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21.发明申请公开(公告)号：US20140375981A1
公开(公告)日：2014-12-25
申请号：US14043783
申请日：2013-10-01
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Klaus Flock , Lawrence Rotter , Shankar Krishnan , Johannes D. de Veer , Catalin Filip , Gregory Brady , Muzammil Arain , Andrei Shchegrov
IPC: G01N21/88
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/9501 , G01N21/956 , G01N2021/214 , G01N2021/8848 , G01N2201/06113 , G01N2201/0636
Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
Abstract translation: 一种装置包括（i）用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合 （AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束，以及（v） 控制器，用于基于输出信号或图像来表征样本的特征。
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公开(公告)号：US11056366B2
公开(公告)日：2021-07-06
申请号：US16280145
申请日：2019-02-20
Applicant: KLA-Tencor Corporation
Inventor： Giampietro Bieli , Robert Tas , Kevin O'Brien , Shankar Krishnan , Joshua Butler
Abstract: A metrology system may include one or more casings that fit within an interior cavity of a sample transport device, an illumination source within one of the one or more casings, one or more illumination optics within one of the one or more casings for directing illumination from the illumination source to a sample located in the interior cavity of the sample transport device, one or more collection optics within one of the one or more casings for light from the sample in response to the illumination from the illumination source, and one or more detectors within one of the one or more casings for generating metrology data based on at least a portion of the light collected by the one or more collection optics.
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公开(公告)号：US20200232909A1
公开(公告)日：2020-07-23
申请号：US16286315
申请日：2019-02-26
Applicant: KLA-Tencor Corporation
Inventor： Phillip Atkins , Liequan Lee , Shankar Krishnan , David C.S. Wu , Emily Chiu
Abstract: A metrology system may receive a model for measuring one or more selected attributes of a target including features distributed in a selected pattern based on regression of spectroscopic scatterometry data from a scatterometry tool for a range of wavelengths. The metrology system may further generate a weighting function for the model to de-emphasize portions of the spectroscopic scatterometry data associated with wavelengths at which light captured by the scatterometry tool when measuring the target is predicted to include undesired diffraction orders. The metrology system may further direct the spectroscopic scatterometry tool to generate scatterometry data of one or more measurement targets including fabricated features distributed in the selected pattern. The metrology system may further measure the selected attributes for the one or more measurement targets based on regression of the scatterometry data of the one or more measurement targets to the model weighted by the weighting function.
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公开(公告)号：US20190295874A1
公开(公告)日：2019-09-26
申请号：US16280145
申请日：2019-02-20
Applicant: KLA-Tencor Corporation
Inventor： Giampietro Bieli , Robert Tas , Kevin O'Brien , Shankar Krishnan , Joshua Butler
Abstract: A metrology system may include one or more casings that fit within an interior cavity of a sample transport device, an illumination source within one of the one or more casings, one or more illumination optics within one of the one or more casings for directing illumination from the illumination source to a sample located in the interior cavity of the sample transport device, one or more collection optics within one of the one or more casings for light from the sample in response to the illumination from the illumination source, and one or more detectors within one of the one or more casings for generating metrology data based on at least a portion of the light collected by the one or more collection optics.
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公开(公告)号：US10041873B2
公开(公告)日：2018-08-07
申请号：US15582331
申请日：2017-04-28
Applicant: KLA-Tencor Corporation
Inventor： Shankar Krishnan
Abstract: Methods and systems for performing optical measurements of the porosity of geometric structures filled with a fill material by a capillary condensation process are presented herein. Measurements are performed while the structure under measurement is treated with a flow of purge gas that includes a controlled amount of vaporized fill material. A portion of the fill material condenses and fills openings in the structural features such as pores of a planar film, spaces between structural features, small volumes such as notches, trenches, slits, contact holes, etc. In one aspect, the desired degree of saturation of vaporized material in the gaseous flow is determined based on the maximum feature size to be filled. In another aspect, measurement data is collected when a structure is unfilled and when the structure is filled. The collected data is combined in a multi-target model based measurement to estimate values of porosity and critical dimensions.
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Patent Agency Ranking
公开(公告)号：US09921104B2
公开(公告)日：2018-03-20
申请号：US15344825
申请日：2016-11-07
Applicant: KLA-Tencor Corporation
Inventor： Shankar Krishnan , Alexander Buettner , Kerstin Purrucker , David Y. Wang
CPC classification number: G01J3/189 , G01J3/0289 , G01J3/10 , G01J3/2803 , G01N21/255 , G01N21/27 , G01N33/00 , G01N2033/0095
Abstract: Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures over a broad range of angles of incidence (AOI), azimuth angles, or both, are presented herein. Spectra including two or more sub-ranges of angles of incidence, azimuth angles, or both, are simultaneously measured over different sensor areas at high throughput. Collected light is linearly dispersed across different photosensitive areas of one or more detectors according to wavelength for each subrange of AOIs, azimuth angles, or both. Each different photosensitive area is arranged on the one or more detectors to perform a separate spectroscopic measurement for each different range of AOIs, azimuth angles, or both. In this manner, a broad range of AOIs, azimuth angles, or both, are detected with high signal to noise ratio, simultaneously. This approach enables high throughput measurements of high aspect ratio structures with high throughput, precision, and accuracy.
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公开(公告)号：US20180061691A1
公开(公告)日：2018-03-01
申请号：US15688751
申请日：2017-08-28
Applicant: KLA-Tencor Corporation
Inventor： Prateek Jain , Daniel Wack , Kevin A. Peterlinz , Andrei V. Shchegrov , Shankar Krishnan
CPC classification number: H01L21/67253 , H01L22/10 , H01L22/12
Abstract: Methods and systems for performing in-situ, selective spectral reflectometry (SSR) measurements of semiconductor structures disposed on a wafer are presented herein. Illumination light reflected from a wafer surface is spatially imaged. Signals from selected regions of the image are collected and spectrally analyzed, while other portions of the image are discarded. In some embodiments, a SSR includes a dynamic mirror array (DMA) disposed in the optical path at or near a field plane conjugate to the surface of the semiconductor wafer under measurement. The DMA selectively blocks the undesired portion of wafer image. In other embodiments, a SSR includes a hyperspectral imaging system including a plurality of spectrometers each configured to collect light from a spatially distinct area of a field image conjugate to the wafer surface. Selected spectral signals associated with desired regions of the wafer image are selected for analysis.
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公开(公告)号：US09816810B2
公开(公告)日：2017-11-14
申请号：US15268217
申请日：2016-09-16
Applicant: KLA-Tencor Corporation
Inventor： Andrei V. Shchegrov , Shankar Krishnan , Kevin Peterlinz , Thaddeus Gerard Dziura , Noam Sapiens , Stilian Ivanov Pandev
CPC classification number: G01B11/272 , G01B2210/56 , G03F7/0002 , G03F7/70141 , G03F7/70625 , H01L22/12 , H01L22/30
Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero.
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公开(公告)号：US20170315044A1
公开(公告)日：2017-11-02
申请号：US15582331
申请日：2017-04-28
Applicant: KLA-Tencor Corporation
Inventor： Shankar Krishnan
CPC classification number: G01N15/088 , G01B11/12 , G01B2210/56 , G01N15/0806 , G01N21/00 , G01N21/91 , G01N2021/213 , G01N2021/8427 , G03F7/00
Abstract: Methods and systems for performing optical measurements of the porosity of geometric structures filled with a fill material by a capillary condensation process are presented herein. Measurements are performed while the structure under measurement is treated with a flow of purge gas that includes a controlled amount of vaporized fill material. A portion of the fill material condenses and fills openings in the structural features such as pores of a planar film, spaces between structural features, small volumes such as notches, trenches, slits, contact holes, etc. In one aspect, the desired degree of saturation of vaporized material in the gaseous flow is determined based on the maximum feature size to be filled. In another aspect, measurement data is collected when a structure is unfilled and when the structure is filled. The collected data is combined in a multi-target model based measurement to estimate values of porosity and critical dimensions.
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公开(公告)号：US20170314912A1
公开(公告)日：2017-11-02
申请号：US15497033
申请日：2017-04-25
Applicant: KLA-Tencor Corporation
Inventor： Shankar Krishnan
CPC classification number: G01B11/02 , G01B2210/56 , G01N1/28 , G01N21/255 , G01N21/64 , G03F7/00 , G03F7/70616
Abstract: Methods and systems for performing optical measurements of geometric structures filled by a capillary condensation process are presented herein. Measurements are performed while the structures under measurement are treated with a flow of purge gas that includes a controlled amount of fill material. A portion of the fill material condenses onto the structures under measurement and fills openings in the structural features, spaces between structural features, small volumes such as notches, trenches, slits, contact holes, etc. The degree of saturation of vaporized material in the gaseous flow is adjusted based on the maximum feature size to be filled. In some examples, measurement data, such as spectroscopic data or image data, are collected when a structure is unfilled and when the structure is filled by capillary condensation. The collected data are combined to improve measurement performance.
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