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    Data processing method, charged particle beam writing method, and charged particle beam writing apparatus
    1.
    发明授权
    Data processing method, charged particle beam writing method, and charged particle beam writing apparatus 有权

    公开(公告)号：US10096452B2

    公开(公告)日：2018-10-09

    申请号：US15342296

    申请日：2016-11-03

    申请人： NuFlare Technology, Inc.

    发明人： Kenichi Yasui ,  Shigehiro Hara ,  Shinji Sakamoto

    IPC分类号： H01J37/30 ,  H01J37/302 ,  H01J37/317

    摘要： In one embodiment, a data processing method is for creating write data from design data, and registering the write data into a writing apparatus. The method includes applying, to a plurality of pieces of first frame data into which first chip data of the design data is divided, a plurality of conversion processes to create the write data, and applying a plurality of pre-processes to a plurality of pieces of second frame data into which second chip data of the write data is divided, and registering the second chip data into the writing apparatus. The plurality of conversion processes and the plurality of pre-processes are each performed in a pipeline processing on a per-frame basis. The write data is registered into the writing apparatus on a per-chip basis, on a per-virtual chip basis, or on a per-frame basis. The virtual chip includes a plurality of chips combined together.

    CHARGED PARTICLE BEAM DRAWING APPARATUS AND DRAWING DATA GENERATION METHOD
    4.
    发明申请
    CHARGED PARTICLE BEAM DRAWING APPARATUS AND DRAWING DATA GENERATION METHOD 有权
    充电颗粒光束绘图仪和绘图数据生成方法

    公开(公告)号：US20160284510A1

    公开(公告)日：2016-09-29

    申请号：US15056300

    申请日：2016-02-29

    申请人： NuFlare Technology, Inc.

    发明人： Shigehiro HARA ,  Kenichi Yasui ,  Hiroshi Yamashita ,  Yasuo Kato ,  Saori Gomi ,  Shinji Sakamoto ,  Takao Tamura ,  Hideo Tsuchiya ,  Noriaki Nakayamada ,  Hironobu Matsumoto

    IPC分类号： H01J37/302 ,  H01J37/317 ,  H01J37/24

    CPC分类号： H01J37/3026 ,  H01J37/3174 ,  H01J2237/31762 ,  H01J2237/31776

    摘要： In one embodiment, a charged particle beam drawing apparatus includes a drawing unit that draws a pattern in a drawing area on a substrate and a control processing circuitry that controls the drawing unit via a process including receiving drawing data with a hierarchical correction map input to the control processing circuitry, the drawing data with the hierarchical map including a plurality of files in which division maps are respectively described in files in units of subframes, each division map including dose information associated with corresponding one of blocks of the drawing area, and the process further including generating shot data by performing a data conversion process on the drawing data, reading a division map corresponding to a block in the area to be drawn from the hierarchical correction map, calculating a dose, and controlling the drawing unit based on the shot data and the calculated dose.

    摘要翻译： 在一个实施例中，带电粒子束描绘装置包括绘制单元，其绘制在基板上的绘图区域中的图案;以及控制处理电路，控制处理电路通过包括接收绘图数据的处理来控制绘图单元，该处理包括输入到 控制处理电路，具有包括多个文件的分层映射的绘图数据，其中分割图分别以子帧为单位在文件中描述，每个分割映射包括与绘图区域的对应的一个块相关联的剂量信息，以及处理 进一步包括通过对绘图数据进行数据转换处理来生成拍摄数据，读取与从分层校正图中绘出的区域中的块对应的分割图，计算剂量，以及基于拍摄数据控制绘制单位 和计算剂量。