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公开(公告)号：US20160248219A1
公开(公告)日：2016-08-25
申请号：US15145251
申请日：2016-05-03
Applicant: GIGAPHOTON INC.
Inventor： Osamu WAKABAYASHI , Takashi MATSUNAGA
CPC classification number: H01S3/1305 , H01S3/005 , H01S3/0071 , H01S3/0092 , H01S3/08009 , H01S3/10092 , H01S3/139 , H01S3/1625 , H01S3/225 , H01S3/2308 , H01S3/2375
Abstract: A laser apparatus may include a first laser resonator configured to generate a laser beam, a first optical element configured to adjust a divergence in a first direction of the laser beam, a second optical element configured to adjust a divergence in a second direction of the laser beam, a measuring unit configured to measure the divergence in the first direction and the divergence in the second direction of the laser beam, and a controller configured to control one or both of the first optical element and the second optical element based on the divergence in the first direction and the divergence in the second direction of the laser beam both measured by the measuring unit.
Abstract translation: 激光装置可以包括被配置为产生激光束的第一激光谐振器，被配置为调节激光束的第一方向上的发散度的第一光学元件，被配置为调节激光器的第二方向上的发散度的第二光学元件 光束，测量单元，其被配置为测量所述激光束的所述第一方向上的发散度和所述第二方向上的发散度;以及控制器，被配置为基于所述第一光学元件和所述第二光学元件的发散度来控制所述第一光学元件和所述第二光学元件中的一个或两个 激光束的第二方向上的第一方向和偏离均由测量单元测量。
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公开(公告)号：US20160190763A1
公开(公告)日：2016-06-30
申请号：US15060148
申请日：2016-03-03
Applicant: GIGAPHOTON INC.
Inventor： Kouji KAKIZAKI , Takeshi ASAYAMA , Osamu WAKABAYASHI
CPC classification number: H01S3/038 , H01S3/08009 , H01S3/134 , H01S3/225
Abstract: There may be provided a laser apparatus including: an optical resonator including an output coupler; a laser chamber containing a laser medium and disposed in an optical path inside the optical resonator; a pair of discharge electrodes disposed inside the laser chamber; an electrode gap varying section configured to vary a gap between the discharge electrodes; a laser beam measurement section disposed in an optical path of a laser beam outputted from the output coupler, the laser beam resulting from electric discharge between the discharge electrodes; and a controller configured to control the gap between the discharge electrodes through activating the electrode gap varying section, based on a beam parameter of the laser beam measured by the laser beam measurement section.
Abstract translation: 可以提供一种激光装置，包括：包括输出耦合器的光谐振器; 包含激光介质并设置在光学谐振器内的光路中的激光室; 设置在激光室内的一对放电电极; 电极间隙变化部，被配置为改变所述放电电极之间的间隙; 设置在从输出耦合器输出的激光束的光路中的激光束测量部分，由放电电极之间的放电产生的激光束; 以及控制器，被配置为基于由激光束测量部测量的激光束的光束参数来激活电极间隙变化部分来控制放电电极之间的间隙。
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193.发明申请公开(公告)号：US20160135276A1
公开(公告)日：2016-05-12
申请号：US14995636
申请日：2016-01-14
Applicant: Gigaphoton Inc.
Inventor： Tamotsu ABE , Osamu WAKABAYASHI
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target generation unit configured to output a target to a predetermined region inside the chamber; a focusing optical system configured to concentrate a pulse laser beam to the predetermined region; and a plurality of scattered light detectors each configured to detect scattered light from the target irradiated with the pulse laser beam. The extreme ultraviolet light generation apparatus may further include: an optical path changer configured to change an optical path of the pulse laser beam; and an optical path controller configured to control the optical path changer on a basis of results of detection by the plurality of scattered light detectors.
Abstract translation: 极紫外光发生装置可以包括：腔室; 目标产生单元，被配置为将目标输出到所述室内的预定区域; 配置成将脉冲激光束集中到所述预定区域的聚焦光学系统; 以及多个散射光检测器，每个散射光检测器被配置为检测由脉冲激光束照射的来自目标的散射光。 所述极紫外光发生装置还可以包括：光路变换器，被配置为改变所述脉冲激光束的光路; 以及光路控制器，被配置为基于多个散射光检测器的检测结果来控制光路变换器。
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194.发明申请公开(公告)号：US20160076944A1
公开(公告)日：2016-03-17
申请号：US14947335
申请日：2015-11-20
Applicant: Gigaphoton Inc.
Inventor： Masato MORIYA , Osamu WAKABAYASHI , Yoshinobu WATABE
CPC classification number: G01J11/00 , G01J1/0414 , G01J1/0429 , G01J1/0477 , G01J1/4257 , G01J4/04 , G01J2001/4261 , G02B5/3066 , G02B27/148 , H01S3/0014 , H01S3/134 , H01S3/2366
Abstract: A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF2.
Abstract translation: 光束测量装置包括：偏振测量单元，包括设置在激光束的光路上的第一测量光束分离器，其被配置为测量被第一测量分束器部分反射的激光束的偏振状态; 光束轮廓测量单元，包括设置在激光束的光路上并被配置为测量被第二测量分束器部分反射的激光束的光束轮廓的第二测量分束器; 以及激光束方向稳定性测量单元，被配置为测量激光束的行进方向上的稳定性，而第一测量分束器和第二测量分束器由含有CaF 2的材料制成。
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公开(公告)号：US20160073487A1
公开(公告)日：2016-03-10
申请号：US14945096
申请日：2015-11-18
Applicant: GIGAPHOTON INC.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0602 , H01S3/08054 , H01S3/107 , H01S3/1115 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2316 , H01S3/235 , H05G2/006
Abstract: An extreme ultraviolet light generation system includes a chamber; a target generation unit configured to output a target toward a plasma generation region in the chamber; a laser system configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order; and a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.
Abstract translation: 一种极紫外光发生系统包括一个室; 目标产生单元，被配置为将所述目标朝向所述室中的等离子体产生区域输出; 激光系统，其被配置为产生第一预脉冲激光束，第二预脉冲激光束和主脉冲激光束，使得靶被第一预脉冲激光束照射，第二预脉冲激光束 ，主脉冲激光束依次为 以及控制器，被配置为控制所述激光系统，使得所述第二预脉冲激光束的能量密度等于或高于1J / cm 2并且等于或低于所述主脉冲激光束的能量密度。
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Patent Agency Ranking
公开(公告)号：US20150351209A1
公开(公告)日：2015-12-03
申请号：US14807875
申请日：2015-07-23
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Kouji KAKIZAKI , Tatsuya YANAGIDA , Osamu WAKABAYASHI
CPC classification number: H05G2/008 , H01S3/02 , H01S3/094026 , H01S3/10061 , H01S3/1106 , H01S3/131 , H01S3/1636 , H01S3/1643 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
Abstract translation: 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的光束强度和输出定时;以及目标 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。
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公开(公告)号：US20150340838A1
公开(公告)日：2015-11-26
申请号：US14748332
申请日：2015-06-24
Applicant: GIGAPHOTON INC.
Inventor： Masato MORIYA , Takashi SUGANUMA , Osamu WAKABAYASHI
CPC classification number: H01S3/0064 , H01S3/005 , H01S3/2232 , H01S3/2316 , H01S2301/02 , H05G2/008
Abstract: There may be included: a master oscillator configured to output pulsed laser light; two or more power amplifiers disposed in an optical path of the pulsed laser light to amplify the pulsed laser light; and an optical isolator provided between adjacent two of the power amplifiers in the optical path of the pulsed laser light, and configured to suppress transmission of light traveling from the power amplifiers to a side where the master oscillator is provided.
Abstract translation: 可以包括：主振荡器，被配置为输出脉冲激光; 设置在脉冲激光的光路中的两个或更多个功率放大器以放大脉冲激光; 以及光隔离器，其设置在脉冲激光的光路中的相邻的两个功率放大器之间，并且被配置为抑制从功率放大器传播到发送主振荡器的一侧的光。
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公开(公告)号：US20150264793A1
公开(公告)日：2015-09-17
申请号：US14724737
申请日：2015-05-28
Applicant: GIGAPHOTON INC.
Inventor： Osamu WAKABAYASHI , Tatsuya YANAGIDA , Hakaru MIZOGUCHI
IPC: H05G2/00
Abstract: An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
Abstract translation: 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。
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公开(公告)号：US20150245457A1
公开(公告)日：2015-08-27
申请号：US14707990
申请日：2015-05-08
Applicant: GIGAPHOTON INC.
Inventor： Toshihiro NISHISAKA , Yukio WATANABE , Osamu WAKABAYASHI , Kouji KAKIZAKI , Michio SHINOZAKI
CPC classification number: G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
Abstract translation: EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构 在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室 预定位置和维护区域。
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公开(公告)号：US20150226935A1
公开(公告)日：2015-08-13
申请号：US14697260
申请日：2015-04-27
Applicant: GIGAPHOTON INC.
Inventor： Hiroshi SOMEYA , Yukio WATANABE , Katsuhiko WAKANA , Osamu WAKABAYASHI
CPC classification number: G02B7/181 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70175
Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
Abstract translation: 反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部分中的相应凹槽上。
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