Abstract:
A semiconductor device, comprising a base substrate, a buffer layer and a polysilicon layer film, wherein the base substrate, the buffer layer and the polysilicon layer film being laminated sequentially, and wherein regularly arranged first grooves being provided on a surface of the buffer layer contacting the polysilicon film; the polysilicon film being formed, by applying crystallization treatment, through an optical annealing process, to an amorphous silicon film on the buffer layer having regularly arranged first grooves.
Abstract:
An array substrate, a manufacturing method thereof, a display device, a thin-film transistor (TFT) and a manufacturing method thereof are disclosed. The method for manufacturing the TFT comprises: forming a pattern of an active layer and a gate insulating layer provided with a metal film on a base substrate patterning the metal film by one patterning process, and forming patterns of a gate electrode, a source electrode, a drain electrode, a gate line and a data line; forming a passivation layer on the base substrate; patterning the passivation layer by one patterning process, and forming a source contact hole, a drain contact hole and a bridge structure contact hole; and forming a transparent conductive film on the base substrate, and removing partial transparent conductive film to form a source contact portion, a drain contact portion, a pixel electrode and a bridge structure.
Abstract:
A thin film transistor and its manufacturing method, an array substrate and its manufacturing method, and a display device are provided. The thin film transistor includes a gate electrode, a source electrode, a drain electrode, an active layer and a gate insulation layer. The gate insulation layer is provided above the active layer, the gate, the source electrode and the drain electrode are provided on a same layer above the gate insulation layer, the active layer and the source electrode are connected through a first connection electrode, and the active layer and the drain electrode are connected through a second connection electrode. The thin film transistor can be formed by three times of patterning processes, by which the process time period is shortened, the process yield is improved, and the process cost is reduced, and so on.
Abstract:
A light emitting substrate and a display device are provided, the light emitting substrate includes: a base substrate; an electrode planarization layer, on the base substrate; an electrode layer, at a side of the electrode planarization layer away from the base substrate, the electrode layer includes a first electrode and a second electrode, the first electrode includes at least one first electrode strip, the second electrode includes at least one second electrode strip, the first electrode strip and the second electrode strip are spaced and alternately arranged in a first direction, each of the at least one first electrode strip and each of the at least one second electrode strip extend along a second direction, the electrode planarization layer includes a first groove between a first electrode strip and a second electrode strip which are adjacent to each other, the first groove is configured to accommodate a light emitting diode.
Abstract:
The present disclosure relates to an array substrate, a display panel, and a display device. The array substrate comprises a display area and a non-display area surrounding the display area; wherein: the display area includes gate lines and data lines, and a plurality of pixel units defined by the intersections of gate lines and data lines, each of the pixel units including a thin film transistor and a pixel electrode electrically connected to a drain electrode of the thin film transistor; the non-display area includes a plurality of dummy pixel units arranged around the display area, each of the dummy pixel units including a dummy thin film transistor and a dummy pixel electrode floating relative to a drain electrode of the dummy thin film transistor; the non-display area further includes a dummy common electrode structure electrically connected to at least some of the dummy pixel units.
Abstract:
The present disclosure provides a display substrate, a fabrication method thereof and a display panel. The display substrate includes a display area (101) and a non-display area (102) around the display area (101), the display substrate further includes: a base substrate (100); at least one barrier dam (200) and a first encapsulating layer (310) on the base substrate (100), the barrier dam (200) is in the non-display area (102) on the base substrate (100), the first encapsulating layer (310) is on the base substrate (100) and on a side of the at least one barrier dam (200) facing the display area (101), the first encapsulating layer (310) is formed by a first encapsulating material (301) in a cured state, and at least a side of the barrier dam (200) facing the first encapsulating layer (310) is lyophobic with respect to the first encapsulating material (301) in a non-cured state.
Abstract:
A pixel structure and a manufacturing method thereof, an array substrate and a display device are provided. The pixel structure includes a first electrode having a first groove group, a second groove group and a non-hollow portion; the first groove group includes a plurality of hollow first grooves arranged successively, each first groove includes a first end and a second end arranged along an extending direction thereof; the second groove group includes a plurality of hollow second grooves arranged successively, each second groove includes a third end and a fourth end arranged along an extending direction thereof, and a third end is on a side of the fourth end adjacent to the first groove group; and the third end of at least one second groove is staggered with respect to the second endo of the first groove adjacent to the third end.
Abstract:
An array substrate, a display panel and a display device are disclosed. The array substrate includes a display region and a non-display region around the display region, and further includes: a first leading wire extending from the non-display region to the display region and a second leading wire extending from the non-display region to the display region. The first leading wire is between a first signal line and a first fan-out line and electrically connects the first signal line and the first fan-out line, and the second leading wire is between a second signal line and a second fan-out line and electrically connects the second signal line and the second fan-out line. The first leading wire and the second leading wire are in different layers.
Abstract:
The disclosure discloses a display substrate, a display panel, and a display device. The display substrate includes a plurality of pixel units, each pixel unit includes a first sub-pixel region, a second sub-pixel region, slit electrodes and two thin film transistors, the slit electrodes include a first slit electrode and a second slit electrode corresponding respectively to the first sub-pixel region and the second sub-pixel region, where each of the first slit electrode and the second slit electrode includes at least one slit group, each slit group includes a plurality of slits arranged in a same direction, a slit extension direction and a direction of a formed electric field of one slit group of the first slit electrode are different from a slit extension direction and a direction of a formed electric field of at least one of the at least one slit group of the second slit electrode, respectively.
Abstract:
The disclosure provides an array substrate, a manufacturing method thereof and a display device. The array substrate includes a plurality of conductive lines and an electrostatic protection circuit on a base substrate. At least some of the conductive lines are connected through the electrostatic protection circuit. Two conductive lines connected with the electrostatic protection circuit are respectively a first conductive line and a second conductive line. The electrostatic protection circuit includes a first transistor, a second transistor, and a first capacitor. A first electrode of the first transistor, a first electrode of the second transistor and a gate electrode of the second transistor are connected to the second conductive line, and a second electrode of the first transistor, a second electrode of the second transistor and a gate electrode of the first transistor are connected to the first conductive line.