公开(公告)号：US20230020745A1

公开(公告)日：2023-01-19

申请号：US17952115

申请日：2022-09-23

Applicant: ASML Netherlands B.V.

Inventor： Arjen Benjamin STORM ,  Johan Frederik Cornelis VAN GURP ,  Johannes Cornelis Jacobus DE LANGEN ,  Aaron Yang-Fay AYAL ,  Michiel Matthieu BRUININK ,  Christiaan Ruben VAN DEN BERG ,  Christiaan OTTEN ,  Laura DINU GURTLER ,  Marc SMITS

IPC: H01J37/317 ,  G03F9/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/153 ,  H01J37/09

Abstract: Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.

公开(公告)号：US20220392729A1

公开(公告)日：2022-12-08

申请号：US17891913

申请日：2022-08-19

Applicant: ASML Netherlands B.V.

Inventor： Arjen Benjamin STORM ,  Johan Frederik Cornelis VAN GURP ,  Henri Kristian ERVASTI ,  Aaron Yang-Fay AYAL ,  Stijn Wilem Herman Karel STEENBRINK ,  Marco Jan-Jaco WIELAND

IPC: H01J9/42 ,  H01J37/244

Abstract: Disclosed herein is an electron-optical assembly testing system for testing an electron-optical assembly, the system comprising: a source of charged particles configured to emit a beam of charged particles; an electron-optical assembly holder configured to hold an electron-optical assembly to be tested such that, when the system is in use with an electron-optical assembly held by the electron-optical assembly holder, the electron-optical assembly is illuminated by the beam; and a sub-beam detector for detecting sub-beams of charged particles that have been transmitted through the electron-optical assembly.