公开(公告)号：US20220384143A1

公开(公告)日：2022-12-01

申请号：US17664812

申请日：2022-05-24

申请人： IMS Nanofabrication GmbH

发明人： Elmar Platzgummer ,  Christoph Spengler ,  Michael Haberler

IPC分类号： H01J37/317 ,  H01J37/147 ,  H01J37/30 ,  H01J37/302

摘要： In a writing process in a charged-particle multi-beam apparatus, a desired pattern is written onto a target wherein said desired pattern is provided as input pattern data (INPDAT) in a vector format and processed through a pattern data processing flow. A data preprocessing system receives the input pattern data (INPDAT) and preprocesses the input pattern data independently of the writing process, preferably in advance to it, using writing parameter data provided to the data preprocessing system, and writes the intermediate pattern data (IMDAT) thus obtained to a data storage. When a writing process is carried out using the apparatus, its writing control system reads the intermediate pattern data from the data storage, converts them into pattern streaming data (SBUF), and streams the pattern streaming data to the apparatus for writing the pattern to the target.

公开(公告)号：US20220260764A1

公开(公告)日：2022-08-18

申请号：US17737723

申请日：2022-05-05

申请人： Applied Materials, Inc.

发明人： Rutger MEYER TIMMERMAN THIJSSEN ,  Morgan EVANS ,  Joseph C. OLSON

IPC分类号： G02B5/18 ,  H01J37/305 ,  H01J37/20 ,  H01J37/302

摘要： Embodiments described herein relate to methods of forming gratings with different slant angles on a substrate and forming gratings with different slant angles on successive substrates using angled etch systems. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle relative to a surface normal of the substrates and form gratings in the grating material. The substrates are rotated about an axis of the platen resulting in rotation angles ϕ between the ion beam and a surface normal of the gratings. The gratings have slant angles relative to the surface normal of the substrates. The rotation angles ϕ selected by an equation ϕ=cos−1 (tan()/tan()).

公开(公告)号：US11380519B1

公开(公告)日：2022-07-05

申请号：US17089861

申请日：2020-11-05

申请人： Carl Zeiss Microscopy GmbH

发明人： Dirk Preikszas

IPC分类号： H01J37/28 ,  H01J37/244 ,  H01J37/305 ,  H01J37/302 ,  H01J37/145

摘要： A particle beam generator for a particle beam device may be operated. A liquid metal may be provided from a container of a particle source to an emission device of the particle source and a first heating cycle for cleaning the particle source performed, which may comprise supplying a heating current to a heating device arranged at the emission device using a current supply unit, heating the emission device during a heating time period, measuring a value of a voltage drop at the heating device and/or at the current supply unit and adjusting at least one of: the heating current and the heating time period using the current supply unit, depending on the measured value of the voltage drop. A second heating cycle for cleaning the particle source may include using at least one of: the adjusted heating current and the adjusted heating time period, for heating the emission device.

公开(公告)号：US20220130640A1

公开(公告)日：2022-04-28

申请号：US17572767

申请日：2022-01-11

申请人： Carl Zeiss MultiSEM GmbH

发明人： Hans Fritz ,  Ingo Mueller

IPC分类号： H01J37/317 ,  H01J37/10 ,  H01J37/147 ,  H01J37/302

摘要： A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.

公开(公告)号：US11244807B2

公开(公告)日：2022-02-08

申请号：US17102551

申请日：2020-11-24

申请人： NuFlare Technology, Inc.

发明人： Tomoo Motosugi

IPC分类号： H01J37/00 ,  H01J37/317 ,  H01J37/20 ,  H01J37/147 ,  H01J37/302

摘要： In one embodiment, a settling time determination method includes deflecting a charged particle beam by applying a voltage outputted from an amplifier to a first deflector while changing a deflection settling time, and writing an evaluation pattern, measuring a position of the evaluation pattern, and determining a position displacement amount of the measured position from a design position, performing fitting of the position displacement amount for the deflection settling time on a first output waveform of the amplifier, and determining a deflection settling time in which the position displacement amount is within a predetermined range.

公开(公告)号：US20210375585A1

公开(公告)日：2021-12-02

申请号：US17403223

申请日：2021-08-16

申请人： Applied Materials, Inc.

发明人： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, JR. ,  Benjamin Oswald ,  Craig R. Chaney

IPC分类号： H01J37/302 ,  H01J37/08

摘要： An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

公开(公告)号：US11170976B2

公开(公告)日：2021-11-09

申请号：US16929300

申请日：2020-07-15

申请人： NuFlare Technology, Inc.

发明人： Hiroshi Matsumoto

IPC分类号： H01J37/317 ,  H01J37/304 ,  H01J37/302

摘要： In one embodiment, a multi-beam writing method includes acquiring a plurality of pieces of position deviation data corresponding to a plurality of parameter values of a parameter that change position deviation amount of each beam of multi-beam irradiated on a substrate, calculating a plurality of pieces of reference coefficient data corresponding to each of the plurality of pieces of position deviation data, calculating coefficient data corresponding to a parameter value at an irradiation position of the multi-beam on the substrate using the plurality of pieces of reference coefficient data corresponding to the plurality of parameter values, modulating an irradiation amount of each beam of the multi-beam for each shot using the coefficient data, and writing a pattern by irradiating the substrate with each beam of at least a part of the multi-beam having the modulated irradiation amounts.

公开(公告)号：US11170973B2

公开(公告)日：2021-11-09

申请号：US16735125

申请日：2020-01-06

申请人： Applied Materials, Inc.

发明人： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, Jr. ,  Benjamin Oswald ,  Craig R. Chaney

IPC分类号： H01J37/302 ,  H01J37/08 ,  H01J37/317

摘要： An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

公开(公告)号：US10971331B2

公开(公告)日：2021-04-06

申请号：US16448147

申请日：2019-06-21

申请人： NuFlare Technology, Inc.

发明人： Shinji Sakamoto ,  Kenichi Yasui ,  Chiaki Inaba ,  Hikaru Yamamura ,  Satoru Fukushima ,  Yoshinori Akahane

IPC分类号： H01J37/317 ,  H01J37/302 ,  H01J37/04 ,  H01J37/147 ,  H01J37/10

摘要： In one embodiment, a writing data generation method is for generating writing data used by a multi-charged particle beam writing apparatus. The writing data generation method includes referring to library data in which a vertex sequence including a plurality of vertices is registered, and extracting a portion of an outer line of a figure contained in design data, the portion corresponding to the vertex sequence, and representing the extracted portion by information which identifies the vertex sequence and information which indicates a connection method for the plurality of vertices of the vertex sequence, and generating the writing data.

公开(公告)号：US10950413B2

公开(公告)日：2021-03-16

申请号：US16417972

申请日：2019-05-21

申请人： NuFlare Technology, Inc.

发明人： Noriaki Nakayamada

IPC分类号： H01J37/317 ,  H01J37/304 ,  H01J37/302 ,  H01J37/244

摘要： An electron beam irradiation method includes calculating a charge amount distribution in the case where a substrate is irradiated with an electron beam, by using an index indicating complexity of a pattern to be formed on the substrate, calculating a positional deviation amount of an irradiation pattern to be formed due to irradiation with the electron beam, by using the charge amount distribution having been calculated, correcting an irradiation position by using the positional deviation amount having been calculated, and applying an electron beam to the irradiation position having been corrected.