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    Achromatic mass separator
    195.
    发明授权
    Achromatic mass separator 有权
    消色差分离器

    公开(公告)号：US08049180B2

    公开(公告)日：2011-11-01

    申请号：US11925598

    申请日：2007-10-26

    Applicant: Juergen Frosien ,  Helmut Banzhof

    Inventor： Juergen Frosien ,  Helmut Banzhof

    IPC: B01D59/44

    CPC classification number: H01J49/288 ,  H01J37/05 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/0805 ,  H01J2237/3174 ,  H01J2237/31749

    Abstract: An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.

    Abstract translation: 描述了离子束装置。 离子束装置包括用于产生离子束的离子束源，沿着第一轴发射的离子束，适于使离子束成形的孔单元，以及适于使离子束的离子偏转的消色差偏转单元， 预定质量的偏转角。 无彩色偏转单元包括：用于产生电场的电场产生部件和用于产生基本上垂直于电场的磁场的磁场产生部件。 该装置还包括质量分离孔，其适于阻挡具有不同于预定质量的质量的离子，并允许具有预定质量的离子侵入质量分离器，以及具有第二光轴的物镜，其中第二光轴为 相对于第一轴倾斜。

    Ion implantation systems
    196.
    发明授权
    Ion implantation systems 有权
    离子注入系统

    公开(公告)号：US08039821B2

    公开(公告)日：2011-10-18

    申请号：US12661523

    申请日：2010-03-18

    Applicant: Jiong Chen

    Inventor： Jiong Chen

    IPC: H01J37/317

    CPC classification number: H01J37/05 ,  H01J37/3171 ,  H01J2237/047 ,  H01J2237/31701

    Abstract: An ion implantation apparatus of high energy is disclosed in this invention. The new and improved system can have a wide range of ion beam energy at high beam transmission rates and flexible operation modes for different ion species. This high energy implantation system can be converted into a medium current by removing RF linear ion acceleration unit.

    Abstract translation: 本发明公开了一种高能离子注入装置。 新的和改进的系统可以在远光透射率下具有广泛的离子束能量和对于不同的离子种类具有灵活的操作模式。 这种高能量注入系统可以通过去除RF线性离子加速单元而转换为中等电流。

    TRANSMISSION ELECTRON MICROSCOPE HAVING ELECTRON SPECTROMETER
    197.
    发明申请
    TRANSMISSION ELECTRON MICROSCOPE HAVING ELECTRON SPECTROMETER 失效
    具有电子光谱仪的传输电子显微镜

    公开(公告)号：US20110240854A1

    公开(公告)日：2011-10-06

    申请号：US13133653

    申请日：2009-11-11

    Applicant: Shohei Terada ,  Yoshifumi Taniguchi ,  Tatsumi Hirano

    Inventor： Shohei Terada ,  Yoshifumi Taniguchi ,  Tatsumi Hirano

    IPC: G01N23/00 ,  H01J37/153

    CPC classification number: H01J37/05 ,  H01J37/153 ,  H01J37/244 ,  H01J2237/2446

    Abstract: In a spectral image formed by two orthogonal axes, one of which is an axis of the amount of energy loss and the other of which is an axis of positional information, by the use of an electron spectrometer and a transmission electron microscope, distortion in the spectral image of a sample to be analyzed is corrected with high efficiency and high accuracy by comparing electron beam positions calculated from a two-dimensional electron beam position image formed by the two orthogonal axes (the axis of the amount of energy loss and the axis of positional information) with reference electron beam positions, and calculating amounts of the distortion based on the differences of the electron beam positions. Method and apparatus are offered which correct distortion in a spectral image with high efficiency and high accuracy, the image being formed by the two orthogonal axes (the axis of the amount of energy loss and the axis of positional information).

    Abstract translation: 在由两个正交轴形成的光谱图像中，其中一个是能量损失量的轴，另一个是位置信息的轴，通过使用电子光谱仪和透射电子显微镜，在 通过比较从由两个正交轴形成的二维电子束位置图像计算的电子束位置（能量损失量的轴和能量损失的轴线），以高效率和高精度来校正要分析的样本的光谱图像 位置信息），以及基于电子束位置的差异计算失真量。 提供了以高效率和高精度校正光谱图像失真的方法和装置，该图像由两个正交轴（能量损失量的轴和位置信息的轴）形成。

    METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT
    199.
    发明申请
    METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT 有权
    等离子体沉积和处理的方法和系统

    公开(公告)号：US20110005461A1

    公开(公告)日：2011-01-13

    申请号：US12776132

    申请日：2010-05-07

    Applicant: Peter F. Vandermeulen

    Inventor： Peter F. Vandermeulen

    IPC: C23C16/511 ,  B01D59/44 ,  H05H1/46

    CPC classification number: H01J37/32229 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32669 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/3323 ,  H01P3/12 ,  H01P3/127 ,  H01Q21/0043

    Abstract: A plasma deposition apparatus includes a waveguide conduit having a plurality of slots therein. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of slots. One or more pipes have an outlet end positioned at each of the plurality of slots for transporting material from one or more material sources to the plurality of slots. The apparatus also includes a plasma chamber in communication with the waveguide tube through the plurality of slots. The plasma chamber receives through said plurality of slots microwaves from the waveguide tube and material to be melted or evaporated from the one or more pipes. The plasma chamber includes a plurality of magnets disposed in an outer wall of the plasma chamber for forming a magnetic field in the plasma chamber. The plasma chamber further includes one or more outlet openings for discharging plasma containing material to be deposited on a substrate.

    Abstract translation: 等离子体沉积设备包括其中具有多个狭槽的波导管道。 波导管道耦合到微波源，用于从微波源通过多个狭槽传送微波。 一个或多个管道具有位于多个狭槽中的每一个的出口端，用于将材料从一个或多个材料源输送到多个狭槽。 该装置还包括通过多个狭槽与波导管连通的等离子体室。 等离子体腔室通过所述多个槽从波导管接收微波，并且从一个或多个管道熔化或蒸发的材料。 等离子体室包括设置在等离子体室的外壁中的多个磁体，用于在等离子体室中形成磁场。 等离子体室还包括一个或多个出口开口，用于排放待沉积在衬底上的等离子体材料。

    Ion beam apparatus and method employing magnetic scanning
    200.
    发明授权
    Ion beam apparatus and method employing magnetic scanning 有权
    离子束装置和采用磁扫描的方法

    公开(公告)号：US07851773B2

    公开(公告)日：2010-12-14

    申请号：US12301557

    申请日：2007-06-13

    Applicant: Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

    Inventor： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

    IPC: H01J37/317 ,  H01J37/28 ,  H01L21/265

    CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0044 ,  H01J2237/0455 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/14 ,  H01J2237/30477 ,  H01J2237/31703 ,  H01L21/26513

    Abstract: A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the mass selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.

    Abstract translation: 一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有 质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在 至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束 相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定 较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单个原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子 在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

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