wherein the first reflecting layer is at the peripheral area, at display area, and at an area adjacent an edge of the upper substrate.
Abstract:
A method of forming a polycrystalline silicon layer includes forming a first amorphous silicon layer and forming a second amorphous silicon layer such that the first amorphous silicon layer and the second amorphous silicon layer have different film qualities from each other, and crystallizing the first amorphous silicon layer and the second amorphous silicon layer using a metal catalyst to form a first polycrystalline silicon layer and a second polycrystalline silicon layer. A thin film transistor includes the polycrystalline silicon layer formed by the method and an organic light emitting device includes the thin film transistor.
Abstract:
An organic light emitting diode display includes: a substrate; an interlayer insulating layer on the substrate; driving source and drain electrodes on the interlayer insulating layer and facing each other; a planarizing layer on the interlayer insulating layer; a pixel electrode on the planarizing layer and including a reflective electrode; a pixel defining layer on an edge portion of the pixel electrode and the planarizing layer, and including an opening for exposing the pixel electrode and a reflective hole for exposing a part of the interlayer insulating layer; an organic emission layer on the pixel electrode within the opening; a common electrode on the organic emission layer and the pixel defining layer and within the reflective hole, and including a transparent electrode; and an optical sensor under the substrate, in which the reflective hole moves light emitted from the organic emission layer to the optical sensor under the substrate.
Abstract:
A display device includes a substrate, a passivation layer on the substrate and including an area having a first thickness and an area having a second thickness less than the first thickness, a first electrode on the passivation layer and including at least two sub-electrodes spaced apart from each other by a slit having two ends, a light emitting layer on the first electrode, and a second electrode on the light emitting layer. Both ends of the slit are in one the area of the passivation layer having the second thickness.
Abstract:
A display device including: a substrate; a first semiconductor layer disposed on the substrate; a second semiconductor layer disposed on the substrate and adjacent to the first semiconductor layer; a first insulation layer disposed on both the first semiconductor layer and the second semiconductor layer, the first insulation layer including a first opening forming a space between the first semiconductor layer and the second semiconductor layer; and a second insulation layer disposed on the first insulation layer and that fills the first opening.