公开(公告)号：US20230020745A1

公开(公告)日：2023-01-19

申请号：US17952115

申请日：2022-09-23

Applicant: ASML Netherlands B.V.

Inventor： Arjen Benjamin STORM ,  Johan Frederik Cornelis VAN GURP ,  Johannes Cornelis Jacobus DE LANGEN ,  Aaron Yang-Fay AYAL ,  Michiel Matthieu BRUININK ,  Christiaan Ruben VAN DEN BERG ,  Christiaan OTTEN ,  Laura DINU GURTLER ,  Marc SMITS

IPC: H01J37/317 ,  G03F9/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/153 ,  H01J37/09

Abstract: Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.