公开(公告)号：US20240249912A1

公开(公告)日：2024-07-25

申请号：US18382578

申请日：2023-10-23

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/12 ,  H01J37/1474 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1532 ,  H01J2237/2817

Abstract: A charged particle assessment tool includes: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes adjacent respective ones of the beam apertures and configured to capture charged particles emitted from the sample.

公开(公告)号：US20240071716A1

公开(公告)日：2024-02-29

申请号：US18384791

申请日：2023-10-27

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/226 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/2482

Abstract: The embodiments of the present disclosure provide a charged particle assessment system comprising: a sample holder configured to hold a sample having a surface; a charged particle-optical device configured to project a charged particle beam towards the sample, the charged particle beam having a field of view corresponding to a portion of the surface of the sample, the charged particle-optical device having a facing surface facing the sample holder; and a projection assembly arranged to direct a light beam along a light path such that the light beam reflects off the facing surface up-beam, with respect to the light path, of being incident on the portion of the surface of the sample.

公开(公告)号：US20230326715A1

公开(公告)日：2023-10-12

申请号：US18209445

申请日：2023-06-13

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/317 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/1474 ,  H01J37/28

Abstract: Charged particle systems and methods for processing a sample using a multi-beam of charged particles are disclosed. In one arrangement, a column directs a multi-beam of sub-beams of charged particles onto a sample surface of a sample. A sample is moved in a direction parallel to a first direction while the column is used to repeatedly scan the multi-beam over the sample surface in a direction parallel to a second direction. An elongate region on the sample surface is thus processed with each sub-beam. The sample is displaced in a direction oblique or perpendicular to the first direction. The process is repeated to process further elongate regions with each sub-beam. The resulting plurality of processed elongate regions define a sub-beam processed area for each sub-beam.

公开(公告)号：US20230282440A1

公开(公告)日：2023-09-07

申请号：US18134020

申请日：2023-04-12

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/147 ,  H01J37/12

CPC classification number: H01J37/147 ,  H01J37/12 ,  H01J2237/2817

Abstract: Disclosed herein is an aperture array configured to define sub-beams that are scanned in a scanning direction in a charged particle apparatus, the aperture array comprising a plurality of apertures arranged in an aperture pattern that comprises: a plurality of parallel aperture rows, wherein apertures are arranged along the aperture rows and the aperture rows are inclined relative to the scanning direction; an edge aperture row defining an edge of the aperture pattern; and an adjacent aperture row adjacent the edge row; wherein the edge aperture row and the adjacent aperture row each comprise fewer apertures than another aperture row of the aperture pattern.

公开(公告)号：US20230125800A1

公开(公告)日：2023-04-27

申请号：US17912608

申请日：2021-04-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/147

Abstract: A charged-particle tool including: a condenser lens array configured to separate a beam of charged particles into a first plurality of sub-beams along a respective beam path and to focus each of the sub-beams to a respective intermediate focus; an array of objective lenses, each objective lens configured to project one of the plurality of sub-beams onto a sample; a corrector including an array of elongate electrodes, the elongate electrodes extending substantially perpendicular to the beam paths of the first plurality of sub-beams and arranged such that a second plurality of the sub-beams propagate between a pair of the elongate electrodes, the second plurality of sub-beams being a subset of the first plurality of sub-beams; and an electric power supply configured to apply a potential difference between the pair of elongate electrodes so as to deflect the second plurality of sub-beams by a desired amount.

公开(公告)号：US20230096574A1

公开(公告)日：2023-03-30

申请号：US17798538

申请日：2021-02-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: G01N23/2206 ,  G01N23/2251 ,  G01N23/203

Abstract: Charged particle assessment tools and inspection methods are disclosed. In one arrangement, a condenser lens array divides a beam of charged particles into a plurality of sub-beams. Each sub-beam is focused to a respective intermediate focus. Objective lenses downstream from the intermediate foci project sub-beams from the condenser lens array onto a sample. A path of each sub-beam is substantially a straight line from each condenser lens to a corresponding objective lens.

公开(公告)号：US20230072858A1

公开(公告)日：2023-03-09

申请号：US17794435

申请日：2021-01-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Lucas BRANDT ,  Marco Jan-Jaco WIELAND

IPC: H01J37/153

Abstract: A multi-beam manipulator device operates on sub-beams of a multi-beam to deflect the sub-beam paths. The device include: an electrode as pairs of parallel surfaces. Each pair of parallel surfaces includes a first surface that is arranged along a side of a corresponding line of sub-beam paths and a second surface that is arranged parallel to the first surface and along an opposite side of the corresponding line of sub-beam paths. A first pair of parallel surfaces is configured to electrostatically interact with an entire line of sub-beams in the multi-beam so that it is capable of applying a deflection amount to the paths of sub-beams in a first direction. A second pair of parallel surfaces is configured to electro-statically interact with an entire line of sub-beams in the multi-beam so that it is capable of applying another deflection amount to the paths of sub-beams in a second direction.

公开(公告)号：US20220392729A1

公开(公告)日：2022-12-08

申请号：US17891913

申请日：2022-08-19

Applicant: ASML Netherlands B.V.

Inventor： Arjen Benjamin STORM ,  Johan Frederik Cornelis VAN GURP ,  Henri Kristian ERVASTI ,  Aaron Yang-Fay AYAL ,  Stijn Wilem Herman Karel STEENBRINK ,  Marco Jan-Jaco WIELAND

IPC: H01J9/42 ,  H01J37/244

Abstract: Disclosed herein is an electron-optical assembly testing system for testing an electron-optical assembly, the system comprising: a source of charged particles configured to emit a beam of charged particles; an electron-optical assembly holder configured to hold an electron-optical assembly to be tested such that, when the system is in use with an electron-optical assembly held by the electron-optical assembly holder, the electron-optical assembly is illuminated by the beam; and a sub-beam detector for detecting sub-beams of charged particles that have been transmitted through the electron-optical assembly.

公开(公告)号：US20220285124A1

公开(公告)日：2022-09-08

申请号：US17824831

申请日：2022-05-25

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

IPC: H01J37/153 ,  H01J37/12 ,  H01J37/09 ,  H01J37/065

Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking 5 part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.

公开(公告)号：US20210383941A1

公开(公告)日：2021-12-09

申请号：US17403849

申请日：2021-08-16

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

IPC: G21K5/04 ,  H01J37/30 ,  G21K1/02 ,  H01J37/317 ,  H01J37/16 ,  H01J37/12

Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.